GOALI: Core/Shell Sinterable Advanced Ceramic Materials Using Particle Atomic Layer Deposition
GOALI:利用粒子原子层沉积的核/壳可烧结先进陶瓷材料
基本信息
- 批准号:1563537
- 负责人:
- 金额:$ 33.58万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2016
- 资助国家:美国
- 起止时间:2016-07-15 至 2021-06-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
A recent Department of Energy analysis concluded that the adoption of light-emitting diodes (LEDs) in 2013 was correlated with a one-year energy cost savings of $1.8 billion, which is less than 5 percent of the expected savings with complete adoption of LEDs. A key driver in the cost and performance of LEDs is the heat sink as LED lumen efficiency decreases by 0.3-0.5 percent for each 1°C increase in operating temperature. However, the costs of manufacturing the desired heat sink material, aluminum nitride (AlN), are substantial as a result of the high sintering temperature required to form dense AlN parts and the proclivity for AlN to degrade in the presence of water. The benefits of atomic layer deposition (ALD) for densification and processing of AlN are expected to be transformative in enabling lower-cost production of AlN parts and present a domestic route to manufacturing ceramic thermal packages, an area currently dominated by foreign manufacturers. This Grant Opportunity for Academic Liaison with Industry (GOALI) research program will promote collaboration between university and industry and enable the education of both graduate and undergraduate students.The densification of AlN with yttria (Y2O3) currently requires temperatures in excess of 1700°C, mandating the use of expensive graphite furnaces. Through ALD of the sintering aid, Y2O3, onto AlN substrate particles, it is expected that a conformal and pinhole-free Y2O3 film will protect the AlN particles from degradation by water, allowing processing in water instead of more expensive solvent-based processing. Further, the precisely thick and uniform ALD Y2O3 films around primary AlN substrate particles, are expected to provide for beneficial liquid phase sintering in the intergranular region of the densifying matrix - promoting low temperature densification. A decrease in densification temperature not only lowers the energy input required to form dense AlN parts but may also enable the use of more inexpensive alumina furnaces in lieu of graphite furnaces. For gel-casting, the ALD Y2O3 coatings will also simplify the processing of colloidal gels since only one surface (i.e. Y2O3) will be present, not two - AlN and Y2O3. The uniform nature of ALD coatings should be a substantial improvement over conventional ball milling techniques where the incorporation of Y2O3 is not uniform with respect to each AlN particle, leading to inconsistencies in densification behavior and the properties of dense AlN parts. The combination of AlN particles resistant to hydrolysis and lower temperature densification may dramatically decrease the costs of manufacturing the AlN heat sink and thus, LEDs.
美国能源部最近的一项分析得出结论,2013年采用发光二极管(led)与一年节省18亿美元的能源成本相关,这还不到完全采用led预期节省的5%。LED成本和性能的关键驱动因素是散热片,因为工作温度每增加1°C, LED流明效率就会下降0.3- 0.5%。然而,制造所需的散热材料氮化铝(AlN)的成本很高,因为形成致密AlN部件所需的烧结温度很高,而且AlN在存在水的情况下容易降解。原子层沉积(ALD)用于AlN的致密化和加工的好处有望在实现AlN部件的低成本生产方面具有变革性,并为目前由国外制造商主导的陶瓷热封装制造领域提供了一条国内路线。这项与工业界学术联络的资助机会(GOALI)研究计划将促进大学与工业界之间的合作,并使研究生和本科生的教育成为可能。用钇(Y2O3)致密化AlN目前需要超过1700℃的温度,这就要求使用昂贵的石墨炉。通过烧结助剂Y2O3在AlN衬底颗粒上的ALD,预计一层保形且无针孔的Y2O3薄膜将保护AlN颗粒不被水降解,从而允许在水中加工而不是更昂贵的溶剂基加工。此外,在初生AlN衬底颗粒周围精确厚且均匀的ALD Y2O3薄膜有望在致密化基体的晶间区域提供有利的液相烧结,从而促进低温致密化。致密化温度的降低不仅降低了形成致密AlN部件所需的能量输入,而且还可以使用更便宜的氧化铝炉来代替石墨炉。对于凝胶铸造,ALD Y2O3涂层也将简化胶体凝胶的处理,因为只有一个表面(即Y2O3)将存在,而不是两个- AlN和Y2O3。ALD涂层的均匀性应该比传统的球磨技术有很大的改进,在传统的球磨技术中,Y2O3的加入对于每个AlN颗粒来说都是不均匀的,导致致密化行为和致密AlN部件的性能不一致。耐水解和低温致密化的AlN颗粒的组合可能会大大降低制造AlN散热器的成本,从而降低led的成本。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Alan Weimer其他文献
HydroGEN Seedling: Computationally Accelerated Discovery and Experimental Demonstration of High-Performance Materials for Advanced Solar Thermochemical Hydrogen Production
HydroGEN 幼苗:用于先进太阳能热化学制氢的高性能材料的计算加速发现和实验演示
- DOI:
- 发表时间:
2020 - 期刊:
- 影响因子:0
- 作者:
Charles Musgrave;Alan Weimer;Aaron Holder;Zachary J. L. Bare;Christopher Bartel;Samantha Millican;Ryan J. Morelock;Ryan Trottier;Katie Randolph - 通讯作者:
Katie Randolph
Alan Weimer的其他文献
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{{ truncateString('Alan Weimer', 18)}}的其他基金
GOALI: Continuous Spatial Particle Atomic Layer Deposition Processing
GOALI:连续空间粒子原子层沉积处理
- 批准号:
1852824 - 财政年份:2019
- 资助金额:
$ 33.58万 - 项目类别:
Standard Grant
REU Site: Program in Biorefining and Biofuels
REU 网站:生物精炼和生物燃料项目
- 批准号:
1261303 - 财政年份:2013
- 资助金额:
$ 33.58万 - 项目类别:
Continuing Grant
GOALI: Controlled Pore Size/Thickness Ultrathin Microporous/Mesoporous Films on Particles
目标:控制孔径/厚度的颗粒上超薄微孔/介孔薄膜
- 批准号:
1067800 - 财政年份:2012
- 资助金额:
$ 33.58万 - 项目类别:
Standard Grant
Thin Film Metal Ferrite Spinels for Solar-thermochemical Redox Cycles to Split Water
用于太阳能热化学氧化还原循环分解水的薄膜金属铁氧体尖晶石
- 批准号:
0966201 - 财政年份:2010
- 资助金额:
$ 33.58万 - 项目类别:
Standard Grant
REU Site: Program in Biorefining and Biofuels
REU 网站:生物精炼和生物燃料项目
- 批准号:
1005238 - 财政年份:2010
- 资助金额:
$ 33.58万 - 项目类别:
Continuing Grant
Partial Support for PARTEC2004 International Conference on Particle Technology
部分支持PARTEC2004国际粒子技术会议
- 批准号:
0401541 - 财政年份:2004
- 资助金额:
$ 33.58万 - 项目类别:
Standard Grant
Multi-layered Nanocoating of Nano and Submicron Sized Particles at Large Scale
大规模纳米和亚微米尺寸颗粒的多层纳米涂层
- 批准号:
0400292 - 财政年份:2004
- 资助金额:
$ 33.58万 - 项目类别:
Continuing Grant
NER: Conformal Nanoencapsulation of Ultrafine Particles
NER:超细颗粒的保形纳米封装
- 批准号:
0210670 - 财政年份:2002
- 资助金额:
$ 33.58万 - 项目类别:
Standard Grant
Partial Support for Fourth World Congress on Particle Technology July 21-25, 2002, Sydney, Australia
部分支持第四届世界粒子技术大会 2002 年 7 月 21-25 日,澳大利亚悉尼
- 批准号:
0223135 - 财政年份:2002
- 资助金额:
$ 33.58万 - 项目类别:
Standard Grant
Combustion Nitridation Processing in Aerosol Flow Reactors
气溶胶流反应器中的燃烧氮化处理
- 批准号:
9803539 - 财政年份:1998
- 资助金额:
$ 33.58万 - 项目类别:
Continuing Grant
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