Scanning probe nanolithography on insulating substrates
Scanning probe nanolithography on insulating substrates
批准号:
23656461
负责人:
SUGIMURA Hiroyuki
金额:
$2.66万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 --
中文摘要
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英文摘要
Self-assembled monolayers of alkylphosphonic acid was used as a resist film for nanoprobe lithography because SAMs are ultrathin films with a thickness of only 2-3 nm and they can be easily prepared. Highly-ordered and low-defect-density alkylphosphonic SAMs were successfully formed on aluminum oxide films by just immersing the films in an ethanolic solution containing an alkylphosphonic acid, and we concluded that they were more suitable for the resist film than alkylsilane SAMs.
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会议论文
Fabrication of Gold Nanoparticle Array for Plasmon Waveguide Using Scanning Probe Lithography
使用扫描探针光刻技术制造用于等离子波导的金纳米颗粒阵列
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[M. Kuwata, T. Ichii, T. Narushima, E. Kazawa, H. Okamoto, I. Nakamura, K. Murase, H. Sugimura]
通讯作者:
H. Sugimura
金ナノ粒子配列型近接場光導波路の作製
金纳米颗粒阵列近场光波导的制备
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[桑田真成, 一井崇, 加沢エリト, 中村勲, 邑瀬邦明, 杉村博之]
通讯作者:
杉村博之
走査プローブリソグラフィによる金ナノ粒子を用いた光導波路作製
通过扫描探针光刻使用金纳米粒子制造光波导
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[桑田真成, 一井崇, 加沢エリト, 中村勲, 邑瀬邦明, 杉村博之]
通讯作者:
杉村博之
Memory devices composed of electrochemically-active molecules and ionic-liquid thin films
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批准号:24656410
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项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.58万
-
财政年份:2012
-
负责人:SUGIMURA Hiroyuki
-
依托单位:
Electronic Functions of Si modified with metal-organic complex
-
批准号:20360314
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.31万
-
财政年份:2008
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负责人:SUGIMURA Hiroyuki
-
依托单位:
VUV microfabrication
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批准号:17206073
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$31.12万
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财政年份:2005
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负责人:SUGIMURA Hiroyuki
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依托单位:
Integration of organic molecular systems and semiconductor circuits by monolayer llithography
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批准号:14205107
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$25.96万
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财政年份:2002
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负责人:SUGIMURA Hiroyuki
-
依托单位:
Photo and nanoprpbe integrated lithography
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批准号:12555197
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$7.81万
-
财政年份:2000
-
负责人:SUGIMURA Hiroyuki
-
依托单位:
Plasma processing for carbon-based field-emission materials and their charactersit
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批准号:11450271
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.13万
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财政年份:1999
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负责人:SUGIMURA Hiroyuki
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依托单位:
Organosilane Self-Assembled Thin Resist Films for Nanoprocessing
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批准号:10555247
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.98万
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财政年份:1998
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负责人:SUGIMURA Hiroyuki
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依托单位:
海外基金