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Fundamental study of nanofabrication by electron irradiation

Fundamental study of nanofabrication by electron irradiation
电子辐照纳米加工的基础研究
批准号:
15201026
负责人:
TAKEDA Seiji
金额:
$31.7万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2006

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中文摘要
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英文摘要
We have studied electron irradiation effects in semiconductor crystals by means of electron microscopy and associated experimental techniques. In addition to structural studies on electron-irradiation-induced defects in silicon, we have examined silicon surface nanoholes, which are introduced on a clean silicon surface by electron irradiation. We have experimentally determined the dependence of diameters, spatial distribution and excavating rate of silicon surface nanoholes on electron irradiation condition. This detailed date can be used for application of silicon surface nonoholes. Furthermore, we have found that gold nanoparticles of certain size can be formed on electron-irradiated silicon surface. The experimental procedure is as follows ; 1) preparation of a clean silicon surface, 2) irradiation of electron beam of the surface, 3) deposition of gold homogeneously on the surface, and 4) annealing the surface at elevated temperatures. Al the processes are carried out in ultra vacuu … More m environment. As a result, gold nanoparticles are formed selectively on either the center or the periphery of the irradiated areas at the certain experimental condition. We have analyzed this peculiar phenomenon based on a simple model. We assume that electron irradiation induces atomistic roughness on surface according to the intensity profile of electron beam. This roughness, introduced heterogeneously on the surface, affects the surface diffusion of adatoms, i.e. deposited gold atoms. Extending a basic theory of surface diffusion and clustering of adatoms to that on the heterogeneously roughened surface, we have explained qualitatively our experimental result. Furthermore, having known that the size of the selectively grown gold nanoparticles on electron irradiated areas are commensurate to that as catalysts for growing silicon nanowires, we have actually succeeded in growing silicon nanowires from the selectively grown gold particle via vapor liquid solid (VLS) mechanism using silane as source gas. The experimental results summarized above will be utilized for nanofabrication of semiconductor crystals by electron irradiation. Less
期刊论文(31)
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Diffusion and condensation of adatoms on inhomogeneous rough surfaces
不均匀粗糙表面上吸附原子的扩散和凝聚
DOI: --
发表时间:
期刊: Surf. Sci. (印刷中)
影响因子: --
作者: [K.Torigoe, Y.Ohno, H.Kohno, T.Ichihashi, S.Takeda]
通讯作者: S.Takeda
Growth process of gold nanoparticles on rough Si surfaces
金纳米粒子在粗糙硅表面的生长过程
DOI: --
发表时间: 2006
期刊: Physica B (印刷中)
影响因子: --
作者: [K.Torigoe, Y.Ohno, T.Ichihhashi, S.Takeda]
通讯作者: S.Takeda
Extended vacancy-type defects in silicon induced at low temperatures by electron irradiation
低温下电子辐照引起的硅中扩展的空位型缺陷
DOI: --
发表时间: 2003
期刊: Philos. Mag. A 83
影响因子: --
作者: [J.Yamasaki, S.Takeda, Y.Ohno, Y.Kimura]
通讯作者: Y.Kimura
Growth of silicon nanowires on H-terminated Si {111} surface templates studied by transmission electron microscopy
通过透射电子显微镜研究硅纳米线在 H 封端 Si {111} 表面模板上的生长
DOI: --
发表时间: 2005
期刊: Journal of Electron Microscopy 54 supplement(印刷中)
影响因子: --
作者: [N.Ozaki, Y.Ohno, J.Kikkawa, S.Takeda]
通讯作者: S.Takeda
18
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