Development of Target Preparation by the HIVIPP Method in Higher Pressure than 1 Atm

在高于 1 Atm 的压力下通过 HIVIPP 方法制备靶标的开发

• 批准号: 17340086
• 负责人: SUGAI Isao
• 金额: $ 8.38万
• 依托单位: High Energy Accelerator Research Organization
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2005
• 资助国家: 日本
• 起止时间: 2005 至 2006
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-17340086/
• 关键词: Target preparation; Plating; Backing foils; Compound plating; Si deposition; Cr deposition; Copper backing; ターゲット薄膜; 密着性; 化合物; コーテイング; クロム、膜; 炭素膜

We have developed a new deposition method of HIVIPP( High energy VIbrational Powder Plating), which is based on the high energy vibrational motion of powder in the high electric field between parallel electrodes in high pressure gases. This method is very simple and does not require any complicated mechanisms. We have found also to be very useful as a target preparation technique in backed condition.1. We have tried target depositions from non-metallic Si and metallic Cr powders by means of the HIVIPP method using high pressure medium gases over one atmosphere without vacuum pumping system.2. We have investigated the deposition rate (μg/cm_2/h)vs 1 through 9 atm. Of the air.3. The result shows around 2 atm. Showed maximum deposition of 95 mg/cm_2/h on average and we found the deposition rate depend strongly on the air pressure.4. We have deposited non metallic Si and metallic Cr powders on the copper backings at the 2~3 atm. Of reactive gases of nitrogen, oxygen and air at around 25 kV and then, the color of the deposited targets changed metallic one to thick blue and black for the Cr and to brown for the Si targets depending of the deposited thickness.5. We have measured the low z elements of C, N and O by PIXE.

我们开发了一种新的沉积方法HIVIPP（高能振动粉末电镀），它是基于粉末在高压气体中的平行电极之间的高电场中的高能振动运动。这种方法非常简单，不需要任何复杂的机制。我们还发现，作为一种在背衬条件下的靶制备技术也是非常有用的。我们在没有抽真空系统的情况下，用高压介质气体HIVIPP方法对非金属Si和金属Cr粉末进行了靶沉积.我们研究了沉积速率（μg/cm_2/h）与1 - 9个大气压的关系。空气中。结果显示大约2 atm。平均最大沉积量为95 mg/cm_2/h，沉积速率对气压有很强的依赖性.我们在2~3个大气压下在铜衬底上沉积了非金属Si粉和金属Cr粉。在25 kV左右的氮气、氧气和空气的反应气体中，然后，沉积的靶的颜色改变为金属色，对于Cr为厚的蓝色和黑色，对于Si靶为棕色，这取决于沉积的厚度。我们用PIXE测量了C、N和O的低z元素。

项目成果

Preparation of Thick Enriched Isotopic Si Target by the HIVIPP Method

HIVIPP法制备厚层富集同位素硅靶材

• 发表时间: 2005
• 期刊: Nucl.Instr.and Metho.in Physics Research A
• 作者: I.Sugai;Y.Takeda;et al.
• 通讯作者: et al.

Preparation of thick enriched isotopic Si targets by the HIVIPP method

HIVIPP法制备厚层富集同位素硅靶材

• 发表时间: 2006
• 期刊: Nucl.Instr.and Meth.in Physics Research A561
• 作者: I. Sugai;Y. Takeda;H. Kawakami
• 通讯作者: H. Kawakami

Fabrication of Boron - Mixed Carbon Stripper and Target Backing Foils

硼-混合碳剥离剂和靶材背衬箔的制造

• 发表时间: 2006
• 期刊: Japan Journal of Applied Physics 45・11
• 作者: I.Sugai;Y.Takeda;H.Kawakami
• 通讯作者: H.Kawakami

Development of thick hybrid-type carbon stripper foils with high durability at 1800 K for RCS of J-PARC

• DOI: 10.1016/j.nima.2005.12.225
• 发表时间: 2006-05
• 期刊: Nuclear Instruments & Methods in Physics Research Section A-accelerators Spectrometers Detectors and Associated Equipment
• 影响因子: 1.4
• 作者: I. Sugai;Y. Takeda;M. Oyaizu;H. Kawakami;Y. Irie;Y. Arakida;K. Hara;H. Hattori;K. Kawasaki;J. Kamiya;M. Kinsho;K. Kuramochi

Development of thick hybrid type carbon stripprt foils wioth high durability at 1800K for RCS of J-PARC

为 J-PARC 的 RCS 开发在 1800K 下具有高耐久性的厚混合型碳剥离箔

• 发表时间: 2006
• 期刊: Nucl. Instr. and Meth. In Physics Research A561
• 作者: I.Sugai;Y.Takeda;M.Oyaizu;H.Kawakami
• 通讯作者: H.Kawakami