Measurements of Electron Conditions in High Pressure Plasmas for Materials Processing

用于材料加工的高压等离子体中电子条件的测量

• 批准号: 23540581
• 负责人: NAKAMURA Keiji
• 金额: $ 3.33万
• 依托单位: Chubu University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 2013
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23540581/
• 关键词: 電子密度; 電子状態; モニタリング; プローブ; パルス放電; ネットワークアナライザ

In this study, employing microwave resonator probe available for electron density monitoring, we have investigated on application of the probe for atmospheric pressure plasma as well as extension of the probe function. In high-pressure plasma, resonance width of the observed probe spectra expands in proportional to electron density which suggests this method will be usable for electron density measurements. Accuracy of the measurement will be improved by considering resonance width observed without plasma. Further, we showed conditions for precise measurements in repetitive pulse discharge plasmas and possibility of simultaneous measurements of electron density and reactive species by installing optical fiber to the probe head on the basis of spectroscopic technique.

本研究采用可用于电子密度监测的微波谐振探针，研究了该探针在大气压等离子体中的应用以及探针功能的扩展。在高压等离子体中，观察到的探针光谱的共振宽度与电子密度成正比地扩展，这表明该方法可用于电子密度测量。通过考虑在没有等离子体的情况下观察到的共振宽度，将提高测量的精度。此外，我们表明，在重复脉冲放电等离子体的精确测量的条件和同时测量的电子密度和活性物种的光谱技术的基础上，通过安装光纤的探头。

项目成果

Development of curling probe for monitoring of reactive plasmas

开发用于监测反应等离子体的卷曲探针

• 发表时间: 2014
• 作者: 塩満栄一;木野裕昌;有吉純也;有村拓也;迫田達也;馬場誠二;貴島純次;中島秀之;K. Nakamura and H. Sugai
• 通讯作者: K. Nakamura and H. Sugai

Opto-curling probe Monitoring of local density of electron and radicals

光卷曲探针 监测电子和自由基的局部密度

• 发表时间: 2013
• 作者: A. Pandey;K. Kato. ;S. Ikezawa;K. Nakamura and H. Sugai
• 通讯作者: K. Nakamura and H. Sugai

Miniaturization of Plane-Type Microwave Resonator Probe with Multi-Resonant Frequencies

多谐振频率平面型微波谐振探头的小型化

• 发表时间: 2012
• 作者: K. Nakamura;H. Kumazaki and H. Sugai
• 通讯作者: H. Kumazaki and H. Sugai

Monitoring of electron density and wall deposit by curling probe during plasma process

在等离子体过程中通过卷曲探针监测电子密度和壁沉积

• 发表时间: 2012
• 作者: A. Pandey;M. Imai;H. Kanematsu;S. Ikezawa;K. Nakamura and H. Sugai
• 通讯作者: K. Nakamura and H. Sugai

Temperature Dependence of Coercivity Behavior in Fe Films on Fractal Rough Ceramics Surfaces

• DOI: 10.7567/jjap.52.01ac13
• 发表时间: 2013
• 期刊: Japanese Journal of Applied Physics
• 影响因子: 1.5
• 作者: Miaogen Chen;Z. Jiao;Senjiang Yu;Ming-xun Yu;F. Bao;Keiji Nakamura