Physicochemical Study on Preparation of Oxidation-Resistant Films on High Temperature Materials and Their Oxidation Rate.
Physicochemical Study on Preparation of Oxidation-Resistant Films on High Temperature Materials and Their Oxidation Rate.
批准号:
63430013
负责人:
NAGATA Kazuhiro
金额:
$0.96万
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (A)
财政年份:
1988
资助国家:
日本
项目状态:
已结题
起止时间:
1988 至 1989
中文摘要
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英文摘要
Improvement of energy efficiency requires materials for high temperature use in oxidizing atmospheres. The coating of oxidation-resistant films on materials is one of the most favorable ways without the degradation of their mechanical properties. Silica and alumina are the potential materials for oxidation-resistant films at temperatures higher than 1000 C in oxidizing conditions. This research dealt with the physical chemistry involving in the preparation or formation of silica and alumina on the surface of high temperature materials, and the protective property against oxidation.(1) Physicochemical Study on Silica Films on Silicon (a)Mechanism of thermal oxidation of silicon Three kind of silica films were formed on silicon substrates by thermal oxidation, chemical vapor deposition and spin-on glass techniques. These samples were oxidized at elevated temperatures to evaluate the diffusivity of oxygen in the films. The diffusivity varied among the films because of the difference in th … More e microstructure. Oxygen pressure dependence of the oxidation rate indicated that the solubility of oxygen in the silica film was proportional to the oxygen pressure and that the diffusivity was independent of the pressure. (b)Development of a new technique for measurement of thermal conductivity of thin films A new technique named "Spot-Pulse Method" was developed, in which technique a pulsed laser beam was focused on the film and the change in surface temperature was measured. This technique proved to be applied the films with thickness more than 25mum.(2) Aluminide Coatings on Molybdenum for High Temperature Use (a)Pack-cementation coating of aluminum on molybdenum Aluminum was coated on molybdenum by pack-cementation. A thick film of Mo_3O_8 was formed and thin film of Mo_3Al existed between Mo_3O_8 and Mo. The coating layer contained many cracks which formed during cooling. The cracks were developed perpendicularly to the surface, and some of them reached the Mo substrate. The oxidation resistance of the coated Mo was poor because of the crack reaching the substrate although Mo_3O_8 itself exhibited the high resistance to oxidation forming a continuous Al_2O_3 fayer. (b)Two-stage coating of Si and Al Two-stage coating of Si and Al was developed, in which a small amount of Si was coated prior to the aluminide coating. Mirostructure of the two-stage coating was basically same as that of the aluminide coating but the marked suppression of the formation of cracks. The absence of cracks reaching the Mo substrate provided the extremely strong resistance to high temperature oxidation. Less
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須佐匡裕,篠原秀幸,永田和宏,後藤和弘: "非晶質シリカ薄膜中の酸素の拡散" 日本金属学会誌. 54. 193-200 (1990)
Masahiro Susa、Hideyuki Shinohara、Kazuhiro Nagata、Kazuhiro Goto:“无定形二氧化硅薄膜中的氧扩散”日本金属学会杂志 54. 193-200 (1990)。
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Masahiro Susa, Hideyuki Shinohara, Kazuhiro Nagata, Kazuhiro S. Goto: "Influence of Bromine on Thermal Oxidation of Silicon Subsrtates" Journal of the Japan Institute of Metals, 53, pp.1054-1061, (1989).
Masahiro Susa、Hideyuki Shinohara、Kazuhiro Nagata、Kazuhiro S. Goto:“溴对硅基材热氧化的影响”日本金属学会杂志,53,第 1054-1061 页,(1989 年)。
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張力〓,後藤和弘: "表示素子WO_<3ー6>薄膜の作成とLi^+の拡散係数の測定" 日本金属学会誌. 53. 906-913 (1989)
张力〓,Kazuhiro Goto:“显示元件WO_<3-6>的薄膜的制备和Li^+的扩散系数的测量”日本金属学会杂志53. 906-913(1989)。
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張力偉,後藤和弘: "表示素子WO_<3-6>薄膜の作成とLi^+の拡散係数の測定" 日本金属学会誌. 53. 906-913 (1989)
田伟、后藤一宏:“显示元件用薄膜WO_<3-6>的制备及Li^+的扩散系数的测定”日本金属学会学报53. 906-913(1989)。
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Masahiro Susa, Kazuhiro Nagata, Kazuhiro S. Goto: "Mechanism of Thermal Oxidation of Silicon Substrates" Journal of the Japan Institute of Metals, 54, pp.33-40, (1990).
Masahiro Susa、Kazuhiro Nagata、Kazuhiro S. Goto:“硅基板热氧化的机理”日本金属学会杂志,54,第33-40页,(1990)。
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共 25 条
Mechanism of the maintenance of ER homeostasis by redox regulation
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Novel therapeutic strategy of ARDS by the development of Tyrosine kinase PYK2
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Quality control mechanism of misfolded proteins
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Quality control mechanism for positive and negative
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Molecular mechanism of ER-related degradation
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批准号:14037230
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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财政年份:2002
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Two novel chaperone-like proteins involved in ER quality control mechanism
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Electrochemical reaction of ions in molten slags with electron in thermal plasma
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财政年份:1999
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New Ironmaking Method at Lower Temperature and Higher Oxygen Potential
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财政年份:1999
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Regulation of cellular Function by molecular chaperones
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批准号:09276102
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资助金额:$54.78万
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财政年份:1997
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Steelmaking Mechanisms for a Tatara Furnace and New Ironmaking
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批准号:09450277
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Removal of Copper, Zinc and Tin from Iron-based Scraps by Chlorine-Oxygen Gas Mixtures
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Structure and function of stress proteins
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The role of substrate-specific molecular chaperone in the trimerization of procollagen.
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The role of collagen-specific molecular chaperone HSP47
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Thermophysical Data for the Development of Mathematical Models of Solidification
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批准号:06044271
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Regulatory mechanism of the expression of vimentin gene during the differentiation of leukemic cells.
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The role of stress proteins in the protein biosynthesis.
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批准号:04044100
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Biochemical and molecular biological research for the function and regultion of a collagen receptor
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海外基金