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STUDIES ON STEP BEHAVIOR ON Si(110)SURFACE AND ITS APPLICATION TO SELF-ORGANIZED FORMATION OF GRAPHENE NANO-RIBBON

STUDIES ON STEP BEHAVIOR ON Si(110)SURFACE AND ITS APPLICATION TO SELF-ORGANIZED FORMATION OF GRAPHENE NANO-RIBBON
Si(110)表面阶梯行为研究及其在石墨烯纳米带自组织形成中的应用
批准号:
21360017
负责人:
SUEMITSU Maki
金额:
$12.56万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011

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中文摘要
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英文摘要
We have studied in detail the impacts of surface microstructures of substrates on the quality and the electronic structure of the epitaxial graphene (EG)formed on them. As a result, we established a method to control the surface steps on Si and SiC substrates, and succeeded in the betterment of EG quality and in controlling the Si-and C-termination of 3C-SiC(111)surfaces. Moreover, it was found that EGs on Si-terminated and C-terminated SiC(111)surfaces show semiconducting and metallic properties, respectively. This finding surely provides a novel method to control the graphene electronic properties, which can be applied to fabrication of graphene devices.
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DOI: --
发表时间: 2010
期刊: Journal of Physics : Conference Series
影响因子: --
作者: [Y. Enta, H. Nakazawa, S. Sato, H. Kato, and Y. Sakisaka]
通讯作者: and Y. Sakisaka
Tunable electronic structure of epitaxial graphene formed on silicon substrates
硅衬底上形成的外延石墨烯的可调谐电子结构
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [Maki Suemitsu, and Hirokazu Fukidome]
通讯作者: and Hirokazu Fukidome
Nanoscale Control of Structure of Epitaxial Graphene by Using Substrate Microfabrication
利用基底微加工对外延石墨烯结构进行纳米级控制
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [Hirokazu Fukidome, Masato Kotsugi, Yusuke Kawai, Takuo Ohkouchi, Thomas Seyller, Karsten Horn, Hiroyuki Handa, Ryota Takahashi, Kei Imaizumi, Yoshiharu Enta, Maki Suemitsu, Toyohiko Kinoshita, Yoshio Watanabe]
通讯作者: Yoshio Watanabe
DOI: 10.1143/jjap.49.01ah03
发表时间: 2010-01-01
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
影响因子: 1.5
作者: [Fukidome, Hirokazu, Miyamoto, Yu, Suemitsu, Maki]
通讯作者: Suemitsu, Maki
18
    Fabrication of quasi-free-standing epitaxial graphene to realize graphene-based devices
    • 批准号:
      17K19065
    • 项目类别:
      Grant-in-Aid for Challenging Research (Exploratory)
    • 资助金额:
      $3.99万
    • 财政年份:
      2017
    • 负责人:
      SUEMITSU Maki
    • 依托单位:
    Oxidation kinetics of Si(110) surface and electrical properties of the oxide as a basis for next-generation CMOS devices
    • 批准号:
      19360015
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $11.56万
    • 财政年份:
      2007
    • 负责人:
      SUEMITSU Maki
    • 依托单位:
    SURFACE CHEMISTRY DURING SiC EPITAXIAL GROWTH USING ORGANO-SILANES
    • 批准号:
      12650025
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.62万
    • 财政年份:
      2000
    • 负责人:
      SUEMITSU Maki
    • 依托单位:
    Surface chemistry of hydrogen on Si surfaces
    • 批准号:
      09450015
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $9.02万
    • 财政年份:
      1997
    • 负责人:
      SUEMITSU Maki
    • 依托单位:
    海外基金