Development of High Persistente Microparts modified by Ion Beam Mixing Process

离子束混合工艺改性高持久性微型零件的开发

• 批准号: 07555362
• 负责人: MATSUMURO Akihito
• 金额: $ 0.9万
• 依托单位: Nagoya University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1996
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555362/
• 关键词: Ion Beam Mixing Process; T_i-N Thin film; Carbon Nitride Film; Gradient Coating; Mechnaical Properties; Micro-parts; UV Laser Induced Polymer; High Pressure Technique; 硬質膜

In order to dedelop high pesistente microparts, we investigated the subject under the following three heads : (1) surface modification of micropatrs consisted of silicon wafer by ion beam mixing technique ; (2) development of new precise fabricating techniques ; and (3) development of new functional material by a high pressure technique.The following results were obtained :1. We clarified that the formation condition of T_i-N thin film on a silicon substrate by ion beam mixing technique and their mechanical properities.2. We clarified that the formation condition of C-N thin film on a silcon substrate by ion beam mixing technique and their mechanical properities.3. We revealed the mechanism of grdient coating on a silicon substrate by means fo RF magnetron sputtering.4. We could syntehsize new materials of polymerized fullerenes, M_g-A_l-Z_n qusicrystals and A_l-L_i alloys by a high pressure technique up to 5.4 GP_a. These materials was excellent in the tribological perties and the strength properties.5. We could develop electrostatic s-shaped film and micro tensile-test system fabricated on a single crystal silicon chip.6. We could manufacture three-dimensional micro-parts by UV laser induced polymerization.

为了研制高性能的微零件，我们从以下三个方面进行了研究：（1）用离子束混合技术对硅基微零件进行表面改性;（2）发展新的精密加工技术;（3）用高压技术发展新的功能材料。阐明了离子束混合技术在硅衬底上制备Ti_i-N薄膜的条件及其力学性能.阐明了离子束混合技术在硅衬底上形成C-N薄膜的条件及其力学性能.揭示了射频磁控溅射在硅衬底上形成梯度涂层的机理.用高达5.4GP_a的高压技术可以合成聚合富勒烯、M_g-A_l-Z_n准晶和A_l-L_i合金等新材料。这些材料具有优良的摩擦学性能和强度性能.可以在单晶硅片上制作静电s型薄膜和微拉伸测试系统.利用紫外激光诱导聚合技术可以制备三维微细零件。

项目成果

M. Shikida: "Micromachined S-shaped Actuator" Proc. of IEEE 6th Int. Symp. on Micromachine and Human Science. 167-172 (1995)

M. Shikida：“微机械S形执行器”Proc。

K. Sato: "Micro tensile-test system fabricated on a single crystal silicon chip" Proc. of IEEE MEMS Workshop. 360-364 (1996)

K. Sato：“在单晶硅芯片上制造的微型拉伸测试系统”Proc。

T. Yamaguchi: "Manufacturing of High Aspect Ratio Micro Structures Using UV Sensitive Photopolymer" JSME Int. J.39・2. 387-396 (1996)

T. Yamaguchi：“使用紫外线敏感光聚合物制造高纵横比微结构” JSME Int. 387-396 (1996)

A.Matsumuro: "Mechanical Propeties of Quasicrystalline Materials of M_g-A_l-Z_n Alloys Consolidated Using a High Pressure Technique" Proc.of IMMM'95. 219-226 (1995)

A.Matsumuro：“使用高压技术固结的 M_g-A_l-Z_n 合金准晶材料的机械性能”Proc.of IMMM95。

K.Sakai: "Elastic Moduli of Al-Li Alloys Treated at a High Pressure of 5.4 GPa" J.Mater.Sci.31・12. 3309-3313 (1996)

K.Sakai：“在 5.4 GPa 高压下处理的铝锂合金的弹性模量”J.Mater.Sci.31・12 3309-3313 (1996)。