Study of polymer thin films for processing of metal thin films in thermal nanoimprint lithography

研究了热塑性聚合物薄膜的抗蚀剂特性，其适合于基底上的金属薄膜的湿法加工，以科学地理解反应性单层辅助的热纳米压印光刻，该光刻使用在抗蚀剂聚合物和金属界面处形成化学共价键的光反应性吸附单层。我们证明了种热塑性聚合物有效地接枝到光反应基团，种热塑性聚合物和其最佳分子量适合于金属湿法蚀刻和电沉积，蚀刻水溶液通过抗蚀剂聚合物薄膜的分子量依赖的渗透行为，和有用的荧光抗蚀剂可视化图案化形状的抗蚀剂薄膜的热纳米压印。

Thermoplastic polymer thin films showing resist property suitable for wet processing of metal thin films on substrates were studied for scientific understanding of reactive-monolayer-assisted thermal nanoimprint lithography using photoreactive adsorbed monolayers which form chemical covalent bonds at resist polymer and metal interface. We demonstrated the kind of thermoplastic polymers effectively grafted to photoreactive groups, the kind of thermoplastic polymer and its optimum molecular weight suitable for metal wet etching and electrodeposition, molecular-weight-dependent permeation behavior of etching aqueous solution through resist polymer thin film, and usefulness of fluorescent resist to visualize patterned shapes of resist thin films by thermal nanoimprinting.