Mesoscopic-scale dynamics of materials fracture and workability of silicon crystals
Mesoscopic-scale dynamics of materials fracture and workability of silicon crystals
批准号:
16360316
负责人:
HIGASHIDA Kenji
金额:
$7.04万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2004
资助国家:
日本
项目状态:
已结题
起止时间:
2004 至 2005
中文摘要
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英文摘要
Mesoscopic-scale dynamics of materials fracture have been investigated based on the theory of crack-dislocation interaction. Particular attention has been paid on fracture and deformation behaviors in silicon single crystals.Since silicon single crystals exhibit a sharp transition from brittle-to-ductile behavior in the narrow temperature range, they have attracted much attention as model crystals to understand the dislocation process for toughening crystalline materials. In this research, the nature of crack tip dislocations and their multiplication processes in silicon crystals have been examined by using high-voltage electron microscopy. The crack tip dislocations observed were characterized by matching their images to those simulated, and it was found that they were shielding type which increases fracture toughness of materials. In addition to this, three-point bending tests were made at high temperatures around 1100K in order to introduce dislocations around a crack tip. And crack … More tip stress fields were visualized by infrared photoelastic method in those silicon crystals deformed at high temperatures. By using this method, it was confirmed that the compressive stress field was formed around the crack tip by the introduction of dislocations, and that the compressive stress fields substantially increases the fracture toughness of silicon crystals. Further, the dislocation distribution was simulated by using the program code developed by Dr. Hartmaier, MPI, and the simulated photoelastic images using the calculated dislocation distribution were in good agreement with the observed images.From the viewpoint of the research on the workability of silicon crystals, the effects of impurity and strain rate on the behavior of brittle-to-ductile transition was investigated. In this study, boron was added, which caused the increase of brittle-to-ductile transition temperature (BDTT). Based on the results of strain rate dependence of BDTT, activation energy for brittle-to-ductile transition was estimated, and the value estimated coincided well with the value of the activation energy of dislocation glide. Those results suggest that the problem of brittle-to-ductile transition and workability of silicon crystals are fundamentally discussed based on the theory of dislocation motion and the interaction between crack and dislocations. Less
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DOI:
10.2320/matertrans.44.681
发表时间:
2003-04
期刊:
Materials Transactions
影响因子:
1.2
作者:
[Masaki Tanaka;K. Higashida;H. Nakashima;H. Takagi;M. Fujiwara]
通讯作者:
Masaki Tanaka;K. Higashida;H. Nakashima;H. Takagi;M. Fujiwara
3D Structures of Crack-Tip Dislocations in Silicon Revealed by HVEM
HVEM 显示硅中裂纹尖端位错的 3D 结构
DOI:
--
发表时间:
2004
期刊:
Proceedings of the 25th Risoe International Symposium on Materials Science : Evolotion of Deformation Microstructures in 3D, Editors : C. Gundlach et. al., Risoe National Laboratory, Roskide, Denmar
影响因子:
--
作者:
[K.Higashida, M.Tanaka]
通讯作者:
M.Tanaka
DOI:
10.1016/j.msea.2004.05.040
发表时间:
2004-12
期刊:
Materials Science and Engineering A-structural Materials Properties Microstructure and Processing
影响因子:
6.4
作者:
[Masaki Tanaka;K. Higashida;Tomoko Haraguchi]
通讯作者:
Masaki Tanaka;K. Higashida;Tomoko Haraguchi
Crack Tip Stress Fields Revealed by Infrared Photoelasticity in Silicon Crystals
硅晶体中红外光弹性揭示的裂纹尖端应力场
DOI:
--
发表时间:
2004
期刊:
Materials Science and Engineering A387-389
影响因子:
--
作者:
[K.Higashida, M.Tanaka, E.Matsunaga, H.Hayashi]
通讯作者:
H.Hayashi
シリコン結晶における破壊靱性値の方位依存性と表面エネルギー
硅晶体断裂韧性和表面能的取向依赖性
DOI:
--
发表时间:
2004
期刊:
日本金属学会誌 第68巻9号
影响因子:
--
作者:
[田中將己, 東田賢二, 中島英治, 高木秀有, 藤原雅美]
通讯作者:
藤原雅美
Structure analysis of lattice defects in near bulk specimens combining high-voltage electron microscopy and electron energy loss spectroscopy.
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批准号:22246090
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$29.79万
-
财政年份:2010
-
负责人:HIGASHIDA Kenji
-
依托单位:
3-D analyses for crack tip dislocations by using electron tomography
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批准号:18360305
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.97万
-
财政年份:2006
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负责人:HIGASHIDA Kenji
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依托单位:
Microstructure of Crack Tip Plastic Zone and Fracture Toughness In Silicon Crystals
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批准号:14550656
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.3万
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财政年份:2002
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负责人:HIGASHIDA Kenji
-
依托单位:
TEM analysis for meso-scale textures developed in heavily deformed Fe-alloys
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批准号:12650662
-
项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.3万
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财政年份:2000
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负责人:HIGASHIDA Kenji
-
依托单位:
Development of in-sutu observation system for internal stress fields due to lattice defects using the infrared photoelastic method
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批准号:11555162
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项目类别:Grant-in-Aid for Scientific Research (B).
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资助金额:$1.02万
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财政年份:1999
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负责人:HIGASHIDA Kenji
-
依托单位:
Study on the dislocation emission around a crack tip by using high-voltage electron microscopy
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批准号:10650651
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.18万
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财政年份:1998
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负责人:HIGASHIDA Kenji
-
依托单位:
Visualization of crack-grain boundary interaction in transparent crystals
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批准号:08650770
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.32万
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财政年份:1996
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负责人:HIGASHIDA Kenji
-
依托单位:
国内基金
海外基金
镍基UNS N10003合金辐照位错环演化机制及其对力学性能的影响研究
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批准号:12375280
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项目类别:面上项目
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资助金额:53.00万元
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批准年份:2023
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负责人:黄鹤飞
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依托单位: