impurity Diffusion in ultra high purity iron using non-reactive Aluminum and Silicon

使用非反应性铝和硅在超高纯铁中进行杂质扩散

• 批准号: 11450241
• 负责人: TAGUCHI Osamu
• 金额: $ 2.5万
• 依托单位: Miyagi National College of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2001
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-11450241/
• 关键词: Diffusion; Impurity Diffusion; Diffusion coefficient; Ultra high purity iron; instrumental analyses; 2次イオン質量分析; 原子吸光分析; 吸光光度分析

Impurity diffusion of A1 and Si in high purity and ultra high purity iron has been studied by using non-radioactive tracer of A1 and Si elements. Concentration profiles have been determined by using several kind of the instrumental analyses, namely, secondary ion mass spectrometer, Auge electron spectroscopy, atomic absorption analysis, absorptiometry and grou discharge emission spectroscopy. Reliable penetration profile has been obtained by the absorptiometry for the impurity diffusion of A1 in Fe, and determined the Arrhenius equation as follows ;D-1.4x10-6exp (-236kJmol^<-1>/RT) m^2S^<-1>D-1.4x10-6exp (-236kJmol^<-1>/RT) m^2S^<-1>As deposited A1 sample, the other instrumental analysis, except carbon furnace atomic adsorption analysis and Grou discharge emission spectroscopy, have shown the penetration of A1 in Fe. It has been found that oxen is recognized at interface between A llayer and Fe by the secondary ion mass spectrometer and Auge electron spectroscopy. It has been suggested that the grou discharge emission spectroscopy is useful to measure the penetration profile for the impurity diffusion.

本文用非放射性元素Al和Si示踪剂研究了杂质元素Al和Si在高纯和超高纯铁中的扩散。利用二次离子质谱仪、俄歇电子能谱、原子吸收分析、吸收光谱法和格鲁放电发射光谱等仪器分析方法测定了浓度分布。用吸光光度法测定了Al在Fe中的杂质扩散，得到了可靠的Al在Fe中的渗透曲线，并确定了Arrhenius方程：D-1.4x10- 6 exp（-236kJmol ^<-1>/RT）m^2S^<-1>D-1.4x10- 6 exp（-236kJmol ^<-1>/RT）m^2S^<-1>对于沉积Al的样品，除碳炉原子吸收分析和格鲁放电发射光谱外，其它仪器分析均表明Al在Fe中的渗透。用二次离子质谱仪和俄歇电子能谱仪研究发现，在A层与Fe的界面上有明显的氧存在。提出了用格鲁放电发射光谱测量杂质扩散穿透剖面的方法。

项目成果

Osamu Taguchi, Miyuki Hagiwara, Yoshihiro Yamazaki and Yoshiaki lijima: "Inpurity Diffusion of A1 and Cu in γ-Fe"Defect and Diffusion Forum. 194-199. 91-96 (2001)

Osamu Taguchi、Miyuki Hagiwara、Yoshihiro Yamazaki 和 Yoshiaki lijima：“γ-Fe 中 A1 和 Cu 的杂质扩散”缺陷和扩散论坛。

Osamu Taguchi: "Impurity Diffusion of Al and Cu in γ-Fe"Defect and Diffusion Forum. 194-199. 91-96 (2001)

Osamu Taguchi：“γ-Fe 中 Al 和 Cu 的杂质扩散”缺陷与扩散论坛 194-199 (2001)。