Structure and Dynamics at Solid/Solution Interphase

本研究旨在全面了解固/液界面反应。首先，利用SXS、XSW和XAS，结合SOR、STM和AFM，以原子级分辨率测量了固/液界面的三维结构;其次，利用快速非线性激光光谱技术，如SHG和SFG，研究了界面反应动力学，主要结果如下：1.金属和半导体上电沉积异质金属层的结构分析利用STM和AFM研究了金属和半导体电极上电沉积异质金属亚单层的结构，并利用表面X射线散射研究了基底结构、溶液吸附和水合作用对金属层结构的影响.功能有机膜结构/有序性的演化通过改变溶液pH值和离子强度，试图控制有机膜与溶液物种之间的相互作用和电子转移特性。采用SHG和SFG系统研究了界面结构。

This research was carried out to fully understand the reactions at solid/solution interface. First, the three dimensional structure of solid/solution interface was determined with atomic resolution by SXS, XSW and XAS using SOR as well as by STM and AFM.Second, interfacial reaction dynamics was studied by fast non-linear laser spectroscopy such as SHG and SFG.Some of the results are as follows.1. Structural analysis of foreign metal layers electrodeposited on metal and semiconductor Structures of sub-monolayer of foreign metals electrodeposited on metal and semiconductor electrodes were investigated by STM and AFM.Effects of substrate structure, adsorption of solution species, and hydration on the structure of the metal layers were examined in detail by surface X-ray scattering.2. Evolution of structure/order of functional organic layersIt was attempted to control the interaction and electron transfer characteristics between organic monolayer and solution species by changing solution pH and ionic strength. SHG and SFG systems were used to study the interfacial structure.