Direct patterningof oxide films by coplanar type surface discharge

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Various techniques to prepare thin films have been reported during the decades. However, most of them basically require a high substrate temperature and/or a vacuum process. A novel thin film synthesis technique at low substrate temperature under ambient pressure should be developed. We focused on a coplanar surface discharge technique to meet the demand. Coplanar surface discharge is categorized to a dielectric barrier discharge in which high-energy plasma runs on the surface of an insulating substrate. In this study, we developed a coplanar surface discharge technique to prepare zinc oxide films.