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Measurements of Electron Conditions in High Pressure Plasmas for Materials Processing

Measurements of Electron Conditions in High Pressure Plasmas for Materials Processing
用于材料加工的高压等离子体中电子条件的测量
批准号:
23540581
负责人:
NAKAMURA Keiji
金额:
$3.33万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2013

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中文摘要
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英文摘要
In this study, employing microwave resonator probe available for electron density monitoring, we have investigated on application of the probe for atmospheric pressure plasma as well as extension of the probe function. In high-pressure plasma, resonance width of the observed probe spectra expands in proportional to electron density which suggests this method will be usable for electron density measurements. Accuracy of the measurement will be improved by considering resonance width observed without plasma. Further, we showed conditions for precise measurements in repetitive pulse discharge plasmas and possibility of simultaneous measurements of electron density and reactive species by installing optical fiber to the probe head on the basis of spectroscopic technique.
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Development of curling probe for monitoring of reactive plasmas
开发用于监测反应等离子体的卷曲探针
DOI: --
发表时间: 2014
期刊:
影响因子: --
作者: [塩満栄一, 木野裕昌, 有吉純也, 有村拓也, 迫田達也, 馬場誠二, 貴島純次, 中島秀之, K. Nakamura and H. Sugai]
通讯作者: K. Nakamura and H. Sugai
Opto-curling probe Monitoring of local density of electron and radicals
光卷曲探针 监测电子和自由基的局部密度
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [A. Pandey, K. Kato. , S. Ikezawa, K. Nakamura and H. Sugai]
通讯作者: K. Nakamura and H. Sugai
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [K. Nakamura, H. Kumazaki and H. Sugai]
通讯作者: H. Kumazaki and H. Sugai
Monitoring of electron density and wall deposit by curling probe during plasma process
在等离子体过程中通过卷曲探针监测电子密度和壁沉积
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [A. Pandey, M. Imai, H. Kanematsu, S. Ikezawa, K. Nakamura and H. Sugai]
通讯作者: K. Nakamura and H. Sugai
19
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