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Development of magnetization reversal technique at low power consumption using a stress-induced magnetic anisotropy for perpendicular MRAM

Development of magnetization reversal technique at low power consumption using a stress-induced magnetic anisotropy for perpendicular MRAM
利用垂直 MRAM 的应力感应磁各向异性开发低功耗磁化反转技术
批准号:
17360137
负责人:
NAKAGAWA Shigeki
金额:
$9.98万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2005
资助国家:
日本
项目状态:
已结题
起止时间:
2005 至 2006

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中文摘要
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英文摘要
Thin films with perpendicular magnetic anisotropy have a potential to achieve high-density cell arrangements as a perpendicular magnetic random access memory (p-MRAM). We have demonstrated a new method to reduce perpendicular coercivity of DyFeCo films using a stress-induced magnetic anisotropy. An isotropic stress applied to in-plane direction of the film was so effective to cause reduction of perpendicular magnetic anisotropy during the writing process if the film has large magnetostriction constant. In this study, we have succeeded to cause magnetization reversal at low magnetic field as low as 1/6 of original coercivity of the film. Magnetization processes of the films were measured using anomalous Hall effects and in-plane stress to the films was induced by a mechanical indentation method. It is observed that about 500 Oe of magnetic field in the reverse direction is enough to reverse completely the magnetization of the film which has an original coercivity of 3.3 kOe if the in-plane stress is applied to the film. This technique is applicable to the writing process of p-MRAM with wide writing margin at low power consumption.
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An approach to estimate the magnetic anisotropy constants in a CoCrPt recording layer with NiFe soft underlayer
一种估计具有 NiFe 软底层的 CoCrPt 记录层磁各向异性常数的方法
DOI: --
发表时间: 2005
期刊: Journal of Magnetism and Magnetic Materials Vol.287
影响因子: --
作者: [S.Das, S.Nakagawa]
通讯作者: S.Nakagawa
Evaluation of magnetization behavior of Soft/RE-TM layer for perpendicular MRAM by anomalous Hall effect
通过反常霍尔效应评估垂直 MRAM Soft/RE-TM 层的磁化行为
DOI: --
发表时间: 2007
期刊: Journal of Magnetism and Magnetic Materials 310・2
影响因子: --
作者: [Tomoya Hatori, Shigeki Nakagawa]
通讯作者: Shigeki Nakagawa
Fabrication of CoCrPt-SiO_2 films on flexible tape substrate using facing target sputtering system
利用面向靶溅射系统在柔性带基材料上制备CoCrPt-SiO_2薄膜
DOI: --
发表时间: 2007
期刊: Journal of Magnetism and Magnetic Materials 310・2
影响因子: --
作者: [H.Fujiura, S.Nakagawa]
通讯作者: S.Nakagawa
DOI: --
发表时间: 2006
期刊: IEEE Transactions on Magnetics 42(11)
影响因子: --
作者: [S.Nakagawa, M.Yamada, N.Tokuriki]
通讯作者: N.Tokuriki
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