Integration of organic molecular systems and semiconductor circuits by monolayer llithography

厚度为几nm的超薄有机膜被用作光刻用抗蚀剂膜。这些抗蚀剂膜上制备的氧化物覆盖的硅衬底从有机硅烷分子。这些薄膜属于一类称为自组装单层（SAM）的材料。在大气氧分子存在下，通过用波长为172 nm的真空紫外（VUV）光通过光掩模照射来对有机硅烷SAM进行微图案化。真空紫外光降解的机理是由于C-C和其他化学键的有机硅烷分子的解离激发，并随后进行氧化与活性氧物种，如臭氧和原子氧同时产生的真空紫外照射的大气中的氧分子。因此，光掩模图像被转移到SAM。在SAM上成功地转移了1 μm或更细的微图案。波长为172 nm的真空紫外光是一种有效的工具， 关于我们 在Si衬底上制备的有机自组装膜的微图案化。光掩模的图像通过其光分解印刷在SAMs上。这种真空紫外光刻通常适用于任何有机材料表面的微图案化，因为其图案化机制涉及C-C和有机分子中的其他键的断裂，以及随后与同时从大气氧分子产生的原子氧物种的氧化。“纳米探针化学转化”。我们已经成功地以接近10纳米的分辨率氧化和还原SAM表面。通过将这种纳米探针化学转化技术与其他表面修饰技术相结合，可以在衬底表面组装从金属到聚合物的多种材料，并在此基础上实现了硅基微结构有机分子系统的构建。此外，我们表明，使用扫描探针显微镜（开尔文探针显微镜和扫描电容显微镜）的电特性是有力的手段来阐明有机和Si系统的集成功能。少

Ultrathin organic films of a few nm in thickness were applied as resist films for photolithography. These resist films were prepared on oxide-covered Si substrates from organosilane molecules. The films belong to a class of materials referred to as self-assembled monolayer(SAM). An organosilane SAM was micropatterned by irradiating through a photomask with a vacuum ultra-violet(VUV) light of 172 nm in wavelength, under the presence of atmospheric oxygen molecules. The VUV photodegradation mechanism was ascribed to dissociative excitation of C-C and other chemical bondings in the organosilane molecules and to subsequently proceeded oxidation with active oxygen species such as ozone and atomic oxygen generated simultaneously by the VUV-irradiation of atmospheric oxygen molecules. Consequently, the photomask image was transferred to the SAM. Micropatterns of 1 μm in width or finer were successfully transferred on the SAM. The VUV light of 172 nm in wavelength has been an effective tool fo … More r micropatterning of organic SAMs prepared on Si substrates. The image of a photomask was printed on the SAMs through its photodecomposition. This VUV-lithography is generally applicable to micropatterning of any organic material surfaces, since its patterning mechanism involves cleavage of C-C and other bonds in organic molecules and subsequent oxidation with atomic oxygen species simultaneously generated from atmospheric oxygen molecules.We have also nanofabrication processes based on chemical reactions locally induced with a scanning probe microscope probe, that is. "nanoprobe chemical conversion". We have succeeded in oxidizing and reducing SAM surfaces at a resolution close to 10 nm. By integrating this nanoprobe chemical conversion and other surface finishing technologies, a verity of materials ranging from metals to polymers can be assembled on a substrate surface in nm scale.Based on this micro-nanofabrication technology, we demonstrated the construction of microstructured organic molecular systems on Si. Furthermore, we showed that the electrical characterization using scanning probe microscopy (Kelvin-probe microscopy and scanning capacitance microscopy) was the powerful means to elucidate integrated functions of organic and Si systems. Less