Application of Supersonic Free-Jet PVD applied to Nano-structure Coating

近年来，对结构材料的要求越来越高。涂层工艺是实现这些要求的最有前途的方法之一。然而，常规的涂覆方法通常具有以下主要技术问题。我们开发了超音速自由喷射PVD（SFJ-PVD）作为一种新的涂层工艺来解决这些问题。SFJ-PVD是利用超音速气流来存款纳米颗粒并形成没有裂纹或空隙的厚涂膜的技术。该方法由“气体蒸发”和“真空沉积”组成。在气体蒸发室中，在惰性气体气氛中蒸发源材料以形成纳米颗粒。然后在沉积室中用惰性气体流通过转移管将纳米颗粒运送到衬底。气体流由腔室之间的压力差产生，并通过专门设计的超音速喷嘴在4.2马赫数的超音速流下加速。通过SFJ-PVD，我们生产的金属薄膜和陶瓷薄膜在薄膜内部和基材与薄膜之间的界面处都具有光滑、致密和无缺陷的微观结构，并且与基材具有优异的粘合强度。

Recently, requirements for structural materials become increasingly severe. A coating process is one of the most promising methods to achieve the requirements. However, conventional coating processes generally have following major technical problems. We develop Supersonic Free-Jet PVD (SFJ-PVD) as a new coating process to solve the problems. The SFJ-PVD is a technique to deposit nanoparticles with supersonic gas flow and to form a thick coating film without a crack or a void. This method is composed of "gas evaporation" and "vacuum deposition". In a gas evaporation chamber, a source material is evaporated to form nanoparticles in an inert gas atmosphere. The nanoparticles are then carried to a substrate in a deposition chamber with an inert gas flow through a transfer pipe. The gas flow is generated by the pressure difference between the chambers and accelerated through a specially designed supersonic nozzle at the supersonic flow of 4.2 Mach, number. With SFJ-PVD, We produce metal films and ceramic films that have smooth, compact and defect-free microstructure both in the film and at the interface between the substrate and the film and excellent adhesive strength to the substrate.