Effect of target power density on the chemical composition of thin films synthesized from composite/compound targets (T05*)

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Goal is to achieve fundamental understanding regarding the influence of the target power density during sputtering of composite (M-Al-C) and compound (M2AlC with M = Cr, Hf, Zr) targets on the chemical composition of the as deposited thin films. From the literature, it is known that significant deviations between (stoichiometric) target and thin film compositions are observed. Hence, our working hypothesis is that non-stoichiometric composite-/compound target compositions result in the deposition of stoichiometric nanolaminate thin films.