Development of Direct Patterning for Ceramics Films by Soft Solution Processing

我们开发了一种新的利用水溶液界面激活反应的直接图案化方法：(1)设计并构建了一种激光图案化系统，通过激光照射在靶基板上激活相当窄的区域，用于现场制造。激光照射在基材上的点被立即加热，因此它可以作为一个微热压釜被激活，用于水热反应。该系统能够在溶液中制备直径小于10微米的BaTiO_3、SrTiO_3和TiO_2直接结晶薄膜图案。(2)设计并构建了喷墨图案化系统，用于在基材上绘制图案。利用该喷墨系统，通过不同溶液在衬底上的反应，制备了结晶化的CdS和PbS图案。(3)在乙醇溶液中对硅衬底施加高压，直接在硅衬底上形成碳薄膜。用拉曼散射对所制备的碳图案进行了研究，证实了该图案是由类金刚石碳组成的。

We have developed new direct patterning methods by interface-activated reactions using an aqueous solution as follows :(1) A laser patterning system was designed and constructed to activate quite narrow area by laser irradiation on the target substrate for on-site fabrication. The laser irradiated point on substrate is heated immediately, thus it can be activated as a micro-autoclave for hydrothermal reaction. This patterning system enabled to fabricate directly crystallized BaTiO_3, SrTiO_3 and TiO_2 thin films pattern, less than 10 micrometer in diameter, on various substrates in solutions.(2) An ink-jet patterning system was designed and constructed to draw pattern on the substrate. Using this ink-jet patterning system, the crystallized CdS and PbS patterns has been fabricated by reaction between deferent solutions on the substrate.(3) The direct patterning of carbon film on silicon substrate has been done by applying high voltage between silicon substrate in ethanol. The prepared carbon pattern has been investigated by Raman scattering to demonstrate that the pattern consisted of diamond like carbon.