Study on the semi-insulating mechanism of undoped GaAs
Study on the semi-insulating mechanism of undoped GaAs
批准号:
06044021
负责人:
SUEMITSU Maki
金额:
$1.54万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for international Scientific Research
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
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英文摘要
We have concentrated on the study of the mechanism of the photoquenching of EL2, a most important point defect in undoped semi-insulating GaAs. The photoquenching effect is a phenomenon in which all optical and electrical properties of EL2 are vanished by being irradiated with near-infrared lights at T<90K.The effect has been attributed to a transition of the EL2 defect into a metastable state, while some recent reports suggest contributions from other point defects than EL2. The clarification of the photoquenching effect is therefore of great importance in realizing high-quality GaAs crystals. What we found this year is as follows.(1)The photoquenching of EL2 does not occur by itself. Contributions from other defects are essential. By testing a series of samples, in which only the carbon acceptor concentration is varied, we found a strong influence of the carbon acceptor on the activation of the photoquencing effect.(2)By a quantitative analysis of the temperature dependence of the EL2 photoquenching, we found that a deep acceptor located at 70-80 meV above the valence band plays an essential role in the photoquenching effect.(3)This level, named actuator level, accounts for both the carbon-concentration and the temperature dependence of the photoquenching effect, by assuming that the actuator level triggers the photoquenching of EL2 when it is neutral and triggers the photorecovery of EL2 when it is negatively ionized.(4)By thermally-stimulated-current(TSC)measurements, we have confirmed the presence of a deep acceptor at the relevant position in the bandgap. Its charge state became neutral from the original ionized one after irradiation with the quenching light, consistent with our actuator level model.
期刊论文(3)
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会议论文
M.Suemitsu, H.Takahashi, Y.Sagae, and N.Miyamoto: "The role of a 70-80 meV acceptor in the photoquenching of EL2" Materials Science Forum. 196-201. 1037-1042 (1995)
M.Suemitsu、H.Takahashi、Y.Sagae 和 N.Miyamoto:“70-80 meV 受体在 EL2 光猝灭中的作用”材料科学论坛。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
M.Suemitsu,H.Takahashi,Y.Sagae,and N.Miyamoto: "The role of a 70-80 meV acceptor in the Photoquenching of EL2" Materials Science Forum. 196-201. 1037-1042 (1995)
M.Suemitsu、H.Takahashi、Y.Sagae 和 N.Miyamoto:“70-80 meV 受体在 EL2 光淬灭中的作用”材料科学论坛。
DOI:
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发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
M.Suemitsu,H.Takahashi,and N.Miyamoto: "Deep-acceptor-mediated photoquenching of the midgap donor EL2 in semi-insulating GaAs" Physical Review. 52. 1666-1673 (1995)
M.Suemitsu、H.Takahashi 和 N.Miyamoto:“半绝缘 GaAs 中中带隙供体 EL2 的深受体介导的光淬火”物理评论。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
Fabrication of quasi-free-standing epitaxial graphene to realize graphene-based devices
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批准号:17K19065
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项目类别:Grant-in-Aid for Challenging Research (Exploratory)
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资助金额:$3.99万
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财政年份:2017
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负责人:SUEMITSU Maki
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依托单位:
STUDIES ON STEP BEHAVIOR ON Si(110)SURFACE AND ITS APPLICATION TO SELF-ORGANIZED FORMATION OF GRAPHENE NANO-RIBBON
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批准号:21360017
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.56万
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财政年份:2009
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负责人:SUEMITSU Maki
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依托单位:
Oxidation kinetics of Si(110) surface and electrical properties of the oxide as a basis for next-generation CMOS devices
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批准号:19360015
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$11.56万
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财政年份:2007
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负责人:SUEMITSU Maki
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依托单位:
SURFACE CHEMISTRY DURING SiC EPITAXIAL GROWTH USING ORGANO-SILANES
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批准号:12650025
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.62万
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财政年份:2000
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负责人:SUEMITSU Maki
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依托单位:
Surface chemistry of hydrogen on Si surfaces
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批准号:09450015
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.02万
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财政年份:1997
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负责人:SUEMITSU Maki
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依托单位:
The Study of Synchrotron-Radiation-Stimulated Surface Chemical Reactiions on Semiconductors by Surface Electron Spectroscopy
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批准号:06402022
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$24.45万
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财政年份:1994
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负责人:SUEMITSU Maki
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依托单位:
海外基金