课题基金 / 基金详情

Preparation of CuInS_2 films by reactive-sputtering alternately Cu- and In-facing-targets

Preparation of CuInS_2 films by reactive-sputtering alternately Cu- and In-facing-targets
铜靶与内靶交替反应溅射制备CuInS_2薄膜
批准号:
20560292
负责人:
TSUBOI Nozomu
金额:
$3.16万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2010

项目摘要

项目成果

TSUBOI Nozomu的其他基金

相似基金

相关文献

中文摘要
翻译
点击翻译按钮获取中文摘要
英文摘要
CuInS_2 films with various [Cu]/[In] ratios were deposited by sputtering alternatively Cu- and In-facing-targets under Ar-diluted CS_2 atmosphere. Composition of the films corresponded to the (Cu_xS)-(CuInS_2)-(CuIn_5S_8)-(In_2S_3) system line. Stoichiometric CuInS_2 films exhibited the absorption-edge corresponding to the energy-gap of CuInS_2. In CuInS_2 epitaxial films by multisource evaporation method, lattice strain as well as the [Cu]/[In] ratio was considered to be related with growth mechanism.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
反応性スパッタ法によるCuINS_2膜における基板温度および反応性ガス供給方法に対する特性変化
反应溅射法CuINS_2薄膜的特性随基板温度和反应气体供给方式的变化
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [川田孝平, 坪井望]
通讯作者: 坪井望
反応性交互スパッタ法によるMo薄膜上へのCuInS_2薄膜作製の試み
反应交替溅射法在Mo薄膜上制备CuInS_2薄膜的尝试
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [須田朗弘, 坪井望, 金子双男]
通讯作者: 金子双男
Epitaxial Growth of Chalcopyrite CuInS_2 Films on GaP(001), 16th Int.Conf.
GaP(001) 上黄铜矿 CuInS_2 薄膜的外延生长,第 16 届国际会议。
DOI: --
发表时间: 2008
期刊:
影响因子: --
作者: [R.M.Vequizo, N.Tsuboi, S.Kobayashi, K.Oishi, F.Kaneko]
通讯作者: F.Kaneko
DOI: 10.1002/pssc.200881163
发表时间: 2009-05
期刊: Physica Status Solidi (c)
影响因子: --
作者: [R. Vequizo;Nozomu Tsuboi;Satoshi Kobayashi;K. Oishi;F. Kaneko]
通讯作者: R. Vequizo;Nozomu Tsuboi;Satoshi Kobayashi;K. Oishi;F. Kaneko
11
    Preparation of CuInS2 films by sputtering Cu and In in Ar-diluted H2S reactive gas with the facing target system
    • 批准号:
      23560361
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $3.49万
    • 财政年份:
      2011
    • 负责人:
      TSUBOI Nozomu
    • 依托单位:
    Development of Conductive Delafossite-type Oxide Phosphor Co-doped with Rare-earth and Acceptor Cations
    • 批准号:
      18560006
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.43万
    • 财政年份:
      2006
    • 负责人:
      TSUBOI Nozomu
    • 依托单位:
    Transparent P-type Conductive Ternary Oxide Films Prepared by Reactive Sputtering Method
    • 批准号:
      16560270
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.43万
    • 财政年份:
      2004
    • 负责人:
      TSUBOI Nozomu
    • 依托单位:
    海外基金