Material Processing with Cluster Ion Beams

使用簇离子束进行材料加工

• 批准号: 09044157
• 负责人: YAMADA Isao
• 金额: $ 3.14万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for international Scientific Research
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09044157/
• 关键词: cluster ion; TEM; enhaned reaction; multiple collision; STM; induced reaction; interstitial

An impact process of a cluster ion is far from monomer ion impact process. The peculiarity of the cluster ion collision on solid surfaces is the so-called "nonlinear phenomena". Unique bombardment effects have been reported for damage formation, sputtering and chemical reaction on solid surfaces. Many atoms impact on small surface area within femlo-second time scale. Therefore, a new interaction of each collision of the cluster constituent atoms with the surface atoms is expected. These dense collisions cause high yield of sputtering, surface smoothing, shallow implantation and high yield of secondary ion emission. The surface smoothing effect of cluster ions has been applied to many materials. We have studied irradiation effects on cluster ions, which are the aggregates of a few to thousands.Boron clusters with the size of ten are implanted to silicon. We have demonstrated shallow junction formation with so-called Decaboran ions. The irradiated region was investigated with EM(Transmission Electron Microscope) and RBIS(Rutherford Back scattering). The number of disordered atoms with cluster ion irradiation is an order of magnitude higher than that with monomer ion irradiation. The irradiated region can be completely amorphousized and recrystallized at low temperature without any damages. These phenomena are also found in the case of carbon cluster irradiation.

簇离子的撞击过程与单体离子的撞击过程相差甚远。固体表面上团簇离子碰撞的特殊性是所谓的“非线性现象”。据报道，固体表面上的损伤形成、溅射和化学反应具有独特的轰击效应。许多原子在飞秒时间尺度内撞击较小的表面积。因此，预计团簇组成原子与表面原子的每次碰撞都会产生新的相互作用。这些密集的碰撞导致高产率的溅射、表面平滑、浅注入和高产率的二次离子发射。簇离子的表面平滑作用已应用于许多材料。我们研究了对团簇离子的辐照效应，团簇离子是几个到数千个的聚集体。将十个大小的硼团簇注入硅中。我们已经证明了与所谓的十硼烷离子形成浅结。使用EM（透射电子显微镜）和RBIS（卢瑟福背散射）对照射区域进行研究。簇离子照射的无序原子数量比单体离子照射高一个数量级。辐照区域可在低温下完全非晶化和再结晶，而不会造成任何损伤。在碳簇辐射的情况下也发现了这些现象。

项目成果

I.Yamada: "Angular Distributions of the Particles Sputtered with Ar Cluster Ions" Materials Chemistry and Physics. Vol.54. 262-265 (1998)

I.Yamada：“用 Ar 簇离子溅射的粒子的角分布”材料化学和物理。

I.Yamada, J.Matsuo, E.C.Jones, D.Takeuchi, T.Aoki, K.Goto and T.Sugii: "Range and damage distribution in cluster ion implantation" Materials Research Society Symposium Proceedings. 438. 363-374 (1997)

I.Yamada、J.Matsuo、E.C.Jones、D.Takeuchi、T.Aoki、K.Goto 和 T.Sugii：“簇离子注入中的范围和损伤分布”材料研究学会研讨会论文集。

Z.Insepov and I.Yamada: "Computer simulation of crystal surface modification by accelerated cluster ion impacts" Nuclear Instruments and Methods in Physics Research B. 112. 44-48 (1997)

Z.Insepov 和 I.Yamada：“通过加速簇离子撞击对晶体表面改性的计算机模拟”核仪器和物理研究方法 B. 112. 44-48 (1997)

T.Seki, T.Kaneko, D.Takeuchi, T.Aoki, J.Matsuo, Z.Insepov and I.Yamada: "STM observasion of HOPG surfaces irradiated with Ar cluster ions" Nuclear Instruments and Methods in Physics Research B. 121. 781-785 (1997)

T.Seki、T.Kaneko、D.Takeuchi、T.Aoki、J.Matsuo、Z.Insepov 和 I.Yamada：“STM 观察用 Ar 簇离子照射的 HOPG 表面” 物理研究中的核仪器和方法 B.121

I.Yamada: "Progress, Demands and Prospects for Advanced Ion Beam Processing" Materials Chemistry and Physics. Vol.54. 5-14 (1998)

I.Yamada：“先进离子束加工的进展、需求和前景”材料化学和物理。