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Integration of organic molecular systems and semiconductor circuits by monolayer llithography

通过单层光刻集成有机分子系统和半导体电路

基本信息

批准号：
14205107
负责人：
SUGIMURA Hiroyuki
金额：
$ 25.96万
依托单位：
Kyoto University (2004)Nagoya University (2002-2003)
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
2002
资助国家：
日本
起止时间：
2002 至 2004
项目状态：
已结题

项目摘要

Ultrathin organic films of a few nm in thickness were applied as resist films for photolithography. These resist films were prepared on oxide-covered Si substrates from organosilane molecules. The films belong to a class of materials referred to as self-assembled monolayer(SAM). An organosilane SAM was micropatterned by irradiating through a photomask with a vacuum ultra-violet(VUV) light of 172 nm in wavelength, under the presence of atmospheric oxygen molecules. The VUV photodegradation mechanism was ascribed to dissociative excitation of C-C and other chemical bondings in the organosilane molecules and to subsequently proceeded oxidation with active oxygen species such as ozone and atomic oxygen generated simultaneously by the VUV-irradiation of atmospheric oxygen molecules. Consequently, the photomask image was transferred to the SAM. Micropatterns of 1 μm in width or finer were successfully transferred on the SAM. The VUV light of 172 nm in wavelength has been an effective tool fo … More r micropatterning of organic SAMs prepared on Si substrates. The image of a photomask was printed on the SAMs through its photodecomposition. This VUV-lithography is generally applicable to micropatterning of any organic material surfaces, since its patterning mechanism involves cleavage of C-C and other bonds in organic molecules and subsequent oxidation with atomic oxygen species simultaneously generated from atmospheric oxygen molecules.We have also nanofabrication processes based on chemical reactions locally induced with a scanning probe microscope probe, that is. "nanoprobe chemical conversion". We have succeeded in oxidizing and reducing SAM surfaces at a resolution close to 10 nm. By integrating this nanoprobe chemical conversion and other surface finishing technologies, a verity of materials ranging from metals to polymers can be assembled on a substrate surface in nm scale.Based on this micro-nanofabrication technology, we demonstrated the construction of microstructured organic molecular systems on Si. Furthermore, we showed that the electrical characterization using scanning probe microscopy (Kelvin-probe microscopy and scanning capacitance microscopy) was the powerful means to elucidate integrated functions of organic and Si systems. Less

采用厚度为几nm的超薄有机薄膜作为抗蚀剂薄膜进行光刻。这些抗蚀剂薄膜是由有机硅烷分子在氧化物覆盖的硅衬底上制备的。这种薄膜属于一类被称为自组装单分子膜(SAM)的材料。在大气氧分子存在下，用波长为172 nm的真空紫外光照射光掩模，制作了有机硅烷自组装膜的微图形。VUV光降解机理归因于有机硅烷分子中C-C和其他化学键的解离激发，以及随后与大气氧分子同时产生的臭氧和原子氧等活性氧物种的氧化。因此，光掩模图像被传输到SAM。成功地将宽度为1μm或更细的微图案转移到SAM上。波长为172 nm的真空紫外光已经成为…的有效工具在硅衬底上制备的有机自组装膜有更多的微图案化。光掩模的图像通过光解被打印在自组装膜上。这种真空紫外光刻技术一般适用于任何有机材料表面的微图案化，因为它的图案化机制涉及有机分子中C-C和其他键的断裂，以及随后与大气氧分子同时产生的原子氧物种的氧化。我们也有基于扫描探针显微镜探针局部诱导的化学反应的纳米制造工艺。“纳米探针的化学转化”。我们已经成功地氧化和还原了SAM表面，分辨率接近10 nm。通过将这种纳米探针的化学转化与其他表面处理技术相结合，可以在纳米级的衬底表面组装从金属到聚合物的各种材料。基于这种微纳米加工技术，我们展示了在硅上构建微结构有机分子系统。此外，利用扫描探针显微镜(开尔文探针显微镜和扫描电容显微镜)进行电学表征是阐明有机和硅系统集成功能的有力手段。较少

项目成果

期刊论文数量（55）

专著数量（0）

科研奖励数量（0）

会议论文数量（0）

专利数量（0）

Alkylsilane self-assembled monolayer lithography : Effects of proxity gap on photodegradation reaction and patterning resolution

烷基硅烷自组装单层光刻：邻近间隙对光降解反应和图案分辨率的影响

DOI：
发表时间：
2003
期刊：
Jpn.J.Appl.Phys. 42
影响因子：
0
作者：
Hiroyuki Sugimura;Nagahiro Saito;Sun-Hyung Lee;Osamu Takai;H.Sugimura et al.;Y.Wu et al.;N.SAito et al.;L.Hong et al.;L.Hong et al.
通讯作者：
L.Hong et al.

Micropatterning of Organosilane Self-Assembled Monolayers Using Vacuum Ultraviolet Light at 172nm : Resolution Evaluation by Kelvin Probe Force Microscopy

使用 172nm 真空紫外光对有机硅烷自组装单层进行微图案化：通过开尔文探针力显微镜进行分辨率评估

DOI：
发表时间：
2003
期刊：
Surf.Coat.Technol. 169-170
影响因子：
0
作者：
Hiroyuki Sugimura;Nagahiro Saito;Sun-Hyung Lee;Osamu Takai;H.Sugimura et al.;Y.Wu et al.;N.SAito et al.;L.Hong et al.;L.Hong et al.;L.Hong et al.
通讯作者：
L.Hong et al.

Surface Potential Microscopy for Organized Molecular

有序分子的表面电势显微镜

DOI：
发表时间：
2002
期刊：
Appl.Surf.Sci. 188
影响因子：
0
作者：
Hiroyuki Sugimura;Nagahiro Saito;Kazuyuki Hayashi;Noriya Maeda;Osamu Takai;H.Sugimura et al.;H.Sugimura et al.
通讯作者：
H.Sugimura et al.

フェニルアセチレンと水素終端化シリコンとの表面化学反応による有機単分子膜形成

苯乙炔与氢封端硅表面化学反应形成有机单层

DOI：
发表时间：
2002
期刊：
表面技術 53
影响因子：
0
作者：
Hiroyuki Sugimura;Nagahiro Saito;Kazuyuki Hayashi;Noriya Maeda;Osamu Takai;H.Sugimura et al.;H.Sugimura et al.;H.Sugimura et al.;K.Hayashi et al.;H.Sugimura et al.;H.Sugimura et al.;杉村他
通讯作者：
杉村他

Surface Potential of Self-assembled Monolayer Patterned by Organosilanes : ab-initio Molecular Orbital Calculations

有机硅烷图案化的自组装单分子层的表面电势：从头算分子轨道计算