Development of a spatio-time-resolved cathodoluminescence spectroscopy technique applicable for wide bandgap semiconductors through the generation and focusing of high-brightness femtosecond pulsed photoelectron beams
Development of a spatio-time-resolved cathodoluminescence spectroscopy technique applicable for wide bandgap semiconductors through the generation and focusing of high-brightness femtosecond pulsed photoelectron beams
批准号:
23656206
负责人:
CHICHIBU Shigefusa
金额:
$2.5万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012
中文摘要
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英文摘要
To probe local carrier dynamics in wide bandgap semiconductors such as AlN and high AlN mole fraction AlGaN alloys, the use of spatio-time-resolved cathodoluminescence (STRCL) technique offering high spatial and temporal resolutions is preferred, becauseelectron beams can be focused and implanted into sub-micrometer to nanometer regions of interest. In this study, we succeeded in developing a novel front-excitation type high-brightness pulsed photoelectron (PE)- gun driven by femtosecond laser pulses, and the STRCL measurement system equipped with this PE-gun was used to measure the local emission dynamics in GaN, AlN, and high AlN mole fraction AlGaN alloys.
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Femtosecond-laser-driven photoelectron-gun for time-resolved cathodoluminescence measurement of GaN
用于 GaN 时间分辨阴极发光测量的飞秒激光驱动光电子枪
DOI:
10.1063/1.3701368
发表时间:
2012
期刊:
Review of Scientific Instruments
影响因子:
1.6
作者:
[T.Onuma, Y.Kagamitani, K.Hazu, T.Ishiguro, T.Fukuda, S.F.Chichibu]
通讯作者:
S.F.Chichibu
III-V族窒化物半導体の欠陥評価最前線
III-V族氮化物半导体缺陷评估最前沿
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[花房宏明, 広瀬信光, 笠松章史, 三村高志, 松井敏明, 須田良幸, 野崎 眞次, 秩父重英,上殿明良]
通讯作者:
秩父重英,上殿明良
DOI:
10.1063/1.4807906
发表时间:
2013-06-07
期刊:
JOURNAL OF APPLIED PHYSICS
影响因子:
3.2
作者:
[Chichibu, S. F., Miyake, H., Uedono, A.]
通讯作者:
Uedono, A.
Local carrier dynamics in freestanding GaN substrates grown by hydride vapor phase epitaxy studied using the spatio-time-resolved cathodoluminescence technique
使用时空分辨阴极发光技术研究氢化物气相外延生长的独立式 GaN 衬底中的局部载流子动力学
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[K. Furusawa, Y. Ishikawa, M. Tashiro, K. Hazu, S. Nagao, K. Fujito, A. Uedono, and S. F. Chichibu]
通讯作者:
and S. F. Chichibu
Advantages and remaining issues of state-of-the-art m-plane freestanding GaN substrates grown by halide vapor phase epitaxy for m-plane InGaN epitaxial growth
用于m面InGaN外延生长的最先进的m面独立式GaN衬底的卤化物气相外延生长的优点和遗留问题
DOI:
10.1088/0268-1242/27/2/024008
发表时间:
2012
期刊:
Semiconductor Science and Technology
影响因子:
1.9
作者:
[S. F. Chichibu, M. Kagaya, P. Corfdir, J. D. Ganiere, B. Deveaud-Pledran, N. Grandjean, S. Kubo, and K. Fujito]
通讯作者:
and K. Fujito
共 30 条
Modification of the bandgap of hexagonal BN and deep-ultraviolet luminescence dynamics of excitons in them
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批准号:20K20993
-
项目类别:Grant-in-Aid for Challenging Research (Exploratory)
-
资助金额:$4.16万
-
财政年份:2020
-
负责人:CHICHIBU Shigefusa
-
依托单位:
Helicon-wave-excited-plasma sputtering epitaxy of polariton laser structures for room temperature operation
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批准号:22246037
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$30.04万
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财政年份:2010
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负责人:CHICHIBU Shigefusa
-
依托单位:
Epitaxial growth and fabrication of microcavities by the helicon-wave-excited-plasma sputtering method
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批准号:19360137
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$10.65万
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财政年份:2007
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负责人:CHICHIBU Shigefusa
-
依托单位:
Development of oxide semiconductor and dielectric electronics using helicon-wave-excited-plasma sputtering methods
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批准号:16360146
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.14万
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财政年份:2004
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负责人:CHICHIBU Shigefusa
-
依托单位: