Duplex Surface Treatment due to Combined Plasma Nitriding and Ceramic or Cermet Thick Coatings of Cr-Ni-N System
Duplex Surface Treatment due to Combined Plasma Nitriding and Ceramic or Cermet Thick Coatings of Cr-Ni-N System
批准号:
08555174
负责人:
YASUMARU Naoki
金额:
$1.6万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1997
中文摘要
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英文摘要
Austenitic type 304 stainless steel was duplex treated by ion-nitriding at about 803 K and subsequent ion-plating of Cr-N or CrNi-N.The nitride films of Cr-N or CrNi-N were deposited in the pure N_2 or N_2-H_2 mixed gas at about 2.5 Pa with a film thickness of 3-34mum. The following results are obtained.(1) As for the Cr-N system, the phase composition was a single phase of CrN or the mixed phases of Cr_2N and Cr. As for the CrNi-N system, it was the mixed phases of Cr^<**>N and Ni. Cr^<**>N was newly obserbed Cr nitride which may contain some Ni and identified as an f.c.c.structure (a=0.37 nm).(2) The film hardness was about Hv 1900 for Cr-N and about Hv 1000 for CrNi-N.The depositing rate of the CrNi-N film was faster than that of Cr-N,but the surface roughness was larger.(3) The ceramic flims of CrN coated onto the pre-nitrided steel showed the best wear resistance even under a heavy load. Among the CrN films of 3,10 and 19 mum, the CrN film with a thickness of 10 mum showed the minimum wear loss and the wear loss of CrN film with a thickness of above 10 mum coated onto the untreated steel decreased nearly to that of CrN film coated onto the prenitrided steel.(4) The cermet films of CrNi-N coated onto the untreated steels show the good wear resistance and these films coated onto the pre-nitrided steels exhibet the inferior wear resistance compared with ones coated onto the untreated steels, being contrary to the tendency of the common ceramic films like as CrN.
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K.Okimura: "Deposition of High-Quality TiO_2 Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet" Jpn.J.Appl.Phys.36巻・7B号. 4917-4921 (1997)
K.Okimura:“通过辅助永磁体进行射频磁控溅射沉积高质量 TiO_2 薄膜”Jpn.J.Appl.Phys.Volume 36,Issue 7B (1997)。
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通讯作者:
安丸 尚樹: "チタン系セラミックス膜の作製と評価" 日本金属学会北陸信越支部・日本鉄鋼協会北陸支部 平成8年度連合講演会概要集. 11-12 (1996)
Naoki Yasumaru:“钛基陶瓷薄膜的制备和评估”日本金属研究所北陆信越分院和日本钢铁研究所北陆分院1996年联合讲座摘要11-12(1996)。
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安丸 尚樹: "プラズマ窒化とセラミックコーティングによる複合表面高機能化処理" まてりあ(日本金属学会会報). 35巻・9号. 969-975 (1996)
Naoki Yasumaru:“使用等离子氮化和陶瓷涂层的高功能复合材料表面处理”Materia(日本金属学会通报)第 35 卷,第 969-975 期(1996 年)。
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Kunio Okimura: "Mass and Energy Analyses of Substrate-incident Ions in TiO2 Deposition by RF Magnetron Sputtering" Jpn. J. Appl. Phys.36巻・1A号. 303-318 (1997)
Kunio Okimura:“通过射频磁控溅射进行 TiO2 沉积中的基质入射离子的质量和能量分析”J. Appl. 第 36 卷,第 303-318 期(1997 年)。
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K. Okimura: "Role of He Gas Mixture on the Gowth of Anatase and Rutile TiO_2 Films in RF Magnetron Sputtering" Jpn.APPl.Phys.36巻・5A. 2849-2855 (1997)
K. Okimura:“RF 磁控溅射中 He 气体混合物对锐钛矿和金红石 TiO_2 薄膜生长的作用”Jpn.APPl.Phys.Volume 36・5A (1997)。
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