Development of Carbon Nitride Biomaterial Hard Coating by Ion Beam Mixing Method
Development of Carbon Nitride Biomaterial Hard Coating by Ion Beam Mixing Method
批准号:
09650136
负责人:
MATSUMURO Akihito
金额:
$2.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
为了采用离子束混合法制备氮化碳生物材料硬质涂层,本课题从以下三个方面进行了研究:(1)采用离子束混合法制备氮化碳薄膜;(2)氮化碳薄膜的微观结构和摩擦学性能;(3)生物材料硬质涂层应用的可能性。得到了以下结果:1。通过电子束混合法,阐明了碳在电子束蒸发的同时,氮离子在轰击的情况下,在硅和钛衬底上形成C-N薄膜的条件。我们明确了碳氮薄膜是由碳氮网络组成的,类似于无序的涡层结构。我们澄清硬度高达20gpa,摩擦系数为0.2.4。实验结果表明,C-N薄膜的力学性能和摩擦学性能适合作为生物材料。
英文摘要
In order to develop carbon nitride biomaterial hard coating by ion beam mixing method, We investigated the subject under the following three heads : (l)synthesis of carbon nitride films on by ion beam mixing method ; (2)microstructure and tribological properties of carbon nitride films ; and (3) possibility of application for biomaterial hard coatings.The following results were obtained :1. We clarified that the formation condition of C-N thin film on silicon and titanium substrate by ion beam mixing method, in which carbon was evaporated by electron beam and nitrogen ions were simultaneously bombarded.2. We clarified that C-N films were consisted of C-N network like the disordered turbostratic structure.3. We clarified that the hardness was up to 20 GPa and the frictional coefficient was 0.2.4. We concluded that the mechanical properties and the tribological properties of C-N film were suitable for biomaterial.
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M.Kohzaki, A.Matsumuro, T.Hayashi, M.Muramatsu, K.Yamaguchi: "Preparation of carbon nitride thin films by ion beam assisted deposition and their mechnical properties." Proc.ICMCTF'97. 203-203 (1997)
M.Kohzaki、A.Matsumuro、T.Hayashi、M.Muramatsu、K.Yamaguchi:“离子束辅助沉积制备氮化碳薄膜及其机械性能。”
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影响因子:
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作者:
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通讯作者:
M.Kohzaki: "Preparation of carbon nitride thin films by ion beam assisted deposition and their mechanical properties" Thin Solid Films. 308-309. 239-244 (1997)
M.Kohzaki:“通过离子束辅助沉积制备氮化碳薄膜及其机械性能”固体薄膜。
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M.Kohzaki: "Influence of deposition temperature on bonding state and microstructure of carbon nitride thin films prepared by ion-beam-assiated deposition" Jpn.J.Appl.Phys.36-14A. 2313-2318 (1997)
M.Kohzaki:“沉积温度对离子束辅助沉积制备的氮化碳薄膜的键合状态和微观结构的影响”Jpn.J.Appl.Phys.36-14A。
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T.Hayashi, A.Matsumuro, M.Muramatsu, K.Yamaguchi, Y.Takahashi: "Formation of Ti-N thin films prepared by dynamic ion mixing technique and their mechanical properties." Proc.IMMM'97. 591-598 (1997)
T.Hayashi、A.Matsumuro、M.Muramatsu、K.Yamaguchi、Y.Takahashi:“动态离子混合技术制备的 Ti-N 薄膜的形成及其机械性能。”
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M.Kohzaki, A.Matsumuro, T.Hayashi, K.Yamaguchi: "Preparation of hard carbon nitride films and their microstructure" Proc.SSAM-4. 256-259 (1998)
M.Kohzaki、A.Matsumuro、T.Hayashi、K.Yamaguchi:“硬氮化碳薄膜的制备及其微观结构”Proc.SSAM-4。
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