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CONTROL OF STRUCTURAL AND ELECTRICAL PROPERTIES OF NANOGAPS USING FIELD-EMISSION-INDUCED ELECTROMIGRATION

CONTROL OF STRUCTURAL AND ELECTRICAL PROPERTIES OF NANOGAPS USING FIELD-EMISSION-INDUCED ELECTROMIGRATION
使用场发射诱发电迁移控制纳米间隙的结构和电性能
批准号:
22651039
负责人:
SHIRAKASHI Jun-ichi
金额:
$2.29万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2011

项目摘要

项目成果

SHIRAKASHI Jun-ichi的其他基金

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中文摘要
翻译
We report a simple and easy method for the simultaneous control of electrical properties of multiple, integrated Ni nanogaps. This method is based on electromigration induced by a field emission current, which is the so-called "activation." The tuning of tunnel resistance of nanogaps was simultaneously achieved by passing Fowler-Nordheim(F-N) field emission current through three initial Ni nanogaps connected in series. Furthermore, the integration of single-electron transistors(SETs) was also achieved by simultaneously performing the activation for the series-connected nanogaps. Two simultaneously activated devices displayed Coulomb blockade properties, and Coulomb blockade voltage of each device was clearly modulated by the gate voltage. Hence, two SETs with similar electrical properties were successfully integrated by the activation procedure. These results indicate that the activation procedure is suitable for the simultaneous control of structural and electrical properties of multiple nanogaps and allows us to integrate planar-type nanogap-based SETs.(2)複数のナノギャップを直列に接続した集積型ナノギャップでのSET構造の一括作製・特性制御・集積化技術の開発:アクティベーションにより2つのSET構造の一括作製および集積化を達成した。集積した2つのSETはほぼ同一の特性を有し、アクティベーション条件によりナノギャップ系SETの素子特性を同時に制御・調節しながら、SETを集積化することが可能であることが明らかとなった。さらに、本手法において得られたラテラル型Ni/真空障壁/Ni系磁性トンネル接合単体でのトンネル磁気抵抗効果(TMR)から、室温にて10%程度のTMRの観測に成功した。
英文摘要
We report a simple and easy method for the simultaneous control of electrical properties of multiple, integrated Ni nanogaps. This method is based on electromigration induced by a field emission current, which is the so-called "activation." The tuning of tunnel resistance of nanogaps was simultaneously achieved by passing Fowler-Nordheim(F-N) field emission current through three initial Ni nanogaps connected in series. Furthermore, the integration of single-electron transistors(SETs) was also achieved by simultaneously performing the activation for the series-connected nanogaps. Two simultaneously activated devices displayed Coulomb blockade properties, and Coulomb blockade voltage of each device was clearly modulated by the gate voltage. Hence, two SETs with similar electrical properties were successfully integrated by the activation procedure. These results indicate that the activation procedure is suitable for the simultaneous control of structural and electrical properties of multiple nanogaps and allows us to integrate planar-type nanogap-based SETs.(2)複数のナノギャップを直列に接続した集積型ナノギャップでのSET構造の一括作製・特性制御・集積化技術の開発:アクティベーションにより2つのSET構造の一括作製および集積化を達成した。集積した2つのSETはほぼ同一の特性を有し、アクティベーション条件によりナノギャップ系SETの素子特性を同時に制御・調節しながら、SETを集積化することが可能であることが明らかとなった。さらに、本手法において得られたラテラル型Ni/真空障壁/Ni系磁性トンネル接合単体でのトンネル磁気抵抗効果(TMR)から、室温にて10%程度のTMRの観測に成功した。
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会议论文
DOI: --
发表时间: 2010
期刊: 電子情報通信学会技術研究報告
影响因子: --
作者: [滝谷和聡, 友田悠介, 渡邉敬登, 久米彌, 上野俊介, 白樫淳一]
通讯作者: 白樫淳一
DOI: --
发表时间: 2010
期刊: 電子情報通信学会技術研究報告
影响因子: --
作者: [上野俊介, 友田悠介, 久米彌, 花田道庸, 滝谷和聡, 白樫淳一]
通讯作者: 白樫淳一
10 Micrometer-Scale SPM Local Oxidation Lithography
10 微米级 SPM 局部氧化光刻
DOI: --
发表时间: 2010
期刊: J.Nanosci.Nanotechnol.
影响因子: --
作者: [T.Toyofuku, S.Nishimura, K.Miyashita, J.Shirakashi.]
通讯作者: J.Shirakashi.
Simultaneous Tuning of Tunnel Resistance of Integrated Nanogaps by Field-Emission-Induced Electromigration
通过场发射诱导电迁移同时调谐集成纳米间隙的隧道电阻
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [M.Ito, S.Ueno, T.Watanabe, S.Akimoto, J.Shirakashi]
通讯作者: J.Shirakashi
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