Development of eco-friendly surface treatment technique for photovoltaic crystalline Si substrate by using fluorine resigns

我们成功地开发出了单晶硅衬底的表面处理方法。这种方法可以在大气压附近工作，不需要以全球变暖潜势较高的全氟碳气体作为腐蚀源。利用这种方法，我们实现了对硅表面损伤层的高效去除，并抑制了用该方法织构的硅表面的反射率。此外，我们还系统地揭示了腐蚀行为与腐蚀工艺条件之间的关系。

We have successfully developed the surface treatment method for crystalline Si substrate. This developed method can operate near atmospheric pressure and needs no perfluoro carbon gases with high global warming potential as etchant source. By using this developed method, we have achieved a high efficient removal of Si surface damaged layer, which degrades an efficiency of the solar cell device, and a reflectivity suppression of Si surface textured by this method.Moreover, we have systematically revealed a relationship between etching behavior and etching process condition.