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Development and Fabrication of New X-ray Detectors on the basis of Our New Theory on the X-ray Response of Semiconductor Detectors

Development and Fabrication of New X-ray Detectors on the basis of Our New Theory on the X-ray Response of Semiconductor Detectors
基于半导体探测器X射线响应新理论开发和制造新型X射线探测器
批准号:
05558055
负责人:
CHO Teruji
金额:
$5.57万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 1994

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中文摘要
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英文摘要
It is found that the dependence of the x-ray-energy response of semiconductor detectors on various detector parameters is consistently explained by our new theory ; this theory is characterized by a three-dimensional diffusion effect of x-ray produced charges on output signals.This finding significantly modifies the evaluated values of plasma-electron temperatures Te deduced from the conventional theory in textbooks and the recent MIT theory. Our theory is extended so as to analyze multichannel semiconductor array data.These results are successfully applied to fabricate upgraded high-energy-sensitive and low-noise x-ray detectors. These detectors are now installed in GAMMA 10 tandem mirror plasma confining device, and the significant high energy sensitive and low noise characteristic properties provide useful data including relativistic high electron-temperature observations as well as a few tens eV low-temperature electron measurements.Our theory also provides a new idea of Te observations using only one plasma shot ; this idea comes from the use of the above-mentioned new x-ray detectors. The present investigations have lead to an international collaboration in tha fabrication and the characterization of x-ray detectors in the DIII-D tokamak device (U.S.A) as well.
期刊论文(16)
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会议论文
T.Cho et al.: "Development and Characterization of Silicon Semiconductor X-ray Detectors for Plasma Diagnostics" Proc.10th Topical Conference on High-Temperature Plasma Diagnostics, Rochester, (New York, 1994, May 8-12). 3.27. 44
T.Cho 等人:“用于等离子体诊断的硅半导体 X 射线探测器的开发和表征”Proc.10th Topical Conference on High-Temperature Plasma Diagnostics,罗彻斯特,(纽约,1994 年,5 月 8-12 日)。
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16
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