Fabrication of Micro/Millimeter Wave Integrated Circuit by Novel Ferrite Plating Enhanced by Laser
Fabrication of Micro/Millimeter Wave Integrated Circuit by Novel Ferrite Plating Enhanced by Laser
批准号:
05555086
负责人:
ABE Masanori
金额:
$14.34万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 1995
中文摘要
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英文摘要
The purpose of this study was to fabricate micro/millimeter wave devices in which ferrite-film nonreciprocal circuits (i.e.isolators and circulators) prepared by the novel laser-enhanced ferrite plating are integrated. The ferrite plating is low in process temperature (<100 C), and, when enhanced by laser beams, high in deposition rate and capable of selective area deposition by scanning. The plated films of NiZn and MnZn spinel ferrites were found to be highly lossy at microwave freguency. This was because concentration of Ni and Mn was low which gave rise Fe^<2+> ions in the spinel lattice. Therefore, we have developed a novel ferrite plating method utilizing highly alkaline aqueous solution of chelated Fe and other metal ions, by which the Ni and Mn concentration were successfully increased. Furthermore, we have fabricated films of hexagonal Ba-ferrite by novel electro-ferrite plating utilizing alternate electric current. The dielectric loss in the plated films of NiZn and MnZn ferrites were successfully reduced by exposing the films in vacuum at room temperature, without deteriorating their magnetic characteristics. We could not, unfortunately, realize the microwave/millimeter-wave devices integrated with the non-reciprocal ferrite devices, however, we have shown the potential feasibility to fabricate them.
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M.Abe: "Ferrite Plating:A Versatile Preparation Technique of Ferrite Films in Aqnecus Solution at low Temperature(<100℃)" Ferrites:Proceedings of ICF 6,Tokyo and Kyoto,Japan 1992. 472-477 (1993)
M.Abe:“铁氧体电镀:低温(<100℃)下 Aqnecus 溶液中铁氧体薄膜的通用制备技术” 铁氧体:ICF 6 会议记录,东京和京都,日本 1992 年。 472-477 (1993)
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M.ABE: "Microwave Dielectric Loss Reduction by Vacuum Treatment for (Ni, Zn, Fe)_3O_4 Films Prepared by Ferrite Plating" IEEE Trans.Magn.32 (To appear.). (1996)
M.ABE:“通过真空处理减少铁氧体电镀制备的 (Ni, Zn, Fe)_3O_4 薄膜的微波介电损耗”IEEE Trans.Magn.32(即将出现。)。
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M.Abe: "LOW TEMPERATURE(<100℃)FERRITE FILM SYNTHESIS FROM AQUEOUS SOLUTION BY FERRITE PLATING." Trans. Mat. Res. Soc. Jpn.15B. 1117-1122 (1994)
M.Abe:“通过铁氧体电镀制备低温(<100℃)铁氧体薄膜”,Res.1117-1122。
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Tomoyuki ITOH: "Ferrite Plating of Fe_<3-x>M_xO_4 (M=Ni and Zn) Films Utilizing Alternate Electric Current" Journal of The Magnetics Society of Japan. 18. 311-314 (1994)
Tomoyuki ITOH:“利用交流电对 Fe_<3-x>M_xO_4(M=Ni 和 Zn)薄膜进行铁素体电镀”,日本磁学学会杂志。
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M.Abe: "Microwave Dielectric Loss Reduction by Vacuum Treatment for (Ni,Zn,Fe)_3O_4 Films Prepared by Ferrite Plating" IEEE TRANSACTIONS ON MAGNETICS. 32(発表予定). (1996)
M.Abe:“通过真空处理减少铁氧体电镀制备的 (Ni,Zn,Fe)_3O_4 薄膜的微波介电损耗”,IEEE TRANSACTIONS ON MANETICS 32(待发表)。
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