Study of Surface Structure by means of Correlated Thermal Diffuse Scattering.

通过相关热扩散散射研究表面结构。

• 批准号: 11640305
• 负责人: ABUKAWA Tadashi
• 金额: $ 2.3万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11640305/
• 关键词: Thermal Diffuse Scattering; Electron Diffraction; Surface Structure; Patterson Functin; Direct Method; Solid Surface

The purpose of this research project is the accurate surface structure investigation using a recently developed technique, the correlated thermal diffuse scattering (CTDS). Characteristics and weak points of the methods have been investigated to improve the performance. Then the new two-dimensional detection system for diffraction patterns has been constructed. The system consists of a chilled CCD video camera, a high dynamic range video frame grabber and a personal computer. The new detection system speeds up the data acquisition time more than 8 times of those using the previous system, and enables to access a large volume of the diffraction data, which is crucial for the accurate structural investigation. Si (001) 2x1 surface and Si (111) root3 x root3 surface have been investigated by the CTDS using the new detection system The surface structures of both surfaces are clearly reconstructed by CTDS, and the results are consistent with those for previous studies by other methods. The comparison between the present and previous indicates the high structural accuracy, which is about 0.1A, of the present CTDS.

这一研究项目的目的是利用最近发展起来的相关热扩散散射(CTDS)技术来精确地研究表面结构。研究了这些方法的特点和不足之处，以提高其性能。在此基础上，构建了新的衍射图二维检测系统。该系统由制冷CCD摄像机、高动态范围视频图像采集卡和个人计算机组成。新检测系统的数据采集速度是原系统的8倍以上，并且能够获得大量的衍射数据，这对于精确的结构研究是至关重要的。利用该系统对Si(001)2x1表面和Si(111)root3xroot3表面进行了CTDS研究，结果表明，这两种表面的表面结构都得到了清晰的重建，结果与以往用其他方法研究的结果一致。目前与以前的比较表明，目前的CTD具有较高的结构精度，约为0.1a。

项目成果

T.Abukawa,C.M.Wei,K.Yoshimura,S.Kono: "Assesment of correlated thermal diffuse scattering as a direct structural method on the multielement surface system of Si(111)(√3x√3)-In"Surface Review and Letters. 7. 547-553 (2000)

T.Abukawa、C.M.Wei、K.Yoshimura、S.Kono：“作为 Si(111)(√3x√3)-In 多元素表面系统的直接结构方法的相关热漫散射评估”Surface Review and Letters 7. 547-553 (2000)

T.Abukawa,C.M.Wei,K.Yoshimura,S.Kono: "Assesment of correlated thermal diffuse scattering as a direct structural method on the multielement surface system of Si(111)(√<3>x√<3>)-In"Surface Review and Letters. 7. 547-553 (2000)

T.Abukawa、C.M.Wei、K.Yoshimura、S.Kono：“作为 Si(111)(√<3>x√<3>)-In 多元素表面系统的直接结构方法的相关热漫散射评估“表面评论和信件。7. 547-553 (2000)

T.Abukawa, C.M.Wei, K.Yoshimura, S.Kono: "Assesment of correlated thermal diffuse scattering as a direct structural method on the multielement surface system of Si (111)(√<3>x√<3>)-In"Surface Review and Letters. 7. 547-553 (2000)

T.Abukawa、C.M.Wei、K.Yoshimura、S.Kono：“作为 Si (111)(√<3>x√<3>)-In 多元素表面系统的直接结构方法的相关热漫散射评估“表面评论和信件。7. 547-553 (2000)

T.Abukawa,C.M.Wei,K.Yoshimura,S.Kono: "Direct method of surface structure determination by Patterson analysis of correlated thermal diffused scattering for Si(001)2x1"Physical Review. B62. 16069-16073 (2000)

T.Abukawa、C.M.Wei、K.Yoshimura、S.Kono：“通过 Si(001)2x1 相关热扩散散射的帕特森分析直接确定表面结构的方法”物理评论。

T.Abukawa, C.M.Wei, K.Yoshimura, S.Kono: "Direct method of surface structure determination by Patterson analysis of correlated thermal diffused scattering for Si (001) 2x1"Physical Review. B62. 16069-16073 (2000)

T.Abukawa、C.M.Wei、K.Yoshimura、S.Kono：“通过 Si (001) 2x1 相关热扩散散射的帕特森分析直接确定表面结构的方法”物理评论。