Elucidation of Ionization Dynamics of Polymers for Nanofabrication by Using Quantum Beam
Elucidation of Ionization Dynamics of Polymers for Nanofabrication by Using Quantum Beam
批准号:
22760669
负责人:
OKAMOTO Kazumasa
金额:
$2.66万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2011
中文摘要
以极紫外自由电子激光(EUVFEL)和电子束为激励源,采用光谱学方法研究了抗蚀剂材料中的微观电荷动力学。结果表明,随着EUVFEL光剂量率的降低,聚合物薄膜中酸产率的量子效率增加。用脉冲辐射解法研究了聚苯乙烯-丙烯酸酯共聚物和聚4-羟基苯乙烯的电荷动力学。
英文摘要
The microscopic charge dynamics in resist materials was studied by spectroscopy using quantum beam(extreme-ultraviolet free-electron laser(EUVFEL) and electron beam) as excitation source. It was suggested that the quantum efficiency of the acid yield in polymer films increases with decreasing the dose rate of the EUVFEL light. The charge dynamics in poly(styrene-acrylate) copolymers and poly(4-hydroxystyrene) was also studied by using pulse radiolysis.
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Charge dynamics in resist polymers for EUV and EB lithography
EUV 和 EB 光刻抗蚀剂聚合物中的电荷动力学
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[M. Nunami, T.-H. Watanabe, H. Sugama, K. Tanaka, Kazumasa Okamoto]
通讯作者:
Kazumasa Okamoto
Deprotonation mechanism of poly(styrene-acrylate)-based chemically amplified resist
聚(苯乙烯-丙烯酸酯)基化学放大型抗蚀剂的去质子化机理
DOI:
--
发表时间:
2011
期刊:
Proceedings of SPIE
影响因子:
--
作者:
[N.Miyato, Yasuharu Tajima]
通讯作者:
Yasuharu Tajima
Dynamics of radicalcation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography
用于极紫外和电子束光刻的聚(苯乙烯丙烯酸酯)基化学放大型抗蚀剂的自由基动力学
DOI:
--
发表时间:
2011
期刊:
Japanese Journal of Applied Physics
影响因子:
1.5
作者:
[Y. Narushima, F. Castejon, S. Sakakibara, Yasuharu Tajima]
通讯作者:
Yasuharu Tajima
極端紫外自由電子レーザーによる電子線レジストへのエネルギー付与
使用极紫外自由电子激光向电子束抗蚀剂提供能量
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[間所寛, 石渡祐樹, 川上俊弘, 及川敬太]
通讯作者:
及川敬太
Elucidation of local ionization in ultra-thin polymer films and its application
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批准号:24561037
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项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$3.16万
-
财政年份:2012
-
负责人:OKAMOTO Kazumasa
-
依托单位:
Elucidation of Molecular Dynamicsand Reaction Mechanism of ResistMaterials for the Control of Nanosize-roughness
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批准号:19710095
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项目类别:Grant-in-Aid for Young Scientists (B)
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资助金额:$1.77万
-
财政年份:2007
-
负责人:OKAMOTO Kazumasa
-
依托单位:
海外基金