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Improvement of anomalous Hall effect of ferromagnetic thin films with perpendicular magnetization and its application to integrated non-volatile memory

Improvement of anomalous Hall effect of ferromagnetic thin films with perpendicular magnetization and its application to integrated non-volatile memory
垂直磁化铁磁薄膜反常霍尔效应的改善及其在集成非易失性存储器中的应用
批准号:
12450143
负责人:
NAKAGAWA Shigeki
金额:
$8.19万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2001

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中文摘要
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英文摘要
In this research, a ferromagnetic Hall effect of very thin film with perpendicular magnetic anisotropy were observed aiming for their application to non-volatic memory cells. An anomalous Hall effect (AHE) and a planar Hall effect (PHE) represent a perpendicular component and an in-plane component of the magnetization in the double-layered media. Since AHE and PHE have different symmetries regarding to the applied magnetic field H, it is easy to distinguish the AHE component, which is proportional to M, and PHE component, which is proportional to M^2, from the measured Hall voltage V_H. The Hall voltage of the double-layered film composed of Co-Cr-Ta and Ni-Fe layers was observed when the magnetic field is applied at a certain angle from the normal to the film plane. The observed V_H-H characteristics are regarded as a sum of Hall voltage outputs of PHE and AHE. The perpendicular and the in-plane components, which are regarded as the magnetization process of Co-Cr-Ta and that of Ni-Fe layer, respectively, can be easily determined from these characteristics. The Hall measurement is useful to study the magnetization characteristics in the double-layered media in perpendicular magnetic recording system. Furthermore, A new method for evaluating magnetic interaction among the particles in perpendicular magnetic recording layers under canted magnetic field have been proposed using Anomalous Hall measurement and VSM measurement. These results were very convenient to design Hall memory cells proposed in this project.
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船橋伸彦, 馮 潔, 松下伸広・A, 中川茂樹, 直江正彦: "Pt下地層改良によるBaMフェライト薄膜の微粒子化"日本応用磁気学会誌. 巻(25)号(4-2). 547-540 (2001)
Nobuhiko Funabashi、Jie Feng、Nobuhiro Matsushita A、Shigeki Nakakawa、Masahiko Naoe:“通过改善 Pt 底层实现 BaM 铁氧体薄膜的细晶化”日本应用磁学学会杂志 (25) 第 1 期。 2). 547-540 (2001)。
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斉藤弘幸, 清水優, 中川茂樹: "Si下地層上のCo/Cu多層膜の結晶性とGMR特性"日本応用磁気学会誌. 巻(25)号(4-2). 803-806 (2001)
Hiroyuki Saito、Masaru Shimizu、Shigeki Nakakawa:“Si 底层上 Co/Cu 多层膜的结晶度和 GMR 特性”,日本应用磁学学会杂志 (25) 第 803-806 期。 2001)
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船橋伸彦, 馮 潔, 松下伸広, 中川茂樹, 直江正彦: "Pt下地層改良によるBaMフェライト薄膜の微粒子化"日本応用磁気学会誌. 25・4-2. 547-540 (2001)
Nobuhiko Funabashi、Jie Feng、Nobuhiro Matsushita、Shigeki Nakakawa 和 Masahiko Naoe:“通过改进 Pt 底层实现 BaM 铁氧体薄膜的细晶化”日本应用磁学学会杂志 25・4-540(2001 年)。
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佐藤厚,中川茂樹,直江正彦: "Addition of SiO_2_to increase Coercivity and Squareness Ratio of BaFerrite Films for Perpendicular Magnetic Recording Media"IEICE Transactions on Electronics. 巻(E83C)号(9). 1492-1466 (2000)
Atsushi Sato、Shigeki Nakakawa、Masahiko Naoe:“添加 SiO_2_ 以提高垂直磁记录介质的 BaFerrite 薄膜的矫顽力和矩形比”IEICE Transactions on Electronics (E83C) 卷 1492-1466 (2000)。
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