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Development of Self-crack-healing Coating Technique and its Application for Heat Resistant Superalloy

Development of Self-crack-healing Coating Technique and its Application for Heat Resistant Superalloy
耐热高温合金裂纹自愈涂层技术的开发及其应用
批准号:
23656091
负责人:
UCHIDA Hitoshi
金额:
$2.58万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012

项目摘要

项目成果

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中文摘要
翻译
制备了一种在高温环境下具有自愈合能力的SiNx/SiCy纳米层合膜。研究了愈合条件和膜结构对愈合能力的影响。对于SiN单层薄膜,加热后裂纹愈合较差。另一方面,在SiNx/SiCy纳米层合膜中,裂纹发生了愈合。随着加热温度的升高和加热时间的延长,裂纹的愈合速度加快。在SiNx/SiCy纳米层合膜的自裂纹愈合能力和抗热震性之间存在着一种权衡。
英文摘要
A SiNx/SiCy nano-laminated film with a self-crack-healing ability under high temperature environment was fabricated. The influence of healing condition and film structure on the healing ability was investigated. In the case of the SiN monolayer film, the crack was poorly healed after heating. On the other hand, in the SiNx/SiCy nano-laminated film, crack healing occurred. The crack healing improved on increasing the heating temperature and time. There is a trade-off between the self-crack-healing ability and the thermal shock resistance in SiNx/SiCy nano-laminated film.
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会议论文
SiN/SiC積層薄膜の創製とその自己き裂治癒能力
SiN/SiC多层薄膜的制备及其自裂纹愈合能力
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [M. Nakatani, J. Nishimura, S. Hanaki, H. Uchida, 西村淳樹,中谷正憲,花木聡,内田仁, 西村淳樹,中谷正憲,花木聡,内田仁]
通讯作者: 西村淳樹,中谷正憲,花木聡,内田仁
SiN/SiC 積層薄膜の創製とその自己き裂治癒能力
SiN/SiC多层薄膜的制备及其自裂纹愈合能力
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [M. Nakatani, J. Nishimura, S. Hanaki, H. Uchida, 西村淳樹,中谷正憲,花木聡,内田仁]
通讯作者: 西村淳樹,中谷正憲,花木聡,内田仁
Crack Healing Behavior of SiN/SiC Nano-Laminated Films
SiN/SiC纳米层压薄膜的裂纹愈合行为
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [M. Nakatani, J. Nishimura, S. Hanaki, H. Uchida]
通讯作者: H. Uchida
Synthesis of SiN/SiC multilayered films with crack-healing ability
具有裂纹修复能力的SiN/SiC多层薄膜的合成
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [M. Nakatani, J. Nishimura, S. Hanaki, H. Uchida]
通讯作者: H. Uchida
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