Development of Carbon Nitride Biomaterial Hard Coating by Ion Beam Mixing Method

离子束混合法开发氮化碳生物材料硬质涂层

• 批准号: 09650136
• 负责人: MATSUMURO Akihito
• 金额: $ 2.18万
• 依托单位: Nagoya University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09650136/
• 关键词: Ion Beam Mixing Method; Carbon Nitride Film; Synthesis Condition; Mechanical Properties; Tribological Properties; Biomaterial; Hard Coating

In order to develop carbon nitride biomaterial hard coating by ion beam mixing method, We investigated the subject under the following three heads : (l)synthesis of carbon nitride films on by ion beam mixing method ; (2)microstructure and tribological properties of carbon nitride films ; and (3) possibility of application for biomaterial hard coatings.The following results were obtained :1. We clarified that the formation condition of C-N thin film on silicon and titanium substrate by ion beam mixing method, in which carbon was evaporated by electron beam and nitrogen ions were simultaneously bombarded.2. We clarified that C-N films were consisted of C-N network like the disordered turbostratic structure.3. We clarified that the hardness was up to 20 GPa and the frictional coefficient was 0.2.4. We concluded that the mechanical properties and the tribological properties of C-N film were suitable for biomaterial.

为了开发离子束混合法制备氮化碳生物材料硬质涂层，我们从以下三个方面进行了研究：（1）离子束混合法制备氮化碳薄膜;（2）氮化碳薄膜的微观结构和摩擦学性能;（3）氮化碳薄膜在生物材料硬质涂层中应用的可能性。阐明了采用电子束蒸发碳，同时轰击氮离子的离子束混合法在硅和钛衬底上形成C-N薄膜的条件.阐明了C-N薄膜是由C-N网络组成的无序乱层结构.我们澄清，硬度高达20 GPa和摩擦系数为0.2.4。结果表明，C-N薄膜具有良好的力学性能和摩擦学性能，适合作为生物材料。

项目成果

M.Kohzaki, A.Matsumuro, T.Hayashi, M.Muramatsu, K.Yamaguchi: "Preparation of carbon nitride thin films by ion beam assisted deposition and their mechnical properties." Proc.ICMCTF'97. 203-203 (1997)

M.Kohzaki、A.Matsumuro、T.Hayashi、M.Muramatsu、K.Yamaguchi：“离子束辅助沉积制备氮化碳薄膜及其机械性能。”

M.Kohzaki: "Preparation of carbon nitride thin films by ion beam assisted deposition and their mechanical properties" Thin Solid Films. 308-309. 239-244 (1997)

M.Kohzaki：“通过离子束辅助沉积制备氮化碳薄膜及其机械性能”固体薄膜。

M.Kohzaki: "Influence of deposition temperature on bonding state and microstructure of carbon nitride thin films prepared by ion-beam-assiated deposition" Jpn.J.Appl.Phys.36-14A. 2313-2318 (1997)

M.Kohzaki：“沉积温度对离子束辅助沉积制备的氮化碳薄膜的键合状态和微观结构的影响”Jpn.J.Appl.Phys.36-14A。

T.Hayashi, A.Matsumuro, M.Muramatsu, K.Yamaguchi, Y.Takahashi: "Formation of Ti-N thin films prepared by dynamic ion mixing technique and their mechanical properties." Proc.IMMM'97. 591-598 (1997)

T.Hayashi、A.Matsumuro、M.Muramatsu、K.Yamaguchi、Y.Takahashi：“动态离子混合技术制备的 Ti-N 薄膜的形成及其机械性能。”

M.Kohzaki, A.Matsumuro, T.Hayashi, K.Yamaguchi: "Preparation of hard carbon nitride films and their microstructure" Proc.SSAM-4. 256-259 (1998)

M.Kohzaki、A.Matsumuro、T.Hayashi、K.Yamaguchi：“硬氮化碳薄膜的制备及其微观结构”Proc.SSAM-4。