Study of electric field close to a sample surface utilizing the electron standing wave excited in a vacuum gap of scanning tunneling microscopy

利用扫描隧道显微镜真空间隙中激发的电子驻波研究样品表面附近的电场

基本信息

项目摘要

By applying a voltage higher than a sample work function to a sample in scannging tunneling microscopy (STM), electrons field-emitted from an STM tip have positive kinetic energy near a sample surface. In this field emission regime, an electron standing wave (ESW) is excited in the vacuum gap under proper boundary conditions of a tunneling barrier and a potential near the sample. The eigenstates of ESW are determined by a potential near the sample surface. Thus the electric field near sample surface can be evaluated from the ESW excitation. The ESW can be detected from the differential conductance (dI/dV) versus the applied voltage curve : the peaks in the dI/dV curve correspond to the ESW excitation. We have obtained the dI/dV curves with ESW peaks for several samples : Au(111), Si(001)2x1, Si(111)7x7, Ge(001)2x1 and Si(001)2x1:H. To evaluate the field, there is a difficult problem that the tip shape regulates the electric field in the vacuum gap as a boundary condition. The thermal-field (T-F) treatment was applied for W tips to form a similar shape : the tip is heated under a high electric field resulting in expansion of {110} facets. The obtained dI/dV spectra were analyzed according to a model with a triangle potential, which has eigenvalues of the energy levels corresponding to the ESW spectra. It is concluded that the peak interval can be an index of the field evaluation.Furthermore, by raising the energy of the field emitted electron that irradiates sample surfaces, we have obtained electron energy loss spectra (EELS) and Auger electron spectra of backscattered electrons from semiconductors and metal surfaces with the same setup of field emission STM combined with an electron energy analyzer. This result exhibits the potential of elemental analysis on a nano scale with a combined instrument with the field emission STM.
在扫描隧道显微镜(STM)中,通过对样品施加高于样品功函数的电压,从STM针尖发射的电子在样品表面附近具有正动能。在这种场发射模式下,在隧道势垒和样品附近的电势的适当边界条件下,电子驻波在真空禁带中被激发。电子轰击的本征态由样品表面附近的电势决定。因此,可以从ESW激励来估算样品表面附近的电场。可以从微分电导(Di/dV)对施加电压的曲线中检测到ESW:Di/dV曲线中的峰值对应于ESW激励。我们得到了Au(111),Si(001)2x1,Si(111)7x7,Ge(001)2x1和Si(001)2x1:H等几个样品的dI/dV曲线和ESW峰。对W针尖进行了热场(T-F)处理,形成了类似的形状:在高电场下加热,导致了{110}面的膨胀。得到的di/dv谱按三角势模型进行分析,该模型具有与ESW谱相对应的能级本征值。此外,通过提高照射样品表面的场发射电子的能量,结合电子能谱分析仪,得到了半导体和金属表面背散射电子的电子能量损失谱(EELS)和俄歇电子能谱。这一结果显示了利用场发射扫描隧道显微镜在纳米尺度上进行元素分析的潜力。

项目成果

期刊论文数量(32)
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Y.Suganuma: "Evaluation of an electric field over sample surfaces by electron standing waves in a vacuum gap of scanning tunneling microscopy"Japanese Journal of Applied Physics. 39. 3758-3760 (2000)
Y.Suganuma:“通过扫描隧道显微镜真空间隙中的电子驻波评估样品表面的电场”日本应用物理学杂志。
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Y. Suganuma and M. Tomitori: "Analysis of electron standing waves in a vacuum gap of scanning tunneling microscopy : measurement of band bending through energy shifts of electron standing wave"J. Vac. Sci. Technol.. B 18. 48-54 (2000)
Y. Suganuma 和 M. Tomitori:“扫描隧道显微镜真空间隙中电子驻波的分析:通过电子驻波能量偏移测量能带弯曲”J。
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Y.Suganuma: "Analysis of electron standing waves in a vacuum gap of scanning tunneling microscopy: measurement of band bending through energy shifts of electron standing wave"J.Vac.Sci.Technol.B. 18. 48-54 (2000)
Y.Suganuma:“扫描隧道显微镜真空间隙中电子驻波的分析:通过电子驻波能量偏移测量能带弯曲”J.Vac.Sci.Technol.B。
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M.Tomitori: "An applicability of scanning tunneling microscopy for surface electron spectroscopy"Surface Science. 493. 49-55 (2001)
M.Tomitori:“扫描隧道显微镜在表面电子光谱中的适用性”表面科学。
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Y.Suganuma: "Analysis of electron standing waves in a vacuum gap of scanning tunneling microscopy : measurement of band bending through energy shifts of electron standing wave"Journal of Vacuum Science and Technology. B18. 48-54 (2000)
Y.Suganuma:“扫描隧道显微镜真空间隙中的电子驻波分析:通过电子驻波的能量变化测量能带弯曲”真空科学与技术杂志。
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TOMITORI Masahiko其他文献

TOMITORI Masahiko的其他文献

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{{ truncateString('TOMITORI Masahiko', 18)}}的其他基金

In-situ observation and analysis of nano contacts and junctions formation at high temperatures by a combined microscope of SEM and SPM
SEM和SPM组合显微镜对高温下纳米接触和结形成的原位观察和分析
  • 批准号:
    22656012
  • 财政年份:
    2010
  • 资助金额:
    $ 9.09万
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
Analysis of binding formation between solid surfaces by bias voltage non-contact atomic force microscopy/spectroscopy
通过偏置电压非接触原子力显微镜/光谱分析固体表面之间的结合形成
  • 批准号:
    20246012
  • 财政年份:
    2008
  • 资助金额:
    $ 9.09万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Measurements of electronic properties of interfaces with functional nanostructures by bias-voltage non-contact atomic force microscopy/spectroscopy
通过偏置电压非接触原子力显微镜/光谱法测量功能纳米结构界面的电子特性
  • 批准号:
    17206005
  • 财政年份:
    2005
  • 资助金额:
    $ 9.09万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Development of a field electron emission-scanning probe microscope with a build-up tip
开发带有构建尖端的场电子发射扫描探针显微镜
  • 批准号:
    10555008
  • 财政年份:
    1998
  • 资助金额:
    $ 9.09万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B).
Recognition of atomic species on hetero-surfaces by atom resolved tunneling spectroscopy
通过原子分辨隧道光谱识别异质表面上的原子种类
  • 批准号:
    07405003
  • 财政年份:
    1995
  • 资助金额:
    $ 9.09万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Construction of an experimental apparatus for atom transfer between nano-regions
纳米区域间原子转移实验装置的构建
  • 批准号:
    05555007
  • 财政年份:
    1993
  • 资助金额:
    $ 9.09万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
Microscopic Study of Si-Ge Heteroepitaxial Growth by STM/STS
STM/STS 硅锗异质外延生长的显微研究
  • 批准号:
    04650596
  • 财政年份:
    1992
  • 资助金额:
    $ 9.09万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
Development of Preparation Methods of SXM Tips with a Ultra-fine Probing Area
具有超精细探测区域的 SXM 探针制备方法的开发
  • 批准号:
    02555004
  • 财政年份:
    1990
  • 资助金额:
    $ 9.09万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
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