Adhesion Between Sputter-Deposited Polymer Films and Metal Substrates.

溅射沉积聚合物薄膜和金属基材之间的粘合力。

• 批准号: 01550056
• 负责人: YAMADA Yoshinori
• 金额: $ 1.28万
• 依托单位: Kanazawa University, Faculty of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1989
• 资助国家: 日本
• 起止时间: 1989 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-01550056/
• 关键词: Thin polymer film; RF-sputtering; AE event; ESCA; Scratch test; Frictional durability; Tensile pull test; Adhesion strength; 高周波スパッタ; 高分子; 薄膜; 摩擦; 付着性; AE

1. Thin polymer films were deposited on kinds of substrates (glass, copper and nickel plates) by RF-sputtering various polymers. The surface texture and the deposition process of the films were examined by means of SEM and non-contacting profilometer. Especially, with the sputter-deposited PTFE films, molecular structure of the film were examined by ESCA, and to investigate the adhesion between the films and some metals, critical disk revolutions (frictional durability) and critical load were measured by means of a multipleーscratch test under a constant load and a single-scratch test under a load increasing at a constant rate, respectively. In addition to these scratch tests, the tensile pull test was also carried out. 2. (1) Although the film deposition rate by sputtering technique was lower than that by vacuum evaporation technique, the quality (surface roughness, pinーhole free) of the sputter-deposited films were superior to that of evaporated films. (2) The fluorine content of the … More sputter-deposited PTFE was lower than that of bulk PTFE, and depend on the sputtering condition. C_<1sn> ESCA spectrum of sputter-deposited PTFE films exhibited very broad spectrum band composed of four components in contrast to a narrow single spectrum of bulk PTFE. The ESCA results suggested that the molecular chains of the sputter-deposited PTFE film had many branches and crosslinks and/or lower molecular weight than those of bulk PTFE. (3) Under the two types of scratch tests, the variation of friction force and AE event count rate were observedcorres ponding to an initiation of the film damage. (4) The critical disk devolution and the critical load were depend on the type of the polymer films, sputtering conditions and the type of the substrate. (5) The adhesion between the sputter-deposited PTFE films and the evaporated metal films were higher than that between bulk PTFE and the evaporated metal films, and the films deposited under a lower pressure exhibited higher adhesion to the evaporated metal films than the films deposited under a higher pressure. Less

1.利用射频溅射技术在不同基片(玻璃、铜板和镍板)上沉积了聚合物薄膜。利用扫描电子显微镜和非接触轮廓仪对薄膜的表面织构和沉积过程进行了分析。特别是，对于溅射沉积的聚四氟乙烯薄膜，用电子能谱分析了薄膜的分子结构，并通过恒定载荷下的多次ー划痕试验和恒速载荷增加下的单次划痕试验分别测量了薄膜与某些金属之间的临界转数(摩擦耐久性)和临界载荷。除了这些划痕试验外，还进行了拉伸拉力试验。2.(1)虽然溅射法制备的薄膜沉积速率低于真空蒸发法制备的薄膜，但溅射沉积的薄膜质量(表面粗糙度、无针孔ー)均优于蒸发膜。(2)…的氟含量更多的溅射聚四氟乙烯比块体聚四氟乙烯低，并且取决于溅射条件。溅射聚四氟乙烯薄膜的C&lt；1SN&GT；ESCA谱显示出由四个组分组成的很宽的光谱带，而块体聚四氟乙烯的单一光谱很窄。ESCA分析结果表明，溅射沉积的聚四氟乙烯薄膜的分子链具有较多的支链和交联物，且分子量比块体聚四氟乙烯低。(3)在两种类型的划痕试验中，摩擦力和声发射事件计数率的变化与膜损伤的开始相对应。(4)聚合物膜的类型、溅射条件和衬底的类型决定了聚合物膜的临界圆盘剥离和临界载荷。(5)溅射沉积的聚四氟乙烯薄膜与蒸发金属膜的附着力高于块体聚四氟乙烯与蒸发金属膜的附着力，较低气压下沉积的薄膜与蒸发金属膜的附着力高于较高气压下沉积的薄膜。较少

项目成果

Y.YAMADA,K.TANAKA,S.SAITO: "FRICTION AND DAMAGE OF COATINGS FORMED BY SPUTTERING POLYTRTRAFLUOROETHYLENE AND POLYMIDE" Surface and Coatings Technology. 43. 618-628 (1990)

Y.YAMADA、K.TANAKA、S.SAITO：“溅射聚四氟乙烯和聚酰胺形成的涂层的摩擦和损坏”表面和涂层技术。

Y.YAMADA, K.TANAKA, S.SAITO: "FRICTION AND DAMAGE OF COATINGS FORMED BY SPUTTERING POLYTRTRAFLUOROETHYLENE AND POLYMIDE" Surface and Coatings Technology. 43. 618-628 (1990)

Y.YAMADA、K.TANAKA、S.SAITO：“溅射聚四氟乙烯和聚酰胺形成的涂层的摩擦和损坏”表面和涂层技术。

YOSHINORI YAMADA, KYUICIERO TANAKA and KIYOSHI SAITO: "Friction and Damage of Coatings Formed by Sputtering Polytetrafluoroethylene and Polyimide" Surface and Coatings technology. 43/44. 618-628 (1990)

YOSHINORI YAMADA、KYUICIERO TANAKA 和 KIYOSHI SAITO：“溅射聚四氟乙烯和聚酰亚胺形成的涂层的摩擦和损坏”表面和涂层技术。