Control of material properties with photo-induced charge transfer using negative electron affinity surface

使用负电子亲和力表面通过光诱导电荷转移控制材料特性

基本信息

  • 批准号:
    13440101
  • 负责人:
  • 金额:
    $ 10.05万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 财政年份:
    2001
  • 资助国家:
    日本
  • 起止时间:
    2001 至 2003
  • 项目状态:
    已结题

项目摘要

We have been investigating the new way to control the charge transfer from semiconductor surfaces to the adsorbed films, which is based on our recent achievement of the new core-level photoelectron spectroscopy using, synchrotron radiation and laser light and also of the formation for, the negative-electron affinity surfaces. This is closely related the important problems such as transient change in the surface potential, dynamics of the photo-induced charge transfer, spin-polarized electrons, photo-induced phase transitions.The purpose of the present study is to apply the techniques mentioned above for the interface between the semiconductors and intelligent materials and control the material properties and spin,characters. Moreover, the important basic subjects related to the interfacial dynamics such as interfacial potential, non-equilibrium dynamics, photo-induced charge transfer, and production of new properties.(1)In this year, we have summarized the negative electron amity surfaces on GaAs. Also we have conducted the time-resolved measurements of surface photo-voltage effect and constructed the dynamical model for surface photo-voltage effects on GaAs and GaAsP-GaAs superlattices. The results have been published in the journals.(2)Based on the above results, we have developed our studies to the photo-induced phenomena on surfaces nad interfaces. The appreciable change was observed on p-GaAs(100)/Cr system in spite of the expectation for the suppression. Although the large photo-effect is expected on p-GaN, the photon-flux dependence of the surface photovoltage effect is not simple and shows the anomalous behavior. The analyses are under progress.(3)In order to investigate the fast dynamics of the surfaces, we have also been testing the new system consisted of an intense femt-second laser and a rare-gaseous chamber. The new microscopy system is under construction.
我们一直在研究控制电荷从半导体表面转移到吸附膜的新方法,这是基于我们最近取得的新核心级光电子能谱,使用同步辐射和激光,以及负电子亲和表面的形成。这与表面电位的瞬态变化、光致电荷转移动力学、自旋极化电子、光致相变等重要问题密切相关。本研究的目的是将上述技术应用于半导体与智能材料之间的界面,并控制材料的性质和自旋特性。此外,与界面动力学相关的重要基础学科如界面势、非平衡动力学、光诱导电荷转移和新性质的产生。(1)在这一年里,我们总结了GaAs上的负电子亲和面。此外,我们还进行了表面光电压效应的时间分辨测量,并建立了表面光电压效应对GaAs和GaAsP-GaAs超晶格的动力学模型。研究结果已发表在期刊上。(2)在上述结果的基础上,我们对表面和界面上的光致现象进行了进一步的研究。在p-GaAs(100)/Cr体系中观察到明显的变化,尽管预期抑制。虽然期望在p-GaN上产生较大的光效应,但表面光电压效应的光子通量依赖性并不简单,并且表现出异常行为。分析正在进行中。(3)为了研究表面的快速动力学,我们也一直在测试由强飞秒激光器和稀有气体室组成的新系统。新的显微镜系统正在建设中。

项目成果

期刊论文数量(56)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
S.Tanaka, T.Nishitani, T.Nakanishi, S.D.More, J.Azuma, K.Takahashi, O.Watanabe, M.Kamada: "Surface photovoltage effect and its time dependence in GaAs-GaAsP superlattice studied with combination of synchrotron and laser radiation"J.Appl.Physics. 95. 551-5
S.Tanaka、T.Nishitani、T.Nakanishi、S.D.More、J.Azuma、K.Takahashi、O.Watanabe、M.Kamada:“结合同步加速器和混合加速器研究了 GaAs-GaAsP 超晶格中的表面光电压效应及其时间依赖性”
  • DOI:
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  • 期刊:
  • 影响因子:
    0
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K.Soda: "Core-level photoelectron study of Si(111) √<7>x√<3>-(pb,Sn) surface"Nucl.Instr.Methods B. 199. 419-421 (2003)
K.Soda:“Si(111) √<7>x√<3>-(pb,Sn) 表面的核心级光电子研究”Nucl.Instr.Methods B. 199. 419-421 (2003)
  • DOI:
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    0
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  • 通讯作者:
S.More: "Interaction of Cs and O with GaAs(100) at the overlayer-substrate interface during negative electron affinity type activations"surface Science. 527. 41-50 (2003)
S.More:“在负电子亲和力类型激活过程中,Cs 和 O 与 GaAs(100) 在覆盖层-基底界面处的相互作用”表面科学。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
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  • 通讯作者:
T.Tsujibayashi, K.Toyoda, S.Sakuragi, M.Kamada, M.Itoh: "Spectral profile of the two-photon absorption coefficients in CaF2"Appl. Phys. Lett.. 80. 2883-2885 (2002)
T.Tsujibayashi、K.Toyoda、S.Sakuragi、M.Kamada、M.Itoh:“CaF2 中双光子吸收系数的光谱轮廓”Appl。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
鎌田 雅夫: "極限状態を見る放射光アナリシス"日本分光学会、測定法シリーズ40. 49-58 (2002)
Masao Kamata:“同步辐射分析观察极端状态”日本分光学会,测量方法系列 40. 49-58 (2002)
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    0
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KAMADA Masao其他文献

KAMADA Masao的其他文献

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{{ truncateString('KAMADA Masao', 18)}}的其他基金

Development of New Analyzing Method of Excited States Using Combination of Soft X-Rays and Laser
软X射线与激光相结合的激发态分析新方法的开发
  • 批准号:
    17360022
  • 财政年份:
    2005
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
New Spectroscopy using combination of synchrotron radiation and laser
结合同步辐射和激光的新型光谱学
  • 批准号:
    11215210
  • 财政年份:
    1999
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research on Priority Areas (B)
Core-level Spectroscopy using Coincidence of Synchrotron Radiation and Laser
利用同步辐射和激光同时进行的核心级光谱学
  • 批准号:
    10304025
  • 财政年份:
    1998
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A).
Study of photodesorption dynamics by using pulsive synchrotron radiation
利用脉冲同步辐射研究光解吸动力学
  • 批准号:
    05452045
  • 财政年份:
    1993
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Surface Analysis by Using Inverse Photoelectron Spectroscopy
使用反光电子能谱进行表面分析
  • 批准号:
    02650032
  • 财政年份:
    1990
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)

相似海外基金

A study on a new measurement technique of electron diffusion length in semiconductors using an electron emission mechanism with negative electron affinity
利用负电子亲和势电子发射机制测量半导体中电子扩散长度的新技术研究
  • 批准号:
    21K04893
  • 财政年份:
    2021
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Research of surface termination mechanism for high density positronium production based on negative electron affinity
基于负电子亲和势的高密度正电子素产生表面终止机制研究
  • 批准号:
    19K21882
  • 财政年份:
    2019
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Challenging Research (Exploratory)
Restoration of negative electron affinity feature on high-quality diamond surfaces using liquid process
使用液体工艺恢复高质量金刚石表面的负电子亲和力特征
  • 批准号:
    26600085
  • 财政年份:
    2014
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
Experimental research on negative electron affinity device utilizing diamond pn junctions
利用金刚石pn结的负电子亲和力器件的实验研究
  • 批准号:
    21360174
  • 财政年份:
    2009
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Search for Survive Negative Electron Affinity (NEA) Method
寻找生存负电子亲和力 (NEA) 方法
  • 批准号:
    19760049
  • 财政年份:
    2007
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Young Scientists (B)
A study of electron and spin state of magnetic thin layer grown on negative electron affinity semiconductor
负电子亲和势半导体上生长的磁性薄层的电子和自旋态研究
  • 批准号:
    18560021
  • 财政年份:
    2006
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Realization of long time stable negative electron affinity surface and production of efficient emitter
实现长期稳定的负电子亲和力表面和高效发射极的生产
  • 批准号:
    15560019
  • 财政年份:
    2003
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Electron emission mechanism from negative electron affinity surface and production of highly efficient electron emitter
负电子亲和力表面的电子发射机理及高效电子发射体的制备
  • 批准号:
    13650027
  • 财政年份:
    2001
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Development of New Electronic Emitters using GaN/AIN Super Lattice Structures with Negative Electron Affinity
使用具有负电子亲和势的 GaN/AlN 超级晶格结构开发新型电子发射器
  • 批准号:
    11555094
  • 财政年份:
    1999
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
The Use of Surfaces of Rare-Earth Elements to Achieve Durable Negative Electron Affinity Cold Cathodes, Photocathodes, and Polarized Electron Sources
利用稀土元素表面实现耐用的负电子亲和力冷阴极、光电阴极和极化电子源
  • 批准号:
    9906053
  • 财政年份:
    1999
  • 资助金额:
    $ 10.05万
  • 项目类别:
    Continuing Grant
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