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NANO STRUCTURE CONTROL OF HETERO-INTERFACE FOR METALLIC MULTILAYERS BY USING NEW FABRICATION TECHNIQUE WITH THE SUBSTRATE EXCITED BY SURFACE ACOUSTIC WAVES

表面声波激励基底采用新型制造技术对金属多层膜异质界面的纳米结构控制

基本信息

批准号：
06555114
负责人：
TSUNODA Masakiyo
金额：
$ 6.98万
依托单位：
TOHOKU UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research (B)
财政年份：
1994
资助国家：
日本
起止时间：
1994 至 1995
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-06555114/
关键词：
SURFACE ACOUSTIC WAVES METALLIC MULTILAYERS THIN FILM FABRICATION TECHNIQUE INITIAL GROWTH STAGE

项目摘要

The aims of this study is to fabricate the matallic multilayrs of which situations at the interface between the different two metals were optimized in atomic scale, and to develop the sensing devices for magnetic field with high sensitivity, by means of applying the new fabricating technology for thin film with using the substrate excited by surface acoustic waves (SAW). Prior to fabricating multilayrs, the monitoring method for initial growth stage of matallic thin films, which is indispensable for fabricating multilayrs, were developed and worth results were obtained as summarized below. The detailed relations between the strong dumping of SAW and the microstructures of metallic thin films at the initial growth stage were investigated. The mass thickness, at which the SAW amplitude reaches minimum were found to correspond to the critical thickness, at which the film structure changes from island-like to continuous. From the investigation for the influence of metal seed layrs on initial film growth by referring above relations, it was found that islands of the seed layr capture the adatoms diffused over the substrate surface, becom growth centers for the subsequent film deposition, and help to make smooth surface of ultra thin metallic films. The structural changes of ultra thin metallic firms with low melting point like as Ag and Cu were also observed, when depositions were stopped at the initial growth stages. Standing on these results, Co/Cu multilayrs were fabricated on the substrate excited by SAW under various SAW amplitude, and estimated those sensing properties. In the multilayr which was fabricated under small SAW amplitude, the maximum magnetoresistance ratio was observed, and the optimized interfacial structure was realized.

本研究的目的是在原子尺度上，利用声表面波（SAW）激发基底，应用薄膜制备新技术，制备两种不同金属界面的金属多层材料，并开发具有高灵敏度的磁场传感器件。在制备多层材料之前，开发了制备多层材料必不可少的金属薄膜初始生长阶段的监测方法，并获得了如下有价值的结果。研究了SAW的强倾倒与金属薄膜生长初期微观结构的关系。发现声表面波振幅达到最小的质量厚度对应于临界厚度，此时薄膜结构由岛状变为连续状。根据上述关系研究了金属种子层对初始薄膜生长的影响，发现种子层的岛状结构捕获了扩散在基体表面的附着原子，成为后续薄膜沉积的生长中心，有助于超薄金属薄膜表面的光滑。当沉积停止在初始生长阶段时，还观察到Ag和Cu等低熔点超薄金属体的结构变化。在此基础上，在不同声呐振幅的激发下，在衬底上制备了Co/Cu多层膜，并对其传感性能进行了估计。在小SAW幅值下制备的多层膜中，观察到最大磁阻比，实现了优化的界面结构。