Development of Supertough Ceramic or Cermet Thick Coatings Available in Various Surroundings

开发适用于各种环境的超韧陶瓷或金属陶瓷厚涂层

• 批准号: 10555253
• 负责人: YASUMARU Naoki
• 金额: $ 2.75万
• 依托单位: Fukui National College of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B).
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-10555253/
• 关键词: plasma treatment; nitriding; ceramic coating; suraface treatment; chromium nitride; chromium - nickel; wear; 表面処理; 複合処理

Austenitic type 304 stainless steel was ion-nitrided and subsequently ion-plated with Cr-Ni-N whose Ni content was varied from 0 at% to 50 at%, utilizing the conventional AIP (arc ion plating) source. The ceramic film of CrN coated onto the pre-nitrided steel demonstrated good wear resistance even under a heavy load. Furthermore, a 10μm thick CrN film exhibited the least wear among the 3 to 19μm thick CrN films. The Cr-Ni-N films containing Ni were composed of mixed phases of Cr^*N and Ni.Cr^*N is a newly observed Cr nitride that may contain some Ni and has been identified as an f.c.t.structure. A Cr-Ni-N film with Ni content of 11 at% coated onto the pre-nitrided steel demonstrated the best wear resistance among the CrN film or Cr-Ni-N films with high Ni content. This superior wear resistance was maintained even at film thicknesses exceeding 20μm, unlike the tendency of CrN film.Furthermore the Cr-Ni-N thin films were deposited on the untreated or pre-nitrided steels utilizing a modified AIP source in order to reduce the number of macroparticles in these deposited films. The films deposited by the modified AIP source exhibited a higher nitrogen concentration than the films prepared by the conventional AIP source. The Cr-Ni-N films coated onto the pre-nitrided steels with a low Ni content demonstrated the lowest friction coefficient and the best wear resistance among these films. Furthermore, it was found that the films with a high Ni content exhibited the superior wear resistance without the pretreatment of nitriding.As for the corrosion resistance, the CrN film or Cr-Ni-N films with a low Ni content showed the best corrosion resistance among these films.

采用传统的AIP（电弧离子镀）源对奥氏体型304不锈钢进行了离子氮化和随后的Cr-Ni-N离子镀，其中Ni含量从0原子%变化到50原子%。在预氮化钢上涂覆的CrN陶瓷膜即使在重载荷下也表现出良好的耐磨性。此外，在3 ~ 19μm厚的CrN膜中，10μm厚的CrN膜表现出最小的磨损。含Ni的Cr-Ni-N薄膜由Cr^*N和Ni的混合相组成，Cr^*N是一种新观察到的Cr氮化物，可能含有一些Ni，并已被确定为f.c.t.结构。在预氮化钢上镀Ni含量为11at%的Cr-Ni-N膜层的耐磨性最好，而高Ni含量的Cr-Ni-N膜层的耐磨性最差。此外，为了减少沉积膜中的宏观颗粒，采用改进的AIP源在未处理或预氮化的钢上沉积了Cr-Ni-N薄膜。通过改性的AIP源沉积的膜表现出比通过常规AIP源制备的膜更高的氮浓度。结果表明，在低Ni含量的预氮化钢上沉积的Cr-Ni-N薄膜具有最低的摩擦系数和最好的耐磨性。结果表明，高Ni含量的膜层在未经氮化处理的情况下具有上级耐磨性，而低Ni含量的CrN膜层或Cr-Ni-N膜层的耐蚀性最好。

项目成果

K.Okimura: "Mass spectrometry and absorption spectroscopy for oxidation of titanium target in rf magnetron sputtering"Vacuum. 59巻. 600-605 (2000)

K.Okimura：“射频磁控溅射中钛靶氧化的质谱和吸收光谱”59. 600-605 (2000)。

K.Okimura: "Low temperature growth of rutile TiO_2 films in modified rf magnetron sputtering"Surface and Coatings Technology. 135巻・2-3号. 286-290 (2001)

K.Okimura：“改良射频磁控溅射中金红石 TiO_2 薄膜的低温生长”《表面与涂层技术》第 135 卷，第 2-3 期（2001 年）。

N.Yasumaru: "Mechanical Properties of Cr-Ni-N Films Deposited on Pre-Nitrided Steels"Materials Transactions, JIM. 41巻. 555-559 (2000)

N.Yasumaru：“预氮化钢上沉积的 Cr-Ni-N 薄膜的机械性能”材料交易，JIM 卷 41. 555-559 (2000)

N.Yasumaru: "Properties of Cr-Ni-N Coatings Prepared by the Modified Arc Ion Plating Source"Proceed.of Int.Symp.on Designing, Processing and Propertiesof Advanced Engineering Materials. (in press). (2001)

N.Yasumaru：“改进的电弧离子镀源制备的 Cr-Ni-N 涂层的性能”Proceed.of Int.Symp.on Design、Processing and Properties of Advanced Engineering Materials。

K.Okimura: "Mass spectrometry and absorption spectroscopy for oxidation of titanium target in rf magnetron sputtering"Vacuum. vol.59. 600-605 (2000)

K.Okimura：“射频磁控溅射中钛靶氧化的质谱和吸收光谱”真空。