Photo and nanoprpbe integrated lithography

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This project has been conducted in order to integrate photolithography and nanoprobe lithography on the basis of organosilane monolayer resist films and to develop a high throughput lithgraphy process. We have obtained the followting results.1) Development of an optical lithgraphy systemUsing an excimer lamp at 172 nm, an photolithograpy system was designed and constructed. We have suceeded in projecting a lines and spaces pattern at a resolution of 1 μm.2) Detection of photoprinted pattens without developing resistsWe have developed a technique in order to observe optically printed patterns on an organisilane monolayer with high resolution and without destroying the pattern. Through surface potential measurements based on non-contact atomic force microscopy, we could find the photoprinted patterns at a spacial resolucion better than 100 nm.3) Nanoprobe drawingUsing atomic force microscopy, we have suceeded in drawing fine patterns on the monolayer resist as narrow as 20 nm.