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Low-cost route for the definition of IDE (interdigitated electrode) structures with nanometric geometries over large areas

Low-cost route for the definition of IDE (interdigitated electrode) structures with nanometric geometries over large areas
用于定义大面积纳米几何形状的 IDE(叉指电极)结构的低成本途径
批准号:
229837852
负责人:
Professorin Dr.-Ing. Hella-Christin Scheer
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2012
资助国家:
德国
项目状态:
已结题
起止时间:
2011-12-31 至 2014-12-31

项目摘要

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中文摘要
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英文摘要
This project aims at providing a low-cost route for the preparation of metallic IDE (interdigitated electrode) structures with geometries of the electrodes in the sub-micrometre- and nanometre-range, with active areas covered by these electrodes in the millimetre range and the connection of the electrodes via contact areas in the 100-micrometre range. Though these goals are ambitious, the preparation is to be as simple and as cost-efficient as possible. Spin-coating, nanoimprint, optical lithography and sputtering will be the techniques of choice, and not electron beam writing or dry etching which require costly high-vacuum equipment. A hybrid technique is applied to further simplify the procedure. nanoimprint lithography (for the definition of the interdigitated electrodes over large areas) will be combined with optical lithography in a simple contact printer (for the definition of the contact areas) within one single photoresist layer; both techniques being suitable for parallel, large area pattern definition. The imprint procedure will be conducted in such a way that no residual layer remains, making any dry etch step for the removal of such a layer redundant. Directly after hybrid lithography and development the metallic structures will be prepared by sputtering and lift-off. In order to further foster the low-cost route only items that are easily accessible will be used; conventional stamps (Si, polymeric replica stamps), conventional photomasks (Cr on quartz, no phase shifting structures), conventional photoresists (negative tone and positive tone) as well as polymeric substrates.Metallic IDE structures are the key components for a number of devices that benefit from nanometric electrodes over large areas; these range from simple (capacitive or resistive) sensors (e.g. for environmental applications) to low-cost tunable, organic DFB (distributed feedback) laser devices (e.g. for biomarker recognition in lab-on-chip applications). A low cost preparation route renders such devices interesting for disposable, miniaturised analysis systems, in particular when plastic substrates are used.
期刊论文(3)
专著(0)
科研奖励(0)
会议论文
DOI: 10.1016/j.mee.2014.05.008
发表时间: 2014-07-01
期刊: MICROELECTRONIC ENGINEERING
影响因子: 2.3
作者: [Dhima, Khalid, Steinberg, Christian, Scheer, Hella-Christin]
通讯作者: Scheer, Hella-Christin
Competitiveness of negative tone resists for nanoimprint lithography
用于纳米压印光刻的负性光刻胶的竞争力
DOI: 10.1016/j.mee.2014.05.017
发表时间: 2014
期刊: Microelectronic Engineering
影响因子: 2.3
作者: [Khalid Dhima, Christian Steinberg, Andre Mayer, Si Wang, Marc Papenheim, Hella-Christin Scheer]
通讯作者: Hella-Christin Scheer
Nanoimprint combination techniques
纳米压印组合技术
DOI: 10.1016/j.mee.2015.01.039
发表时间: 2015
期刊: Microelectronic Engineering
影响因子: 2.3
作者: [Khalid Dhima, Christian Steinberg, Si Wang, Marc Papenheim, Hella- Christin Scheer]
通讯作者: Hella- Christin Scheer
Nanopatterning of functional materials by transfer of nanoimprint-guided ordered block copolymer structures by means of reactive ion beam etching
Actuated adhesion elements with hierarchical structure for applications on technical surfaces
Großflächige Abformung von hinterschnittenen Strukturen für Mikroelektronik und Mikroverbindungstechnik
Untersuchung der Grundlagen der Prägelithographie (Nanoimprinting) im Hinblick auf die Herstellung von optischen Quantenbauelementen
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