Development of Time-Resolved Ambient-Pressure Surface Core-Level Spectroscopy and its Application to Surface Dynamic Processes

我们已经开发了一个近环境压力的X射线光电子能谱系统，我们可以测量光电子能谱吸附物种以及样品表面在近环境压力条件下。我们将这种技术应用于实时跟踪动态过程，如光催化剂表面的形成反应和固体表面的催化反应。这项技术的应用使我们能够检测到一些从未观察到的表面反应过程。在此基础上，我们成功地获得了更深入的了解表面反应的机制。

We have developed a near ambient-pressure x-ray photoelectron spectroscopy system with which we can measure photoelectron spectra for adsorbed species as well as sample surfaces under near ambient pressure conditions. We applied this technique to real-time tracing of dynamic processes such as formation reactions of photocatalyst surfaces and catalytic reactions at solid surfaces. The application of this technique enabled us to detect several surface reaction processes that have never been observed. Based on the obsrvations, we successfully gained deeper insight into the mechanisms of the surface reactions.