Preparation of CuInS_2 films by reactive-sputtering alternately Cu- and In-facing-targets
Preparation of CuInS_2 films by reactive-sputtering alternately Cu- and In-facing-targets
批准号:
20560292
负责人:
TSUBOI Nozomu
金额:
$3.16万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2010
中文摘要
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英文摘要
CuInS_2 films with various [Cu]/[In] ratios were deposited by sputtering alternatively Cu- and In-facing-targets under Ar-diluted CS_2 atmosphere. Composition of the films corresponded to the (Cu_xS)-(CuInS_2)-(CuIn_5S_8)-(In_2S_3) system line. Stoichiometric CuInS_2 films exhibited the absorption-edge corresponding to the energy-gap of CuInS_2. In CuInS_2 epitaxial films by multisource evaporation method, lattice strain as well as the [Cu]/[In] ratio was considered to be related with growth mechanism.
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反応性スパッタ法によるCuINS_2膜における基板温度および反応性ガス供給方法に対する特性変化
反应溅射法CuINS_2薄膜的特性随基板温度和反应气体供给方式的变化
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[川田孝平, 坪井望]
通讯作者:
坪井望
反応性交互スパッタ法によるMo薄膜上へのCuInS_2薄膜作製の試み
反应交替溅射法在Mo薄膜上制备CuInS_2薄膜的尝试
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[須田朗弘, 坪井望, 金子双男]
通讯作者:
金子双男
Epitaxial Growth of Chalcopyrite CuInS_2 Films on GaP(001), 16th Int.Conf.
GaP(001) 上黄铜矿 CuInS_2 薄膜的外延生长,第 16 届国际会议。
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[R.M.Vequizo, N.Tsuboi, S.Kobayashi, K.Oishi, F.Kaneko]
通讯作者:
F.Kaneko
DOI:
10.1002/pssc.200881163
发表时间:
2009-05
期刊:
Physica Status Solidi (c)
影响因子:
--
作者:
[R. Vequizo;Nozomu Tsuboi;Satoshi Kobayashi;K. Oishi;F. Kaneko]
通讯作者:
R. Vequizo;Nozomu Tsuboi;Satoshi Kobayashi;K. Oishi;F. Kaneko
異なる反応性ガス供給条件下でのCuとInの交互スパッタによるCuInS_2薄膜の作製
不同反应供气条件下Cu和In交替溅射制备CuInS_2薄膜
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[山口拓也, 坪井望, 大石耕一郎, 金子双男, 小林敏志]
通讯作者:
小林敏志
共 11 条
Preparation of CuInS2 films by sputtering Cu and In in Ar-diluted H2S reactive gas with the facing target system
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批准号:23560361
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$3.49万
-
财政年份:2011
-
负责人:TSUBOI Nozomu
-
依托单位:
Development of Conductive Delafossite-type Oxide Phosphor Co-doped with Rare-earth and Acceptor Cations
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批准号:18560006
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.43万
-
财政年份:2006
-
负责人:TSUBOI Nozomu
-
依托单位:
Transparent P-type Conductive Ternary Oxide Films Prepared by Reactive Sputtering Method
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批准号:16560270
-
项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.43万
-
财政年份:2004
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负责人:TSUBOI Nozomu
-
依托单位:
海外基金