Material Processing with Cluster Ion Beams

使用簇离子束进行材料加工

• 批准号: 09044157
• 负责人: YAMADA Isao
• 金额: $ 3.14万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for international Scientific Research
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09044157/
• 关键词: cluster ion; TEM; enhaned reaction; multiple collision; STM; induced reaction; interstitial

An impact process of a cluster ion is far from monomer ion impact process. The peculiarity of the cluster ion collision on solid surfaces is the so-called "nonlinear phenomena". Unique bombardment effects have been reported for damage formation, sputtering and chemical reaction on solid surfaces. Many atoms impact on small surface area within femlo-second time scale. Therefore, a new interaction of each collision of the cluster constituent atoms with the surface atoms is expected. These dense collisions cause high yield of sputtering, surface smoothing, shallow implantation and high yield of secondary ion emission. The surface smoothing effect of cluster ions has been applied to many materials. We have studied irradiation effects on cluster ions, which are the aggregates of a few to thousands.Boron clusters with the size of ten are implanted to silicon. We have demonstrated shallow junction formation with so-called Decaboran ions. The irradiated region was investigated with EM(Transmission Electron Microscope) and RBIS(Rutherford Back scattering). The number of disordered atoms with cluster ion irradiation is an order of magnitude higher than that with monomer ion irradiation. The irradiated region can be completely amorphousized and recrystallized at low temperature without any damages. These phenomena are also found in the case of carbon cluster irradiation.

簇离子的影响过程远非单体离子撞击过程。固体表面上簇离子碰撞的特殊性是所谓的“非线性现象”。据报道，在固体表面上的损伤形成，溅射和化学反应已有报道。许多原子会影响Femlo秒时间尺度内的小表面积。因此，预计簇成分原子每次碰撞与表面原子的新相互作用。这些密集的碰撞会导致高溅射，表面平滑，浅植入和高产量发射的高收率。簇离子的表面平滑作用已应用于许多材料。我们研究了对簇离子的辐照作用，簇离子是几到千的聚集体。将大小约为十的簇簇植入硅。我们已经证明了与所谓的decaboran离子的浅色结。用EM（透射电子显微镜）和RBI（卢瑟福后散射）研究了辐照区域。簇离子辐照的无序原子的数量比单体离子辐照的数量级高。辐照区域可以在低温下完全非晶态和重结晶而不会造成任何损害。在碳簇照射的情况下，也发现了这些现象。

项目成果

I.Yamada: "Angular Distributions of the Particles Sputtered with Ar Cluster Ions" Materials Chemistry and Physics. Vol.54. 262-265 (1998)

I.Yamada：“用 Ar 簇离子溅射的粒子的角分布”材料化学和物理。

I.Yamada, J.Matsuo, E.C.Jones, D.Takeuchi, T.Aoki, K.Goto and T.Sugii: "Range and damage distribution in cluster ion implantation" Materials Research Society Symposium Proceedings. 438. 363-374 (1997)

I.Yamada、J.Matsuo、E.C.Jones、D.Takeuchi、T.Aoki、K.Goto 和 T.Sugii：“簇离子注入中的范围和损伤分布”材料研究学会研讨会论文集。

Z.Insepov and I.Yamada: "Computer simulation of crystal surface modification by accelerated cluster ion impacts" Nuclear Instruments and Methods in Physics Research B. 112. 44-48 (1997)

Z.Insepov 和 I.Yamada：“通过加速簇离子撞击对晶体表面改性的计算机模拟”核仪器和物理研究方法 B. 112. 44-48 (1997)

I.Yamada: "Progress, Demands and Prospects for Advanced Ion Beam Processing" Materials Chemistry and Physics. Vol.54. 5-14 (1998)

I.Yamada：“先进离子束加工的进展、需求和前景”材料化学和物理。

T.Seki, T.Kaneko, D.Takeuchi, T.Aoki, J.Matsuo, Z.Insepov and I.Yamada: "STM observasion of HOPG surfaces irradiated with Ar cluster ions" Nuclear Instruments and Methods in Physics Research B. 121. 781-785 (1997)

T.Seki、T.Kaneko、D.Takeuchi、T.Aoki、J.Matsuo、Z.Insepov 和 I.Yamada：“STM 观察用 Ar 簇离子照射的 HOPG 表面” 物理研究中的核仪器和方法 B.121