Establishment of a new method of evaluation for the adhesive strength of thin films by micro-indentation wit two degrees of freedom

二自由度微压痕评价薄膜粘合强度新方法的建立

基本信息

  • 批准号:
    10555024
  • 负责人:
  • 金额:
    $ 3.71万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 财政年份:
    1998
  • 资助国家:
    日本
  • 起止时间:
    1998 至 1999
  • 项目状态:
    已结题

项目摘要

This research project aims at the establishment of a new method of evaluation for the adhesive strength of thin films by micro-indentation with two degrees of freedom. We studied the following three points and have succeeded to developed a method which can be generally applicable to various combinations of films and substrates.Trial production of two-freedom indentorA micro-indentation set-up with two degrees of freedom was developed. This is equipped with an optical microscope which enables real-time observation of crack extension behavior for the measurement of interface crack length.Selection of the optimum loading path and shape of indentorVarious loading, configurations were examined by using the indentor developed above. As a conclusion, specimens should be prepared where the film is projected a little out of the cross section of the substrate. This projection is pushed upwards from the interface side by a conical stylus of diamond, which we found the best way to efficiently extend an interface crack.Evaluation of toughness by the computational simulationComputational simulations were carried out according to the loading configuration above. By comparing the crack extension resistance curves obtained by both experiment and simulation, we succeeded to evaluate the toughness of interface. As an example, the toughness of interface between a WC-Co substrate and the diamond film prepared as a wear protection coating was determined to be about 14 J/mィイD12ィエD1. Although adhesion of wear protection coating is one of the critical problems, this is the first quantitative data ever obtained all over the world for the adhesive strength of diamond coatings on WC-Co cutting tools. This fact proves that our new method is quite a successful one with a significant advantage for industries.
本研究旨在建立一种新的薄膜结合强度的二自由度微压痕评价方法。我们研究了以下三个问题,并成功地发展了一种能普遍适用于各种薄膜和基片组合的方法。二自由度压痕仪的试制开发了一种二自由度微压痕装置。该仪器配备有光学显微镜,可以实时观察裂纹扩展行为,用于测量界面裂纹长度。最佳加载路径和压头形状的选择使用上述开发的压头对各种加载配置进行了检查。作为结论,应制备样品,其中膜从基底的横截面突出一点。该投影由金刚石的锥形触针从界面侧向上推动,我们发现这是有效扩展界面裂纹的最佳方式。通过计算模拟评估韧性根据上述加载配置进行了计算模拟。通过对比实验和模拟得到的裂纹扩展阻力曲线,成功地评价了界面的韧性。作为一个例子,WC-Co基体和作为磨损保护涂层制备的金刚石膜之间的界面韧性被确定为约14 J/m Ω D12 Ω D1。虽然耐磨涂层的结合力是关键问题之一,但这是迄今为止世界上首次获得的WC-Co刀具上金刚石涂层结合力的定量数据。这一事实证明,我们的新方法是相当成功的,具有显着的优势,为工业。

项目成果

期刊论文数量(18)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
K.Sasagawa(M.Hasegawa,M.Saka and H.Abe): "Experimental verification of prediction method for electromigration failure of polycrystalline lines"Journal of Applied Physics. (印刷中). (2000)
K.笹川(M.Hasekawa、M.Saka 和 H.Abe):“多晶硅线电迁移失效预测方法的实验验证”应用物理学杂志(2000 年出版)。
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    0
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N. Umehara (K. Kato, M. Bai and Y. Miyake): "Effect of internal stress of CNx coating on its wear in sliding friction"Surface and Coating Technology. Vol. 113. 233-241 (1999)
N. Umehara(K. Kato、M. Bai 和 Y. Miyake):“CNx 涂层内应力对其滑动摩擦磨损的影响”表面与涂层技术。
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    0
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S. Kamiya (H. Takahashi, M. Saka and H. Abe): "Evaluation and improvement of the adhesive fracture toughness of CVD diamond on silicon substrate"Advances in Electronic Packaging, D. Agonafer et al.. EEP-Vol.26-1. 763-767 (1999)
S. Kamiya(H. Takahashi、M. Saka 和 H. Abe):“硅基板上 CVD 金刚石粘合断裂韧性的评估和改进”Advances in Electronic Packaging,D. Agonafer 等人。EEP-Vol.26
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    0
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神谷庄司(高橋博紀、坂真澄、阿部博之): "気相合成ダイヤモンドの結晶構造とその界面破壊じん性に及ぽす影響"日本機械学会1999年度年次大会講演論文集. 99・1. 3-4 (1999)
Shoji Kamiya(Hiroki Takahashi、Masumi Saka、Hiroyuki Abe):“气相合成金刚石的晶体结构及其对界面断裂韧性的影响”日本机械工程学会 1999 年年会记录 99, 1. 3 -。 4(1999)
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    0
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S.Kamiya(M.Sato,M.Saka and H.Abe): "Residual stress distribution in the direction of the film normal in thin diamond films"Journal of Applied Physics. 86・1. 224-229 (1999)
S. Kamiya(M. Sato、M. Saka 和 H. Abe):“薄金刚石薄膜中薄膜法线方向的残余应力分布”《应用物理学杂志》86・1(1999 年)。
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KAMIYA Shoji其他文献

KAMIYA Shoji的其他文献

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{{ truncateString('KAMIYA Shoji', 18)}}的其他基金

Mechanical fatigue test under liquid water toward bio-implantable MEMS structures with infinite lifetime
液态水下机械疲劳测试,实现无限寿命的生物植入MEMS结构
  • 批准号:
    23651137
  • 财政年份:
    2011
  • 资助金额:
    $ 3.71万
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
In-situ TEM observation of silicon fatigue process using resonance compressive fatigue test
利用共振压缩疲劳试验对硅疲劳过程进行原位 TEM 观察
  • 批准号:
    23360054
  • 财政年份:
    2011
  • 资助金额:
    $ 3.71万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Establishment of an reliability evaluation scheme based on statistical analysis and electronic defect sensing for the reliability of silicon against fatigue failure
建立基于统计分析和电子缺陷检测的硅抗疲劳失效可靠性评估方案
  • 批准号:
    20360052
  • 财政年份:
    2008
  • 资助金额:
    $ 3.71万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Toughening of chemically-vapor deposited diamond by means of active incorporation of carbon allotropes
通过主动掺入碳同素异形体来增韧化学气相沉积金刚石
  • 批准号:
    11650075
  • 财政年份:
    1999
  • 资助金额:
    $ 3.71万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)

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