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NANO STRUCTURE CONTROL OF HETERO-INTERFACE FOR METALLIC MULTILAYERS BY USING NEW FABRICATION TECHNIQUE WITH THE SUBSTRATE EXCITED BY SURFACE ACOUSTIC WAVES

NANO STRUCTURE CONTROL OF HETERO-INTERFACE FOR METALLIC MULTILAYERS BY USING NEW FABRICATION TECHNIQUE WITH THE SUBSTRATE EXCITED BY SURFACE ACOUSTIC WAVES
表面声波激励基底采用新型制造技术对金属多层膜异质界面的纳米结构控制
批准号:
06555114
负责人:
TSUNODA Masakiyo
金额:
$6.98万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995

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中文摘要
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英文摘要
The aims of this study is to fabricate the matallic multilayrs of which situations at the interface between the different two metals were optimized in atomic scale, and to develop the sensing devices for magnetic field with high sensitivity, by means of applying the new fabricating technology for thin film with using the substrate excited by surface acoustic waves (SAW). Prior to fabricating multilayrs, the monitoring method for initial growth stage of matallic thin films, which is indispensable for fabricating multilayrs, were developed and worth results were obtained as summarized below. The detailed relations between the strong dumping of SAW and the microstructures of metallic thin films at the initial growth stage were investigated. The mass thickness, at which the SAW amplitude reaches minimum were found to correspond to the critical thickness, at which the film structure changes from island-like to continuous. From the investigation for the influence of metal seed layrs on initial film growth by referring above relations, it was found that islands of the seed layr capture the adatoms diffused over the substrate surface, becom growth centers for the subsequent film deposition, and help to make smooth surface of ultra thin metallic films. The structural changes of ultra thin metallic firms with low melting point like as Ag and Cu were also observed, when depositions were stopped at the initial growth stages. Standing on these results, Co/Cu multilayrs were fabricated on the substrate excited by SAW under various SAW amplitude, and estimated those sensing properties. In the multilayr which was fabricated under small SAW amplitude, the maximum magnetoresistance ratio was observed, and the optimized interfacial structure was realized.
期刊论文(7)
专著(0)
科研奖励(0)
会议论文
M.Tsunoda: "Influence of Metal Seed Layrs on Initial Film Growth" J.Mag. Soc. Jpn. 20(in press). (1996)
M.Tsunoda:“金属种子层对初始薄膜生长的影响”J.Mag。
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发表时间:
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作者: []
通讯作者:
角田匡清: "薄膜初期成長過程に及ぼす金属シ-ド層の効果" 日本応用磁気学会誌. 20(印刷中). (1996)
Masakiyo Tsunoda:“金属种子层对薄膜初始生长过程的影响”,日本应用磁学学会杂志 20(出版中)。
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发表时间:
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通讯作者:
角田,匡清: "弾性表面波で励振された基板上に作製した金属薄膜の初期成長過程" 日本応用磁気学会誌. 19. 317-320 (1995)
Tsunoda, Masakiyo:“在表面声波激发的基底上制造金属薄膜的初始生长过程”日本应用磁学学会杂志 19. 317-320 (1995)。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
角田匡清: "弾性表面波で励振された基板上に作製した金属薄膜の初期成長過程" 日本応用磁気学会誌. 19. 317-320 (1995)
Masakiyo Tsunoda:“在表面声波激励的基底上制造金属薄膜的初始生长过程”日本应用磁学学会杂志 19. 317-320 (1995)。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
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    26249037
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    2011
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海外基金