Development of High Persistente Microparts modified by Ion Beam Mixing Process

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In order to dedelop high pesistente microparts, we investigated the subject under the following three heads : (1) surface modification of micropatrs consisted of silicon wafer by ion beam mixing technique ; (2) development of new precise fabricating techniques ; and (3) development of new functional material by a high pressure technique.The following results were obtained :1. We clarified that the formation condition of T_i-N thin film on a silicon substrate by ion beam mixing technique and their mechanical properities.2. We clarified that the formation condition of C-N thin film on a silcon substrate by ion beam mixing technique and their mechanical properities.3. We revealed the mechanism of grdient coating on a silicon substrate by means fo RF magnetron sputtering.4. We could syntehsize new materials of polymerized fullerenes, M_g-A_l-Z_n qusicrystals and A_l-L_i alloys by a high pressure technique up to 5.4 GP_a. These materials was excellent in the tribological perties and the strength properties.5. We could develop electrostatic s-shaped film and micro tensile-test system fabricated on a single crystal silicon chip.6. We could manufacture three-dimensional micro-parts by UV laser induced polymerization.