Growth and characterization of Isotopically Enrichied ^<28>Si Single Crystals
Growth and characterization of Isotopically Enrichied ^<28>Si Single Crystals
批准号:
13555005
负责人:
ITOH Kohei
金额:
$8.45万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2002
中文摘要
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英文摘要
We report on the measurements of the thermal conductivity of natural (^<nat>Si) and isotopically pure ^<28>Si as a function of temperature. The isotopically enrichied ^<28>Si employed is dislocation free with the electrically active net-impurity concentration (p-type) less than 1x10^<15>cm^<-3>. Oxygen and carbon concentrations are less than 1x10^<17>cm^<-3> for it was under the detection limit of FTIR. At room temperature, the ^<28>Si sample is measured to have the thermal conductivity about 10% higher than that of ^<nat>Si. This increase is in agreement with the experimental result reported recently [A. V. Gusev, A. M. Gibin, O. N. Morozkin, V. A. Gavva, and A. V. Mitin, Inorganic Materials, 38, 1305 (2002)], but in sever disagreement with the previously reported value of 60% at the room temperature. [T. Ruf, R. W. Henn, M. Asen-Palmer, E. Gmelin, M. Cardona, H. -J. Pohl, G. G. Devyatych and P. G. Sennikov, Solid State Commun. 115, 243 (2000).] It is therefore important to identify the true thermal conductivity of ^<28>Si in the future.
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T. Takahashi, S. Fukatsu, K. M. Itoh, M, Uematsu, A. Fujiwara, H. Kageshima, Y. Takahashi, and K, Shiraishi: "Self-Diffusion of Si in Thermally Grown SiO_2 under Equilibrium Conditions"J. Appl. Phys.. Vol.93, No.6. 3674-3676 (2003)
T. Takahashi、S. Fukatsu、K. M. Itoh、M、Uematsu、A. Fujiwara、H. Kageshima、Y. Takahashi 和 K,Shiraishi:“平衡条件下热生长 SiO_2 中 Si 的自扩散”J。
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T.Takahashi, S.Fukatsu, K.M.Itoh 他4名: "Self-Diffusion of Si in Thermally Grown SiO_2 under Equilibrium Condition"J.Appl.Phys.. 93・6. 3674-3676 (2003)
T.Takahashi、S.Fukatsu、K.M.Itoh 等 4 人:“平衡条件下热生长 SiO_2 中 Si 的自扩散”J.Appl.Phys.. 93・6 (2003)。
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作者:
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通讯作者:
T.Takahashi, S.Fukatsu, K.M.Itoh 他4名: "Self-Diffusion of Si in Thermally Grown SiO_2 under Equilibrium Conditions"J. Appi. Phys.. 93・6. 3674-3676 (2003)
T.Takahashi、S.Fukatsu、K.M.Itoh 等 4 人:“平衡条件下热生长 SiO_2 中 Si 的自扩散”J. Appi. 93・6 (2003)。
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伊藤 公平, 田久 賢一郎: "シリコン同位体単結晶の応用"応用物理. 70・10. 1187-1190 (2001)
伊藤晃平、拓健一郎:“硅同位素单晶的应用”应用物理学70・1190(2001)。
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通讯作者:
Quantum entanglements and holographic memory operation in silicon
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批准号:22241024
-
项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$29.45万
-
财政年份:2010
-
负责人:ITOH Kohei
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依托单位:
Correlated diffusion of impurities and silicon in next-generation gate insulating film
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批准号:16360021
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.41万
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财政年份:2004
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负责人:ITOH Kohei
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依托单位:
Fabrication and control of nuclear-and electron spin quantum bits
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批准号:14076215
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$27.52万
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财政年份:2002
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负责人:ITOH Kohei
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依托单位:
Metal-Insulator Transition in Neutron Transmutation Doped Ge
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批准号:11440117
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项目类别:Grant-in-Aid for Scientific Research (B).
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资助金额:$2.88万
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财政年份:1999
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负责人:ITOH Kohei
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依托单位:
海外基金