Production of a Large Diameter Plasma with a Lisitano Coil

使用 Lisitano 线圈生产大直径等离子体

• 批准号: 63880002
• 负责人: KAWAI Yoshinobu
• 金额: $ 4.48万
• 依托单位: Kyushu University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research
• 财政年份: 1988
• 资助国家: 日本
• 起止时间: 1988 至 1989
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-63880002/
• 关键词: Lisitano Coil; ECR Plasma; Plasma CVD; Microwave; ECRプラズマ; リジターノコイル; 大口径プラズマ; スパッタリング

A large diameter ECR plasma is produced with a Lisitano coil and the mechanism of the plasma production is studied experimentally and theoretically. The experiments on plasma CVD using the Lisitano coil are also performed. The main results are as follows. 1. The mechanism of the production of a large diameter ECR plasma is clarified by measuring electromagnetic fields distributions radiated from the Lisitano coil with small antennas. 2. A 45 cm-diameter uniform plasma is realized by controlling ECR points even with a small Lisitano coil (diameter 9 cm). 3. An ECR plasma is usually used at relatively low pressures. It is necessary for plasma CVD, however, to produce the plasma at high pressures. We succeed in producing an ECR plasma at 20 mTorr by increasing the microwave power. 4. Uniform carbon films are formed on 5 inch silicon wafers by the ECR plasma CVD using H_2-CH_4 gas mixture. The deposition rate is examined as a function of pressure, gas mixing rate, and substrate temperature.It is concluded from these results that a Lisitano coil is suitable for the ECR plasma CVD. Moreover, the results obtained in this experiment will be useful for the requirement of larger diameters of thin films, which is one of the most important subjects in such an industrial application as plasma processing.

利用Lisitano线圈产生了大直径ECR等离子体，并对等离子体产生的机理进行了实验和理论研究。本文还进行了等离子体气相沉积实验。主要结果如下：1. 通过测量小天线Lisitano线圈辐射的电磁场分布，阐明了大直径ECR等离子体的产生机理。2. 通过控制ECR点，即使使用直径为9 cm的小Lisitano线圈，也可以实现直径为45 cm的均匀等离子体。3. ECR等离子体通常在相对较低的压力下使用。然而，等离子体CVD必须在高压下产生等离子体。我们通过提高微波功率，成功地产生了20 mTorr的ECR等离子体。4. 用H_2-CH_4混合气体在5英寸硅片上制备了均匀的碳膜。研究了沉积速率作为压力、气体混合速率和衬底温度的函数。结果表明，Lisitano线圈适用于ECR等离子体CVD。此外，本实验的结果将有助于满足对更大直径薄膜的要求，这是等离子体加工等工业应用中最重要的课题之一。

项目成果

西本竜樹: "境界のあるプラズマにおける電子サイクロトロン波の分散関係、電磁場分布および偏波度" 九州大学総合理工学研究科報告. 11. 13-19 (1989)

西本龙树：“有界等离子体中电子回旋波的色散关系、电磁场分布和偏振度”九州大学研究生院理工学报告书11. 13-19（1989）。

Akira Yonesu: Jpn.J.Appl.Phys.27. 1427-1487 (1988)

Akira Yonesu：Jpn.J.Appl.Phys.27。

Akio Komori, Yasuaki Takada, Akira Yonesu and Yoshinobu Kawai: "ECR Plasma Production with a Lisitano Coil" Proc. of 1989 Int. Conf. on Plasma Phys. (New Delhi), 3, 1197-1200, 1989.

Akio Komori、Yasuaki Takada、Akira Yonesu 和 Yoshinobu Kawai：“使用 Lisitano 线圈进行 ECR 等离子体生产”Proc。

Masayoshi Tanaka, Ryuji Nishimoto, Nobuhiro Harada, Akio Komori and Yoshinobu Kawai: "Over-Dense Plasma Production Using Electron Cyclotron Waves" Proc. of 1989 Int. Conf. on Plasma Phys. (New Delhi), 3, 1225-1228, 1989.

Masayoshi Tanaka、Ryuji Nishimoto、Nobuhiro Harada、Akio Komori 和 Yoshinobu Kawai：“使用电子回旋波产生过密等离子体”Proc。

Masayoshi Tanaka: "Over-Dense Plasma Production Using Electron Cyclotron Waves" Proc.of 1989 Int.Conf.on Plasma Phys.(New Delhi). 3. 1225-1228 (1989)

Masayoshi Tanaka：“使用电子回旋波产生超密等离子体”Proc.of 1989 Int.Conf.on Plasma Phys.（新德里）。