Study of the fabrication and properties of the integration between Si-MEMS structure and nitride electronic and photonic devices
Si-MEMS结构与氮化物电子光子器件集成的制备及性能研究
基本信息
- 批准号:21760244
- 负责人:
- 金额:$ 2.83万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Young Scientists (B)
- 财政年份:2009
- 资助国家:日本
- 起止时间:2009 至 2011
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Nitride semiconductor quantum-well, quantum dots and light-emitting diode structure were deposited on the flat Si, Si microstructure and Si-MEMS structure. High quantum efficiency and high emission were observed. Also, AlGaN/GaN HEMT was fabricated and typical transistor I/V property was obtained. Furthermore, micro pressure transducer was fabricated with the AlGaN/GaN HEMT by Si-micromaching process and the related properties were evaluated. The characteristics of the fabricated transistors were measured.
在平坦的硅、硅微结构和硅-MEMS结构上沉积了氮化物半导体量子阱、量子点和发光二极管结构。观察到高量子效率和高发射。制作了AlGaN/gan HEMT,获得了典型的晶体管I/V特性。在此基础上,采用硅微机械工艺制作了AlGaN/gan HEMT微压传感器,并对其相关性能进行了测试。测试了所制得的晶体管的特性。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Fabrication and characterization of freestanding circular GaN gratings.
- DOI:10.1364/oe.18.000773
- 发表时间:2010-01
- 期刊:
- 影响因子:3.8
- 作者:Yongjin Wang;F. Hu;H. Sameshima;K. Hane
- 通讯作者:Yongjin Wang;F. Hu;H. Sameshima;K. Hane
Monolithically integration of GaN light-emitting diode and Si substrate with AlN/GaN superlattice as interlayer
以AlN/GaN超晶格为中间层的GaN发光二极管与Si衬底的单片集成
- DOI:
- 发表时间:2009
- 期刊:
- 影响因子:0
- 作者:F.R.Hu;M.Wakui;H.Sameshima;R.Ito;K.Hane
- 通讯作者:K.Hane
Patterned growth of InGaN/GaN quantum wells on freestanding GaN grating by molecular beam epitaxy.
- DOI:10.1186/1556-276x-6-117
- 发表时间:2011-02-04
- 期刊:
- 影响因子:0
- 作者:Wang Y;Hu F;Hane K
- 通讯作者:Hane K
Large area, freestanding GaN nanocolumn membrane with bottom subwavelength nanostructure.
- DOI:10.1364/oe.18.005504
- 发表时间:2010-03
- 期刊:
- 影响因子:3.8
- 作者:Yongjin Wang;F. Hu;Y. Kanamori;Tong Wu;K. Hane
- 通讯作者:Yongjin Wang;F. Hu;Y. Kanamori;Tong Wu;K. Hane
Comb-drive GaN micro-mirror on a GaN-on-silicon platform
- DOI:10.1088/0960-1317/21/3/035012
- 发表时间:2011-03
- 期刊:
- 影响因子:2.3
- 作者:Yongjin Wang;Takashi Sasaki;Tong Wu;F. Hu;K. Hane
- 通讯作者:Yongjin Wang;Takashi Sasaki;Tong Wu;F. Hu;K. Hane
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