X-RAY STRUCTURES OF HETEROEPITAXIAL GROWTHS

异质外延生长的 X 射线结构

基本信息

  • 批准号:
    03402052
  • 负责人:
  • 金额:
    $ 9.92万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for General Scientific Research (A)
  • 财政年份:
    1991
  • 资助国家:
    日本
  • 起止时间:
    1991 至 1993
  • 项目状态:
    已结题

项目摘要

1. The structure of epitaxial CaSrF2 crystals grown on GaAs(111) substrates, as well as of their interfaces, have been fully characterized. The results have been published in Surface Science.2. The structure of growth interface of untrathin EuBaCuo and GdBaCuO epitaxial crystals on SrTiO3(001) surface have been investigated using the X-ray standing-wave technique. The experimental data show that for both EuBaCuO and GdBaCuO neither the CuO layr nor CuO2 layr can be the first grown layr on the TiO2 surface of SrTiO3 Similary, neither the BaO layr nor the rare-earth layr can be the first layr on the SrO surface. The results have been published in Physical Review.3. Grazing-angle X-ray standing experiments were performed for the first time on Asdeposited Si(111) surface under ultrahigh vacuum conditions. It has been confirmed that arsenic atoms form a bulklike surface replacing the top-layr Si atoms at the threefold positions. Evidences indicating that the As atoms occupy the high-symmetry sites with little disorder was obtained. The research has been published in Physical Review.4. Preliminary experiments were executed on Si(100) : As surface using the grazing-angle X-ray standing-wave technique.5. Microroughness of mechanochemically polished silicon surfaces has been evaluated by grazing-angle X-ray reflectivity measurements. It has been demonstrated that the technique can quantitatively determine roughnesses of 2-5 A rms without damaging the sample. An original paper was printed in J.Jpn.Appl.Phys.out of the work.
1.在GaAs(111)衬底上生长的CaSrF_2晶体的外延结构及其界面结构已被充分表征。研究结果已发表在Surface Science上。本文用X射线驻波技术研究了超薄EuBaCuO和GdBaCuO外延晶体在SrTiO_3(001)表面生长界面的结构。实验结果表明,EuBaCuO和GdBaCuO在SrTiO_3的TiO_2表面上,CuO层和CuO_2层都不是第一生长层。同样,BaO层和稀土层也不是第一生长层。研究结果发表在Physical Review.3上。首次在超真空条件下对Asdeposited Si(111)表面进行了掠角X射线静置实验。已证实砷原子在三重位置形成块状表面取代顶层Si原子。结果表明,As原子占据了高对称位,且无序度很小。该研究已发表在《物理评论》上。利用掠角X射线驻波技术在Si(100):As表面进行了初步的实验研究.机械化学抛光的硅表面的微观粗糙度已被评估掠角X射线反射率测量。它已被证明,该技术可以定量测定2-5 A rms的粗糙度,而不会损坏样品。本文在《J.Jpn.Appl.Phys.》上发表了一篇原创论文。

项目成果

期刊论文数量(18)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
H.Hashiqume: "CaSrF_2/GaAs and CaF_2/S/GaAs interface structure revealed by X-ray standing waver and crgstal truncatiin rods" Abstract book of AsCA′92. 16P02 (1992)
H.Hashiqume:“X射线驻波和crgstal truncatiin rod揭示的CaSrF_2/GaAs和CaF_2/S/GaAs界面结构” AsCA92摘要书(1992)。
  • DOI:
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    0
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  • 通讯作者:
Osami Sakata: "X-ray evaluation of microroughness of mechanochemically polished silicon surfaces" Jpn.J.Applied Physics. 32. L616-L619 (1993)
Osami Sakata:“机械化学抛光硅表面微观粗糙度的 X 射线评估”Jpn.J.应用物理学。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
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  • 通讯作者:
Takaki Nwa: "In-plane structure of CaSrF_2/GaAs(111)Bheteroepitaxial eyterface" Photon Factory Activity Report. 10. (1993)
Takaki Nwa:“CaSrF_2/GaAs(111)Bheteroepittropic eyterface 的面内结构”光子工厂活动报告。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
Osami Sakata: "X-ray evaluation of microroughness of mechano-chemically polished silicon Surfaces" Jpn.J.Appl.Phys.32. L616-L619 (1993)
Osami Sakata:“机械化学抛光硅表面微观粗糙度的 X 射线评估”Jpn.J.Appl.Phys.32。
  • DOI:
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  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
T.Niwa, M.Sugiyama, T.Nakahata, O.Sakata and H.Hashizume: "Structure of Fluoride/GaAs(111) heteroepitaxial interfaces" Surface Science. vol.282. 342-356 (1993)
T.Niwa、M.Sugiyama、T.Nakahata、O.Sakata 和 H.Hashizume:“氟化物/GaAs(111) 异质外延界面的结构”表面科学。
  • DOI:
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  • 期刊:
  • 影响因子:
    0
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HASHIZUME Hiroo其他文献

HASHIZUME Hiroo的其他文献

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{{ truncateString('HASHIZUME Hiroo', 18)}}的其他基金

Development of new techniques for the analysis of magnetic structures using third-generation synchrotron X-ray sources
开发利用第三代同步加速器X射线源分析磁结构的新技术
  • 批准号:
    10044071
  • 财政年份:
    1998
  • 资助金额:
    $ 9.92万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B).
Analysis of interface magnetic structures in magnetic thin films using resonant X-ray scattering techniques
使用共振 X 射线散射技术分析磁性薄膜中的界面磁结构
  • 批准号:
    09305019
  • 财政年份:
    1997
  • 资助金额:
    $ 9.92万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Studies of mesoscopic structures with synchrotron X-rays
利用同步加速器 X 射线研究细观结构
  • 批准号:
    07044135
  • 财政年份:
    1995
  • 资助金额:
    $ 9.92万
  • 项目类别:
    Grant-in-Aid for international Scientific Research
X-ray reflection study of layred structures in multilayrs for magnetic recording
磁记录多层层状结构的X射线反射研究
  • 批准号:
    06452310
  • 财政年份:
    1994
  • 资助金额:
    $ 9.92万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
DEVELOPMENT OF A HIGH-PRECISION ELECTRON DENSITY MEASUREMENT TECHNIQUE FOR MULTILAYER FILMS
多层薄膜高精度电子密度测量技术的开发
  • 批准号:
    06555092
  • 财政年份:
    1994
  • 资助金额:
    $ 9.92万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Analysis of epilayr structures by high-resolution X-ray methods
通过高分辨率 X 射线方法分析外延层结构
  • 批准号:
    04044066
  • 财政年份:
    1992
  • 资助金额:
    $ 9.92万
  • 项目类别:
    Grant-in-Aid for international Scientific Research
Structure of Lattice-Matched Fluoride Films
晶格匹配氟化物薄膜的结构
  • 批准号:
    60460231
  • 财政年份:
    1985
  • 资助金额:
    $ 9.92万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Apparatus for rapid analysis of wide-angle X-ray diffraction patterns at high temperatures
高温下广角 X 射线衍射图样快速分析装置
  • 批准号:
    59880007
  • 财政年份:
    1984
  • 资助金额:
    $ 9.92万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research
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