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Visualization of nanometer scale defects responsible for optical loss and laser induced breakdown in binary coating materials for the UV spectral region

导致紫外光谱区二元涂层材料中光损耗和激光诱导击穿的纳米级缺陷的可视化

基本信息

批准号：
317442515
负责人：
Professor Dr. Detlev Ristau
金额：
--
依托单位：
Abteilung Laserkomponenten
依托单位国家：
德国
项目类别：
Research Grants
财政年份：
2016
资助国家：
德国
起止时间：
2015-12-31 至 2019-12-31
项目状态：
已结题

来源：
https://gepris.dfg.de/gepris/projekt/317442515?language=en
关键词：
Visualization nanometer scale defects responsible

项目摘要

Nowadays UV optics are considered as important key components for many innovative applications in photonics andlaser technology. Among many others, the large areas of UV laser material processing, laser medicine or particularly,semiconductor lithography impose demanding challenges onto the quality of optical UV-components. Both the opticalloss and the laser power handling capability of the components are of outmost importance for the success of a laserconcept and its applications. Laser induced breakdown of optical components occurs at much lower irradiationintensity as predicted by theories based on damage due to photoionization. Since decades, it is a well-acceptedinterpretation that the reduction of optical damage threshold, and also the increase of optical losses are caused bydefects, such as nanometer-sized particles, voids, and the interfaces as well as stoichiometric deficiencies. Thesedefects could be embedded in the thin coating layer, at layer- or substrate interfaces, or below the substrate surface.Despite the broad acceptance of this theory in the optical community, mostly these suggested defects either remainedinvisible for direct observation, or it was not possible to verify their influence on the damage behavior directly.In the proposed research endeavor, it is planned to identify and study the dominant contributions to optical losses andlaser induced breakdown in optical coatings for UV-laser applications. As mentioned before, the reason for thischallenge is the suggested defect size of a few nanometers. The approach within this proposal for identifying nanodefectsresponsible for optical breakdown, is double-tracked: On the one hand, corresponding artificial defects shall beincorporated in state of the art optical coatings to reproduce optical damage behavior, and on the other hand an opticalprobe techniques shall be developed, to obtain topographies of optical properties on the nanometer scale.

如今，紫外光学器件被认为是光子学和激光技术中许多创新应用的重要关键部件。其中，大面积的紫外激光材料加工、激光医学或特别是半导体光刻对光学紫外组件的质量提出了苛刻的挑战。元件的光损耗和激光功率处理能力对激光概念的成功及其应用至关重要。光学元件的激光诱导击穿发生在低得多的辐照强度，如基于光致电离损伤的理论所预测的。几十年来，人们普遍认为，纳米颗粒、空洞、界面缺陷以及化学计量不足是导致光损伤阈值降低和光损耗增加的主要原因。这些缺陷可以嵌入在薄涂层中，在层或基底界面处，或在基底表面之下。尽管这一理论在光学界被广泛接受，但大多数这些建议的缺陷要么无法直接观察，要么无法直接验证它们对损伤行为的影响。在拟议的研究奋进中，计划确定和研究紫外激光应用中光学涂层中对光学损耗和激光诱导击穿的主要贡献。如前所述，这一挑战的原因是建议的缺陷尺寸为几纳米。该方案中用于识别导致光学击穿的纳米缺陷的方法是双轨的：一方面，将相应的人工缺陷并入最先进的光学涂层中以再现光学损伤行为，另一方面，将开发光学探针技术以获得纳米尺度上的光学特性的形貌。