Study on Absolute Flatness Measurement of Silicon Single Crystalline Plane Mirrors Using Near-Infrared Interferometry
Study on Absolute Flatness Measurement of Silicon Single Crystalline Plane Mirrors Using Near-Infrared Interferometry
批准号:
13650119
负责人:
UCHIKOSHI Junichi
金额:
$2.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2003
中文摘要
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英文摘要
Single-crystalline silicon plane mirrors are widely used for the optical elements of synchrotron radiation. The purpose of this study is to measure the absolute flatness of those mirrors at nanometric accuracy by performing a three flat method with a near-infrared laser and a detector. Silicon is opaque to visible light, which prevents us from performing interference measurements with visible light and silicon as a transparent reference. We have developed the near-infrared phase-shifting Fizeau interferometer in which a near-infrared (λ =1315 nm) semiconductor laser and a near-infrared CCD camera is a source of light and a light detector, respectively. The near-infrared light is transparent to silicon, which enables us to observe interference fringes with a silicon plane mirror as a transparent reference. However, silicon has high refractive index even in the near-infrared region. A high reflectance induces a multiple-beam interference. This distorts interference fringes, which leads t … More o the measurement error of the phase-shifting method. Hence silicon dioxides acting as an anti-reflection film have been formed on the mirror in order to achieve a two-beam interference. As a result, we have confirmed that the distortion of interference fringes is suppressed. In order to investigate the measurement accuracy of a three flat method, the straightness of the center lines of three optical flats has been measured by the three flat method with visible light. And the accuracy of absolute straightness of each optical flat is 5 nm (peak-to-valley height). As a next step, flatness measurements have been performed by the near-infrared phase-shifting interferometry in which interference fringes changing with the scan of the reference along the light axis are recorded. In order to suppress the multiple-beam interference at silicon plane mirrors, we have paid attention to the fact that the contrast of fringes lowers as the cavity length becomes long. By controlling the cavity length, we have achieved a nearly ideal two-beam interference. And the reproducibility of the interferometry is 6.38 nm (peak-to-valley height) that is lower than λ/200. Less
期刊论文(1)
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科研奖励(0)
会议论文
打越純一, 島田尚一, 岡本太一朗: "近赤外光干渉法によるシリコン平面ミラーの形状測定"2002年度精密工学会秋季大会講演論文集. 564-564 (2002)
Junichi Uchikoshi、Shoichi Shimada、Taichiro Okamoto:“通过近红外光学干涉测量法测量硅平面镜的形状”2002 年日本精密工程学会秋季会议记录 564-564 (2002)。
DOI:
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期刊:
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作者:
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通讯作者:
Shape formation in silicon surface by transfer photo-etching using chemical reaction at fluorinating agent-silicon interface
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批准号:23560123
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.66万
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财政年份:2011
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依托单位:
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依托单位:
国内基金
海外基金
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项目类别:面上项目
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资助金额:63.0万元
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批准年份:2015
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依托单位:
显微近红外图像成像方法的研究及其在生物学中的应用
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