Development of Direct Patterning for Ceramics Films by Soft Solution Processing

我们已经开发了新的直接图案化方法，通过界面激活反应使用水溶液如下：（1）激光图案化系统的设计和构建，通过激光照射在目标基板上的现场制造激活相当窄的区域。激光照射在基片上的点立即被加热，因此它可以被激活为一个微型高压釜进行水热反应。该图形化系统可以在溶液中在各种衬底上直接制备出直径小于10 μ m的BaTiO_3、SrTiO_3和TiO_2薄膜图形。(2)设计并构建了一套喷墨图案化系统，用于在基底上绘制图案。利用该系统，通过不同溶液之间的反应，在衬底上形成了CdS和PbS的结晶图形。(3)在乙醇介质中，通过在硅衬底之间施加高压，在硅衬底上直接构图碳膜。通过拉曼散射研究了所制备的碳图案，以证明该图案由类金刚石碳组成。

We have developed new direct patterning methods by interface-activated reactions using an aqueous solution as follows :(1) A laser patterning system was designed and constructed to activate quite narrow area by laser irradiation on the target substrate for on-site fabrication. The laser irradiated point on substrate is heated immediately, thus it can be activated as a micro-autoclave for hydrothermal reaction. This patterning system enabled to fabricate directly crystallized BaTiO_3, SrTiO_3 and TiO_2 thin films pattern, less than 10 micrometer in diameter, on various substrates in solutions.(2) An ink-jet patterning system was designed and constructed to draw pattern on the substrate. Using this ink-jet patterning system, the crystallized CdS and PbS patterns has been fabricated by reaction between deferent solutions on the substrate.(3) The direct patterning of carbon film on silicon substrate has been done by applying high voltage between silicon substrate in ethanol. The prepared carbon pattern has been investigated by Raman scattering to demonstrate that the pattern consisted of diamond like carbon.