Control of Deposition Process of Metal Vapor by Themal Energy

金属蒸汽沉积的机理是一种研究实验来控制薄膜的crystalline结构的热能方法，如红外激光辐射和这样的。Knudsen细胞被用作金属蒸发源。那个持有人的子被吸引到了Knudsen牢房里。持有人和十字架之间的距离约为300毫米，而他们之间的角度约为13.5度。在持有人上安装的基底的温度可以由K型热双和一个Sheathheater和/或Liquid N_2控制。在这个实验中，铝、锰和Ag被用作蒸发金属，（100）硅橡胶、玻璃和（100）氯化钠单晶体被用作底物。沉积的薄膜用RHEED、SEM和EPMA分析。所获得的结果与以下情况相似;（1）底层温度在一部薄薄的电影中起着重要的作用。在196 C的基底温度的情况下，反常的薄电影被捕获，在高基底温度、policrystaline薄电影被捕获的情况下。从薄膜的平均颗粒大小来看，薄膜的基底温度变得更大。这一结果表明，通过热能方法对沉积机制和晶体管结构的控制的可能性得到了改善。（2）这不可能观察到金属原子的内分子振动对薄薄膜的局部刺激的影响。（3）大约100张厚金属薄膜的红外特别，几乎和那些大块金属一样。（4）电子束辐射对金属蒸汽沉积的促进是可观察的，但这种电子辐射对晶体管结构的标记变化是不可观察的。（5）（100）氯化钠基底上薄金属薄膜增长的电场的影响是不可观察的。这个原因被认为是因为我们使用了Knuden细胞作为蒸发源在这些实验中，金属蒸发器中有少数。

The mechanisms of vacuum deposition of metal vapors are investigated experimentally to control crystalline structures of thin films by thermal energy methods such as infrared laser irradiation and so on.Knudsen cell was used as a metal evaporation source. The subs the holder was equipped facing to the Knudsen cell. The distance the between holder and the crucible was about 300 mm and the angle between them was about 13.5 degree. The temperature of the substrate mounted on the holder could be controlled with a K-type thermocouple and a sheath heater and/or liquid N_2. In this experiment, Al, Mn and Ag were used as evaporant metals and (100) Si wafer, glass and (100) NaCl single crystal as substrates. Deposited thin films were analyzed with RHEED, SEM and EPMA. The obtained results are as follows ;(1) The substrate temperature plays an important role on the crystalline of a thin film. In case of the substrate temperature of ー196 C, amorphous thin films were obtained and in case of higher substrate temperature, policrystalline thin films were obtained. The average grain size of thin films becomes large with the substrate temperature. This result implies the possibility of the control of the deposition mechanism and crystalline structures of thin films by thermal energy methods.(2) It could not be observed the effect of the local excitation of the intramolecular vibrations of metal atoms by YAG laser irradiation on the thin films.(3) The infrared spectra of metal thin films of about 100A thickness were almost the same as those of bulk metals.(4) The promotion of the metal vapor deposition by electron beam irradiation was observed but the marked change in the crystalline structure by this electron irradiation was not observed.(5) The influence of electric field on the growth of thin metal films on (100) NaCl substrate was not observed. The reason is guessed that as we use the Knuden cell as evaporant source in these experiments, there are few ions in the metal vapor.