Development of Carbon Nitride Biomaterial Hard Coating by Ion Beam Mixing Method

为了发展离子束混合法制备氮化碳生物材料硬质涂层，我们从以下三个方面进行了研究：(1)利用离子束混合法制备氮化碳薄膜；(2)氮化碳薄膜的组织结构和摩擦学性能；(3)氮化碳薄膜应用于生物材料硬涂层的可能性。主要研究结果如下：1.明确了利用电子束蒸发碳同时轰击氮离子在硅和钛衬底上形成碳氮薄膜的条件。明确了C-N薄膜是由类似无序涡轮层状结构的C-N网络结构组成的。确定了其硬度可达20 Gpa，摩擦系数为0.2.4。结果表明，碳氮膜的力学性能和摩擦学性能符合生物材料的要求。

In order to develop carbon nitride biomaterial hard coating by ion beam mixing method, We investigated the subject under the following three heads : (l)synthesis of carbon nitride films on by ion beam mixing method ; (2)microstructure and tribological properties of carbon nitride films ; and (3) possibility of application for biomaterial hard coatings.The following results were obtained :1. We clarified that the formation condition of C-N thin film on silicon and titanium substrate by ion beam mixing method, in which carbon was evaporated by electron beam and nitrogen ions were simultaneously bombarded.2. We clarified that C-N films were consisted of C-N network like the disordered turbostratic structure.3. We clarified that the hardness was up to 20 GPa and the frictional coefficient was 0.2.4. We concluded that the mechanical properties and the tribological properties of C-N film were suitable for biomaterial.