Experimental research of thermal processing phenomena by micro-arc

微弧热处理现象的实验研究

基本信息

  • 批准号:
    10450271
  • 负责人:
  • 金额:
    $ 5.89万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 财政年份:
    1998
  • 资助国家:
    日本
  • 起止时间:
    1998 至 1999
  • 项目状态:
    已结题

项目摘要

The phenomena associated with micro-arc, which is struck in argon gas atmosphere in the gap between thin tungsten cathode and stainless steel plate anode, were experimentally investigated. The experimental setup, which is consisted of a micro-arc torch, precise positioning mechanisms actuated by piezoelectric devices and pulse motors, and a power supply for discharge, was constructed. Time-resolution of micro-discharge appearance was observed through microscope with high-speed shutter CCD camera. The results obtained are summarized as follows :(1) Electrical breakdown voltage increases with increase of gap length beyond about 10μm. In the range of small gap length of a few micrometer, it requires almost constant voltage of 250-300 V independently of gap length. High intense luminous region of micro-arc is concentrated at the electrode tip in the early stage of the discharge and then expands with time.(2) The size and/or the form of melting spot at anode surface by micro-arc depend mainly on gap length. Melting spot with flat surface having diameter of 5-10μm can be obtained by adjusting gap length, current level and pulse width.
对氩气保护下薄钨阴极与不锈钢板阳极之间的差距中的微弧现象进行了实验研究。搭建了由微弧炬、压电陶瓷驱动的精密定位机构、脉冲电机和放电电源组成的实验装置。利用高速快门CCD相机在显微镜下观察了微放电形貌的时间分辨率。结果表明:(1)当间隙长度超过10μm时,击穿电压随间隙长度的增加而增加。在几微米的小间隙长度的范围内,它需要与间隙长度无关的250-300 V的几乎恒定的电压。微弧的高强度发光区域在放电初期集中在电极尖端,然后随着时间的推移而扩大。(2)微弧在阳极表面形成的熔斑大小和形状主要取决于间隙长度。通过调节间隙长度、电流大小和脉冲宽度,可以得到直径为5-10μm的表面平整的熔斑。

项目成果

期刊论文数量(1)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Hirata Y.: "Micro-Arc Discharge Phenomena"Vacuum. Vol.53(予定). (2000)
Hirata Y.:“微弧放电现象”真空。第 53 卷(计划)(2000 年)。
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HIRATA Yoshinori其他文献

HIRATA Yoshinori的其他文献

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{{ truncateString('HIRATA Yoshinori', 18)}}的其他基金

Fabrication of field emission and microdischarge devices using femtosemnd laser lithop-aphy
使用飞秒激光光刻技术制造场发射和微放电装置
  • 批准号:
    18360354
  • 财政年份:
    2006
  • 资助金额:
    $ 5.89万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Research on Micro-Thermal Materials Processing with Pulsed Field Emission Current
脉冲场发射电流微热材料加工研究
  • 批准号:
    14350387
  • 财政年份:
    2002
  • 资助金额:
    $ 5.89万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Development of micro-arc welding process
微弧焊接工艺的发展
  • 批准号:
    07555219
  • 财政年份:
    1995
  • 资助金额:
    $ 5.89万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Sutudy on bridging tranfer phenomena in Gas Metal Arc welding
熔化极气体保护焊桥接过渡现象的研究
  • 批准号:
    04650663
  • 财政年份:
    1992
  • 资助金额:
    $ 5.89万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)

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    462398-2014
  • 财政年份:
    2014
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  • 批准号:
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    2004
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    Standard Grant
Research on Electrical Breakdown Mechanism in Gaseous Mixtures by Controlling Pulsed Laser Irradiation with Quantum Effect.
利用量子效应控制脉冲激光照射研究气体混合物中的电击穿机理。
  • 批准号:
    14550283
  • 财政年份:
    2002
  • 资助金额:
    $ 5.89万
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氮活性物质对封闭压缩条件下电击穿特性的影响
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    13650318
  • 财政年份:
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真空臭氧水处理无氧铜电击穿特性研究
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    10555086
  • 财政年份:
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    Grant-in-Aid for Scientific Research (B).
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长气隙中电击穿现象的最终跳跃放电区域建模
  • 批准号:
    03650242
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    1991
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    Grant-in-Aid for General Scientific Research (C)
Development of the Forecast Technology of Electrical Breakdown in Gas Insulated Switchgear
气体绝缘开关设备电气击穿预测技术的进展
  • 批准号:
    61550212
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    1986
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