Effect of target power density on the chemical composition of thin films synthesized from composite/compound targets (T05*)

靶材功率密度对复合材料/复合靶材合成薄膜化学成分的影响 (T05*)

• 批准号: 407652830
• 金额: --
• 依托单位: Lehrstuhl für Werkstoffchemie (MCh)
• 依托单位国家: 德国
• 项目类别: CRC/Transregios (Transfer Project)
• 财政年份: 2018
• 资助国家: 德国
• 起止时间: 2017-12-31 至 2020-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/407652830?language=en
• 关键词: Effect; target; power; density; chemical

Goal is to achieve fundamental understanding regarding the influence of the target power density during sputtering of composite (M-Al-C) and compound (M2AlC with M = Cr, Hf, Zr) targets on the chemical composition of the as deposited thin films. From the literature, it is known that significant deviations between (stoichiometric) target and thin film compositions are observed. Hence, our working hypothesis is that non-stoichiometric composite-/compound target compositions result in the deposition of stoichiometric nanolaminate thin films.

目标是实现基本的理解，在溅射复合材料（M-Al-C）和化合物（M2 AlC与M = Cr，Hf，Zr）目标的化学成分上的沉积薄膜的靶材功率密度的影响。从文献中，它是已知的，观察到（化学计量）目标和薄膜组成之间的显着偏差。因此，我们的工作假设是，非化学计量的复合/化合物靶组合物导致化学计量的纳米层压薄膜的沉积。