Low Loss Sputtered Thin Films for Optical Circuits.

用于光电路的低损耗溅射薄膜。

• 批准号: 04650264
• 负责人: MIYAIRI Keiichi
• 金额: $ 1.28万
• 依托单位: Shinshu University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1992
• 资助国家: 日本
• 起止时间: 1992 至 1993
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-04650264/
• 关键词: Tantalum oxide film; Dielectric thin film; Breakdown; Light waveguide; Refractive index

An investigation was made on electrical and optical properties of sputtered tantalum oxide films with a view toward its possible use as a dielectric waveguide material. Electrical conductivity and breakdown strength were measured. The current increases exponentially with the voltage, besides it depends on the temperature strongly. The doping of nitrogen increases the conductivity. The temperature dependence of the breakdown strength is not significant. A nitrogen doped sample manifests a lower breakdown strength than doped one. The varjation of refractive index with wavelength for nitrogen doped and undoped samples were measured. The nitrogen doped sample shows the similar characteristics. The dopjng of nitrogen decreases the refractive index. The attenuation index could not be evaluated because of the small magnitude within the experimental errors. They may be below 10^<-3> in the visible region. An observation of properties of a waveguide was made. The linearly polarized He-Ne laser light was coupled into a TaOx thin film waveguide with coupling prisms. The propagation of the guided light depends on the polarization of the incident light.

对溅射钽氧化物薄膜的电学和光学性质进行了研究，以期将其用作介电波导材料。测量电导率和击穿强度。电流随电压呈指数增加，而且与温度密切相关。氮的掺杂增加了电导率。击穿强度的温度依赖性并不显着。氮掺杂样品表现出比掺杂样品更低的击穿强度。测量了掺杂氮和未掺杂样品的折射率随波长的变化。氮掺杂样品显示出类似的特性。氮的掺杂降低了折射率。由于实验误差幅度较小，无法评估衰减指数。在可见光区域它们可能低于10^-3。对波导的特性进行了观察。线偏振 He-Ne 激光通过耦合棱镜耦合到 TaOx 薄膜波导中。引导光的传播取决于入射光的偏振。